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2551-62-4

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2551-62-4 Usage

Chemical Properties

Different sources of media describe the Chemical Properties of 2551-62-4 differently. You can refer to the following data:
1. Sulfur hexafluoride is a colorless, odorless, nontoxic, nonflammable gas that has a high dielectric strength and serves widely as an insulating gas in electrical equipment. At atmospheric pressures it sublimes directly from the solid to the gas phase and does not have a stable liquid phase unless under a pressure of more than 32 psia (221 kPa, abs). It is shipped as a liquefied compressed gas at its vapor pressure of 298 psig at 70°F (2050 kPa at 21.1 0C). One of the most chemically inert gases known, it is completely stable in the presence of most materials to temperatures of about 400°F (204°C) and has shown no breakdown or reaction in quartz at 900°F (482°C). Sulfur hexafluoride is slightly soluble in water and oil. No change in pH occurs when distilled water is saturated with sulfur hexafluoride. sulfur hexafluoride structure
2. Chemical properties of sulfur hexafluoride are very stable. And compared to selenium hexafluoride, the hydrolysis rate of sulfur hexafluoride is extremely low, this is due to the small radius sulfur atom, which resulting in six fluorine atoms form a larger steric hindrance around. However, the fluorine atom radius is not big, so the repulsive force between the six fluorine atoms is not too large, S-F bond is not easy to dissociate. Enthalpy of formation of sulfur hexafluoride is-1220 kJ/mol, but enthalpy of formation of sulfur hexafluoride is-74 kJ/mol. Thus, the radius of fluorine atom and sulfur atom radius cause the very stable of sulfur hexafluoride molecule together---the molecules themselves are difficult to disconnect bond and break down and the attack group is difficult to approach to the central atom, in the thermodynamics and kinetics, they are both stable. Studies have said sulfur hexafluoride can be stably present in the atmosphere for thousands of years.
3. Sulfur pentafluoride and sulfur tetrafluoride are classified by OSHA as highly hazardous chemicals under its Process Safety Management Standard and as toxic industrial chemicals on the basis of their highly toxic nature and production in large quantities (29 CFR 1910).

GRADES AVAILABLE

Different sources of media describe the GRADES AVAILABLE of 2551-62-4 differently. You can refer to the following data:
1. Sulfur hexafluoride is available for commercial and industrial use in various grades (minimum 99.8 mole percent) having much the same component proportions from one producer to another.
2. Sulfur hexafluoride is available for commercial and industrial use in various grades (minimum 99.8 mole percent) having much the same component proportions from one producer to another.

Uses

Different sources of media describe the Uses of 2551-62-4 differently. You can refer to the following data:
1. ▼▲ Industry Application Role/benefit Medicine Anesthesia Anesthetic/better anesthesia effect than nitric oxide Retinal detachment repair operations Provide a tamponade or plug of a retinal hole in the form of a gas bubble Ultrasound imaging Contrast agent/enhance the visibility of blood vessels to ultrasound Semiconductor Plasma etching Etchant/breaking down product fluorine plasma can perform the etching Metal casting Magnesium and aluminum casting Oxygen asphyxiant/inert and not corrosive and toxic High-power microwave systems Pressurizes waveguides Insulates the waveguide, preventing internal arcing Chemical weapon Production of disulfur decafluoride Feedstock Magic show Object floating show Be colorless, tasteless and has greater density than air Electrical equipment High-voltage circuit breakers and gas insulated switchgear Gaseous dielectric medium/has much higher dielectric strength than air or dry nitrogen Others Tennis, insoles filling Gas filler/much lower capacity to pass through rubber membrane than air Monitor the flow of the water and the diffusion of the air pollutants Tracer agent/ stably exists in water and air Zanyism Performers breathe a little sulfur hexafluoride gas to make the voice become low and deep Refrigerant Good chemical stability and no corrosion on the equipment
2. Sulfur hexafluoride is used extensively as a gaseous dielectric in various kinds of electrical power equipment, such as switchgear, transformers, condensers, and circuit breakers. It has also been used as a dielectric at microwave frequencies and as an insulating medium for the power supplies of high-voltage machines. Sulfur hexafluoride is also gaining use in nonelectrical applications, including blanketing of molten magnesium, leak detection, and plasma etching in the semiconductor industry. Sulfur hexafluoride also has some limited medical applications.
3. Dielectric for high-voltage equipment
4. Sulfur hexafluoride is used extensively as a gaseous dielectric in various kinds of electrical power equipment, such as switchgear, transformers, condensers, and circuit breakers. It has also been used as a dielectric at microwave frequencies and as an insulating medium for the power supplies of high-voltage machines. Sulfur hexafluoride is also gaining use in nonelectrical applications, including blanketing of molten magnesium, leak detection, and plasma etching in the semiconductor industry. Sulfur hexafluoride also has some limited medical applications.

Physiological Effects

Sulfur hexafluoride is completely nontoxic, and in fact has been used medically with humans in cases involving pneumoperitoneum, the introduction of gas into the abdominal cavity. It can act as a simple asphyxiant by displacing the amount of oxygen in the air necessary to support life. Lower fluorides of sulfur, some of which are toxic, may be produced if sulfur hexafluoride is subjected to electrical discharge. Personnel must guard against the inhalation of the gas after electrical discharge. ACGIH recommends a Threshold Limit Value-Time-Weighted Average (TLV-TWA) of 1000 ppm (5970 mg/m3 ) for sulfur hexafluoride. The TLV- TWA is the time-weighted average concentration for a normal 8-hour workday and a 40-hour workweek, to which nearly all workers may be repeatedly exposed, day after day, without adverse effect. OSHA lists an 8-hour Time-Weighted Average- Permissible Exposure Limit (TWA-PEL) of 1000 ppm (6000 mg/m3 ) for sulfur hexafluoride. TWA-PEL is the exposure limit that shall not be exceeded by the 8-hour TWAin any 8-hour work shift ofa 40-hour workweek.

