150112-38-2

Basic information

• Product Name: TRIMETHYLGERMYLTRICHLOROSILANE
• Synonyms: TRIMETHYLGERMYLTRICHLOROSILANE
• CAS NO: 150112-38-2
• Molecular Formula: C₃H₉Cl₃GeSi
• Molecular Weight: 252.19
• Mol File: 150112-38-2.mol
• Article Data: 1

Chemical Properties

• Boiling Point: 65-6°C/22mmHg
• Appearance: /
• CAS DataBase Reference: TRIMETHYLGERMYLTRICHLOROSILANE(CAS DataBase Reference)
• NIST Chemistry Reference: TRIMETHYLGERMYLTRICHLOROSILANE(150112-38-2)
• EPA Substance Registry System: TRIMETHYLGERMYLTRICHLOROSILANE(150112-38-2)

Safety Data

• TSCA: No
• Hazardous Substances Data: 150112-38-2(Hazardous Substances Data)

Usage

General Description

TRIMETHYLGERMYLTRICHLOROSILANE is a highly reactive organometallic compound that is commonly used as a precursor for depositing thin films of germanium-containing materials in industrial processes such as chemical vapor deposition. It is classified as a chlorosilane compound, meaning it contains both silicon and chlorine atoms, with the addition of germanium and three methyl groups attached to the silicon atom. TRIMETHYLGERMYLTRICHLOROSILANE is highly flammable and reactive with water, making it necessary to handle with caution and in a controlled environment. It is commonly used in the production of various electronic devices, optical coatings, and photovoltaic cells due to its ability to deposit high-quality thin films with precise control over their properties.

InChI:InChI=1/C3H9Cl3GeSi/c1-7(2,3)8(4,5)6/h1-3H3

Upstream product

• 243989-25-5 tert-butyl(isopropyl)(trimethylgermyl)phosphane 
• 13465-77-5 hexachlorodisilane 

Downstream Products

• 239478-65-0 bis(trichlorosilyl)bis(trimethylgermyl)silane 
• 1529-47-1 chlorotrimethylgermane 

Relevant articles and documents

Intermediates and products of the hexachlorodisilane cleavage of group 14 element phosphanes and amines - Molecular structure of di-tert- butyl(trichlorosilyl)phosphane in the gas phase determined by electron diffraction and ab Initio calculations

Reactions of dialkyl(trimethylsilyl)phosphanes RR'PSiMe3 (1: R, R' = tBu; 3: R, R' = iPr; 5: R = iPr, R' = tBu) with Si2Cl6 provide stable trichlorosilylphosphanes RR'PSiCl3 (2, 4, 6); the reactions of silyl- and stannylamines of iPr2NMMe3 (M = Si: 11; M = Sn: 12) with Si2Cl6, however, provide the stable pentachlorodisilanylamine iPr2NSi2Cl5 (13). Heating of 1 with the technical mixture Me2(Cl)SiSiCl2Me/(MeCl2Si)2 yields the stable silylphosphane tBu2PSiMe2Cl (8) and the disilanylphosphane tBu2PSi(Me)(Cl)Si(Me)Cl2 (9). Methylation of 9 with MeLi gave tBu2PSi2Me5 10, which was isolated in a pure state. Reactions of tBu(iPr)PSiMe3 (5) and of organometal phosphanes tBu(iPr)PMR3 (14: M = Ge, R = Me; 17a-c: M = Sn; R = Me, Et, nBu) with Si2Cl6 were monitored by 31P, 29Si, and 119Sn NMR. - In the first step of these reactions, new tBu(iPr)PSi2Cl5 (7) is formed. 7 is accompanied by increasing amounts of tBu(iPr)PSiCl3 (6) and Me3GeSiCl3 (15)/(Me3Ge)2Si(SiCl3)2 (16) or traces of compounds R3SnSiCl3 (19a-c) that decompose providing (R3Sn)2Si(SiCl3)2 (18a-c) and nBu3SnSi(SiCl3)3 (20c). Subsequently, compounds 19a-c decompose providing increasing amounts of 18a-c. Stannylphosphane 17b is also cleaved by SiCl4 leading to 6 with liberation of Et3SnCl, whereas 17b is formed from the reaction of 5 with Et3SnCl under liberation of Me3SiCl. The suggestion of an extra stabilisation of P-Si bonds of trichlorosilylphosphanes was subjected to direct evidence through the structure determination of the trichlorosilylphosphane tBu2PSiCl3 (2) in the gas phase by electron diffraction. This crowded molecule has a 'normal' P-Si bond length of 225.0(12) pm; its C1 symmetric conformation with both tBu groups and the SiCl3 group twisted about 17°from the perfectly staggered positions, and with each of the three groups tilted about 6°away from each other, allows to reduce steric strain.