1446220-02-5

Basic information

• Product Name: 9-(4-hydroxyphenyl)-9-(4-(2-methyl-2-adamantyloxycarbonylmethyloxy)phenyl)fluorene
• Synonyms: 9-(4-hydroxyphenyl)-9-(4-(2-methyl-2-adamantyloxycarbonylmethyloxy)phenyl)fluorene
• CAS NO: 1446220-02-5
• Molecular Weight: 556.701
• Mol File: 1446220-02-5.mol
• Article Data: 1

Chemical Properties

• CAS DataBase Reference: 9-(4-hydroxyphenyl)-9-(4-(2-methyl-2-adamantyloxycarbonylmethyloxy)phenyl)fluorene(CAS DataBase Reference)
• NIST Chemistry Reference: 9-(4-hydroxyphenyl)-9-(4-(2-methyl-2-adamantyloxycarbonylmethyloxy)phenyl)fluorene(1446220-02-5)
• EPA Substance Registry System: 9-(4-hydroxyphenyl)-9-(4-(2-methyl-2-adamantyloxycarbonylmethyloxy)phenyl)fluorene(1446220-02-5)

Safety Data

• Hazardous Substances Data: 1446220-02-5(Hazardous Substances Data)

Upstream product

• 625122-37-4 2-methyl-2-adamantyl bromoacetate 
• 3236-71-3 9,9-bis(4-hydroxyphenyl)fluorene 

Downstream Products

• 1446220-06-9 sodium 4-(9-(4-(2-methyl-2-adamantyloxycarbonylmethyloxy)phenyl)fluorene-9-yl)phenoxyacetyl-2,3,5,6-tetrafluorobenzenesulfonate 
• 1446220-04-7 9-(4-hydroxycarbonylmethoxyphenyl)-9-(4-(2-methyl-2-adamantyloxycarbonylmethyloxy)phenyl)fluorene 

Relevant articles and documents

A novel photo-acid generator bound molecular glass resist with a single protecting group

A novel photo-acid generator (PAG) bound molecular glass photoresist with a single protecting group has been developed as a promising resist material for use in microelectronics. This single component molecular resist was prepared in four steps starting from 9,9-bis(4-hydroxyphenyl)fluorene. The single component molecular resist exhibited good thermal properties, such as a 10% weight loss temperature of 200 °C and a glass transition temperature of 91 °C. This resist showed a good sensitivity of 60 μC/cm2 with e-beam exposure (50 keV). On the other hand, the fine pattern with a half-pitch of 50 nm in the presence of 4 wt % quencher, trioctylamine, was obtained using electron-beam (100 keV) lithography. The LER value was 8.2 nm (3σ, 60 nm half-pitch patterns). 2013 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2013 A novel photo-acid generator (PAG) bound molecular glass photoresist with a single protecting group has been developed as a promising resist material for use in microelectronics. Copyright