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1645-75-6

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1645-75-6 Usage

Synthesis Reference(s)

Organic Syntheses, Coll. Vol. 6, p. 664, 1988The Journal of Organic Chemistry, 30, p. 1398, 1965 DOI: 10.1021/jo01016a012

Check Digit Verification of cas no

The CAS Registry Mumber 1645-75-6 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,6,4 and 5 respectively; the second part has 2 digits, 7 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 1645-75:
(6*1)+(5*6)+(4*4)+(3*5)+(2*7)+(1*5)=86
86 % 10 = 6
So 1645-75-6 is a valid CAS Registry Number.
InChI:InChI=1/C3HF6N/c4-2(5,6)1(10)3(7,8)9/h10H

1645-75-6SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 19, 2017

Revision Date: Aug 19, 2017

1.Identification

1.1 GHS Product identifier

Product name 1,1,1,3,3,3-hexafluoropropan-2-imine

1.2 Other means of identification

Product number -
Other names Hexafluorisopropylidenimin

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1645-75-6 SDS

1645-75-6Relevant articles and documents

Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography

-

Page/Page column 9, (2008/06/13)

The present invention provides novel fluorine-containing copolymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered heterocyclic ring and, optionally, other components. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The copolymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.

Stable fluorinated sulfuranes and sulfurane oxides. Synthesis and reactions

Kitazume, Tomoya,Shreeve, Jean'ne M.

, p. 2173 - 2176 (2007/10/10)

Bis(trifluoromethyl) sulfide, tetrafluoro-1,3-dithietane, and bis(trifluoromethyl) sulfoxide undergo oxidative addition when photolyzed with trifluoromethyl hypochlorite to form a new family of sulfuranes, bis(trifluoromethyl)bis(trifluoromethoxy)sulfurane (1) and tetrafluoro-1,3-tetrakis(trifluoromethoxy)dithietane (3), and of sulfurane oxides, bis(trifluoromethyl)bis(trifluoromethoxy)sulfurane oxide (2). Compounds 1 and 2 are hydrolyzed to bis(trifluoromethyl) sulfoxide and bis(trifluoromethyl) sulfone, respectively. Pyrolysis of 1, 2, or 3 gives bis(trifluoromethyl) sulfide, bis(trifluoromethyl) sulfoxide, and tetrafluoro-1,3-dithietane, respectively, plus bis(trifluoromethyl) peroxide. With primary amines, 1 and 2 yield N-alkylbis(trifluoromethyl)sulfimides and sulfoxyimides, and with N,N′-diethylaminotrimethylsilane, imine formation occurs. Sulfurane oxide 2 forms a new type of stable sulfurane oxide (4), bis(trifluoromethyl)bis(hexafluoroisopropylidenimido)sulfurane oxide, with lithium hexafluoroisopropylidenimine. Sulfurane 1 acts in a similar manner with the nucleophile but the sulfurane 5 is not isolated. Compounds 1 and 2 form α,α,α-(trifluoromethyl)anisole derivatives with substituted phenols. Secondary and tertiary alcohols are dehydrated by 1 or 2 to olefins but symmetrical alkyl ethers result when primary alcohols are reacted.

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