2003-85-2

Basic information

• Product Name: TETRAKIS(DIMETHYLSILYL)SILANE
• Synonyms: TETRAKIS(DIMETHYLSILYL)SILANE
• CAS NO: 2003-85-2
• Molecular Formula: C₈H₂₈Si₅
• Molecular Weight: 264.74
• Product Categories: Si (Classes of Silicon Compounds);Si-H Compounds;Si-Si Compounds
• Mol File: 2003-85-2.mol
• Article Data: 5

Chemical Properties

• Melting Point: 21 °C
• Boiling Point: 206.7°C at 760 mmHg
• Flash Point: 78.8°C
• Appearance: /
• Vapor Pressure: 0.337mmHg at 25°C
• Storage Temp.: Refrigerator
• CAS DataBase Reference: TETRAKIS(DIMETHYLSILYL)SILANE(CAS DataBase Reference)
• NIST Chemistry Reference: TETRAKIS(DIMETHYLSILYL)SILANE(2003-85-2)
• EPA Substance Registry System: TETRAKIS(DIMETHYLSILYL)SILANE(2003-85-2)

Safety Data

• RIDADR: UN 1325 4.1/PG II
• HazardClass: 4.1
• PackingGroup: II
• Hazardous Substances Data: 2003-85-2(Hazardous Substances Data)

Usage

General Description

Tetrakis(dimethylsilyl)silane, also known as TDMS, is a colorless, clear liquid that is commonly used as a surface treatment agent in the production of semiconductor devices and integrated circuits. It is a highly reactive silane compound that is capable of forming stable silicon-carbon bonds, making it an essential component in the production of various silicon-based materials. TDMS is also used as a protective coating for metal surfaces to enhance their resistance to corrosion and as a crosslinking agent in the production of silicone polymers. Its unique chemical properties and versatility make it a valuable compound in the field of materials science and electronics manufacturing. However, it poses significant health and safety hazards, requiring careful handling and storage to prevent exposure and contamination.

InChI:InChI=1/C8H28Si5/c1-9(2)13(10(3)4,11(5)6)12(7)8/h9-12H,1-8H3

Upstream product

• 17082-82-5 tetrakis(chlorodimethylsilyl)silane 
• 4098-98-0 tetrakis(trimethylsilyl)silane 
• 93794-76-4 tetrakis(dimethylbromosilyl)silane 
• 93794-77-5 octamethylspiropentasilane 

Downstream Products

• 1431936-83-2 tris((4,4-dimethyl-2-oxazolinyl)phenylborate) MgSi(SiHMe₂)3 
• 1431936-82-1 tris((4,4-dimethyl-2-oxazolinyl)phenylborate) ZnSi(SiHMe₂)3 
• 1431936-91-2 (tris(4,4-dimethyl-2-oxazolinyl)phenylborate)(ZnO₂CSi(SiHMe₂))3 
• 4098-98-0 tetrakis(trimethylsilyl)silane 
• 108-88-3 toluene 

Relevant articles and documents

Rare Earth and Main Group Metal Poly(hydrosilyl) Compounds

The potassium poly(hydrosilyl) compound KSi(SiHMe2)3, which contains three β-SiH groups, is synthesized by the reaction of Si(SiHMe2)4 and KOtBu. A single-crystal X-ray diffraction study reveals chains composed of head-to-tail KSi(SiHMe2)3 monomers. This potassium poly(hydrosilyl) anion reacts with divalent metal halide salts in THF to form the bis(silyl) compounds Mg{Si(SiHMe2)3}2THF2 (1·THF2), Ca{Si(SiHMe2)3}2THF3 (2·THF3), and Yb{Si(SiHMe2)3}2THF3 (3·THF3). A trivalent yttrium bis(silyl), as part of a KCl-containing polymeric chain, is supported by K?H-Si bridging interactions. The N donors pyridine (py) and dimethylaminopyridine (DMAP) readily substitute THF, giving tetrahedral magnesium and octahedral calcium silyl compounds. The one-bond silicon-hydrogen coupling constants (1JSiH), infrared stretching frequencies (νSiH), and solid-state structures of 2·py4 and 3·THF3 indicate classical two center-two electron bonding between the metal center and the silyl ligand, as well as terminal (nonbridging) Si-H bonds within the silyl ligands. The magnesium and calcium compounds readily react with the Lewis acids PhB(C6F5)2 and B(C6F5)3 to give hydridoborate salts, whereas {κ3-ToM}2Yb (5) (ToM = tris(4,4-dimethyl-2-oxazolinyl)phenyl borate) is formed by reaction of TlToM and 3·THF3.

The influence of ring strain on the formation of Si-H-Si stabilised oligosilanylsilyl cations

Hydride transfer between Si(SiMe2H)4 (2) and [Ph3C][B(C6F5)4] in 3-fluorotoluene yields the intermolecularly silane-stabilised silylium ion [((HMe2Si)3SiSiMe2)2H]+ ([5]+), independently of the amount of [Ph3C][B(C6F5)4] (0.5, 1.0 or 2.0 equiv.) used. The cyclic silane-stabilised silylium ion [4]+ is not detected by NMR spectroscopy. This result demonstrates the influence of ring strain effects on the formation of intra- ([4]+) or intermolecularly ([5]+) Si-H-Si bridged silyl cations.

Tetrakis(dimethylsilyl)silane and Its Application in Synthesis

Treatment of (ClMe2Si)4Si with LiAlH4 gives tetrakis(dimethylsilyl)silane, (HMe2Si)4Si (1), in 95percent yield.The silane (1), containing four active silicon-hydrogen bonds is an efficient free radical reducing agent and can also serve, in the presence of