2370-88-9 Usage
Description
2, 4, 6, 8-TETRAMETHYLCYCLOTETRASILOXANE can be used as the precursor for the deposition of polysiloxane, cyclic siloxane, silicon dioxide, and gate dielectrics in thin-film transistors (TFT) (for example, for the preparation of ultralow dielectric constant pSiCOH film), and is a component of photochemically formed SiOX monolayers on TiO. It is a good impregnant of photoelectric material. It can be used for the manufacturing of modified siloxane with defined hydrogen content and chain quality.
Chemical Properties
Colorless or yellowish transparent liquid
Uses
Different sources of media describe the Uses of 2370-88-9 differently. You can refer to the following data:
1. 2,4,6,8-Tetramethylcyclotetrasiloxane can occur addition reaction with unsaturated alkenes, so it’s utilized widely to synthesize variety functional reactive silicone fluids which is used to form silicone block copolymer, or used as crosslinker of vinyl addition silicone rubber.
Tetramethyl-cyclotetrasiloxane is a good impregnant of photoelectric material. It is used to manufacture of modified siloxane with defined hydrogen content and chain quantity. It is also used in production of silicone polymers and acts as a precursor for the deposition of polysiloxane, cyclic siloxane, silicon dioxide, oxycarbide thin films with low dielectric constant for microelectronics and semiconductors.
2. 2, 4, 6, 8-Tetramethylcyclotetrasiloxane (TMCTS) is an important precursor for the deposition of polysiloxane, cyclic siloxane, silicon dioxide, oxycarbide thin films with low dielectric constant for microelectronics, semiconductors and other applications
Flammability and Explosibility
Flammable
References
https://www.alfa.com/zh-cn/catalog/L16642/
http://www.sigmaaldrich.com/catalog/product/aldrich/512990?lang=en®ion=US
Grill, A., and V. Patel. "Ultralow dielectric constant pSiCOH films prepared with tetramethylcyclotetrasiloxane as skeleton precursor." Journal of Applied Physics 104.2(2008):107.
Zhang, Jianming, D. S. Wavhal, and E. R. Fisher. "Mechanisms of SiO2 film deposition from tetramethylcyclotetrasiloxane, dimethyldimethoxysilane, and trimethylsilane plasmas." Journal of Vacuum Science & Technology A Vacuum Surfaces & Films 22.1(2004):201-213.
Fujino, Katsuhiro, et al. "Low-Temperature Atmospheric-Pressure Chemical Vapor Deposition, Using 2, 4, 6, 8-Tetramethylcyclotetrasiloxane and Ozone." Japanese Journal of Applied Physics 33. 4A (1994):2019-2024.
Check Digit Verification of cas no
The CAS Registry Mumber 2370-88-9 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 2,3,7 and 0 respectively; the second part has 2 digits, 8 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 2370-88:
(6*2)+(5*3)+(4*7)+(3*0)+(2*8)+(1*8)=79
79 % 10 = 9
So 2370-88-9 is a valid CAS Registry Number.
InChI:InChI=1/C4H12O4Si4/c1-9-5-10(2)7-12(4)8-11(3)6-9/h1-4H3
2370-88-9Relevant articles and documents
Fischer,Kriegsmann
, p. 219,220,221,224,225,229 (1969)
Hydrocarbyl the cyclosiloxane preparation method (by machine translation)
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Paragraph 0019; 0026; 0027; 0031, (2017/09/20)
The invention discloses a preparation method of alkyl cyclosiloxane. The preparation method is characterized by comprising the following steps: taking alkyl halogenosilane as a raw material, taking crown ether as a solvent and dropping the alkyl halogenosilane in a mixed solution formed by water and the crown ether while continuously stirring the alkyl halogenosilane; carrying out hydrolysis at a certain temperature to carry out condensation polymerization; standing after the reaction to carry out layering; and directly carrying out decompressed rectification on the obtained hydrolyzed oil to separate trialkylcyclotrisiloxane, tetraalkylcyclotetrasiloxane, pentaalkylcyclopentasiloxane and hexaalkylcyclohexasiloxane. The preparation method has the advantages that alcohols and low-boiling point hydrocarbons are not used as solvents, the crown ether is used as solvent and direct rectification is carried out on the prepared hydrolyzed oil to obtain the alkyl cyclosiloxane, so that the processes of washing, neutralization, drying and filtering are saved; and the solvent which undergoes standing and layering after the hydrolysis can be reused or can be cooled to a certain temperature to separate out the crown ether for recovery, so that the production cost is saved.
PROCESS FOR PREPARING CYCLIC ORGANOHYDROGENSILOXANES
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Page/Page column 6; 7, (2008/06/13)
A process for preparing cyclic organohydrogensiloxanes comprises: (A) contacting a silane of the formula RHSiCl2, where R is selected from alkyl radicals having 1 to 12 carbon atoms and aryl radicals, with water to form a hydrolyzate comprising cyclic organohydrogensiloxanes and linear organohydrogensiloxanes, and (B) contacting the hydrolyzate with an acidic rearrangement catalyst in the presence of an inert liquid diluent to increase the ratio of the cyclic organohydrogensiloxanes to linear organohydrogensiloxanes in the hydrolyzate. The acidic rearrangement catalyst is an organic compound containing a strong acid group, for example a sulphonic acid, which is dissolved in the inert diluent present.
EFFECT OF HYDROCHLORIC ACID ON RING FORMATION IN HYDROLYTIC POLYCONDENSATION OF DIFUNCTIONAL ORGANOCHLOROSILANES
Kopylov, V. M.,Agashkov, S. P.,Sunkovich, G. V.,Prikhod'ko, P. L.,Ezerets, M. A.,Glukhova, M. A.
, p. 1873 - 1878 (2007/10/02)
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