METHOD OF MANUFACTURE

Sulfur hexafluoride is made commercially by the direct fluorination of molten sulfur. Some higher and lower toxic fluorides formed in the process are removed, and the commercial product is more than 99.5 mole percent pure. A high-purity etchant grade is also available for the electronics industry. Common impurities include small amounts of carbon tetrafluoride, nitrogen, and water vapor.

Acute intravenous toxicity

Rabbit LD50: 5790 mg/kg

Storage characteristics

Treasury ventilation low-temperature drying; Handle gently.

Description

Sulfur hexafluoride is a colorless, odorless, nontoxic, nonflammable gas that has a high dielectric strength and serves widely as an insulating gas in electrical equipment. At atmospheric pressures it sublimes directly from the solid to the gas phase and does not have a stable liquid phase unless under a pressure of more than 32 psia (221 kPa, abs). It is shipped as a liquefied compressed gas at its vapor pressure of 298 psig at 70°F (2050 kPa at 21.1°C). One of the most chemically inert gases known, it is completely stable in the presence of most materials to temperatures of about 400°F (204°C) and has shown no breakdown or reaction in quartz at 900°F (482°C). Sulfur hexafluoride is slightly soluble in water and oil. No change in pH occurs when distilled water is saturated with sulfur hexafluoride.

Physical properties

Colorless, odorless gas; density 6.41 g/L; about five times heavier than air; liquefies at -50.7°C (triple point); density of liquid 1.88 g/mL at -50.7°C; sublimes at -63.8°C; critical temperature 45.54°C; critical pressure 37.13 atm; critical volume 199 cm3/mol; slightly soluble in water; soluble in ethanol.

Preparation

Sulfur hexachloride may be prepared by reacting fluorine with sulfur or sulfur dioxide.

Brand name

SonoVue (for the microbubble formulation) (Ausimont).

Reactivity Profile

This substance undergoes chemical reactions only under relatively severe circumstances. They are resistant to ignition, although they may become flammable at very high temperatures. They may be resistant to oxidation reduction, except in the most severe conditions. These materials may be nontoxic. They can asphyxiate. Contact of very cold liquefied gas with water may result in vigorous or violent boiling of the product and extremely rapid vaporization due to the large temperature differences involved. If the water is hot, there is the possibility that a liquid "superheat" explosion may occur. Pressures may build to dangerous levels if liquid gas contacts water in a closed container [Handling Chemicals Safely 1980].

Hazard

Asphyxiant.

Health Hazard

Vapors may cause dizziness or asphyxiation without warning. Vapors from liquefied gas are initially heavier than air and spread along ground. Contact with gas or liquefied gas may cause burns, severe injury and/or frostbite. Fire may produce irritating, corrosive and/or toxic gases.

Fire Hazard

Some may burn but none ignite readily. Containers may explode when heated. Ruptured cylinders may rocket.

Flammability and Explosibility

Nonflammable

Materials Uses

Sulfur hexafluoride is noncorrosive to all metals. It may be partially decomposed if subjected to an electrical discharge. Some of the breakdown products are corrosive; this corrosion is enhanced by the presence of moisture or at high temperature. Sulfur hexafluoride decomposes very slightly in the presence of certain metals at temperatures in excess of 400°F (204°C); this effect is most pronounced with silicon and carbon steels. Such breakdown, presumably catalyzed by the metals, is only several tenths of 1 percent over 1 year. Decomposition at elevated temperatures does not occur with aluminum, copper, brass, and silver. Most common gasket materials, including Teflon, neoprene, and natural rubber are suitable for sulfur hexafluoride service.

Safety Profile

This material is chemically inert in the pure state and is considered to be physiologcally inert as well. However, as it is ordinarily obtainable, it can contain variable quantities of the lowsulfur fluorides. Some of these are toxic, very reactive chemically, and corrosive in nature. These materials can hydrolyze on contact with water to yield hydrogen fluoride, which is highly toxic and very corrosive. In high concentrations and when pure it may act as a simple asphyxiant. Incompatible with disilane. Vigorous reaction with disilane. May explode. When heated to decomposition emits highly toxic fumes of Fand SOx.

Potential Exposure

May contain highly toxic sulfur pentafluoride as an impurity. SF6 is used in various electric power applications as a gaseous dielectric or insulator. The most extensive use is in high-voltage transformers. SF6 is also used in waveguides, linear particle accelerators; Van de Graaff generators; chemically pumped continuous-wave lasers; transmission lines; and power distribution substations. Nonelectrical applications include use as a protective atmosphere for casting of magnesium alloys and use as a leak detector or in tracing moving air masses. Several sources note that vitreous substitution of SF6 in owl monkeys results in a greater ocular vascular permeability than that caused by saline. This implies that SF6 could have an important use in retinal surgery.

Physiological effects

Sulfur hexafluoride is completely nontoxic, and in fact has been used medically with humans in cases involving pneumoperitoneum, the introduction of gas into the abdominal cavity. It can act as a simple asphyxiant by displacing the amount of oxygen in the air necessary to support life. Lower fluorides of sulfur, some of which are toxic, may be produced if sulfur hexafluoride is subjected to electrical discharge. Personnel must guard against the inhalation of the gas after electrical discharge. ACGIH recommends a Threshold Limit Value-Time-Weighted Average (TLV-TWA) of 1000 ppm (5970 mg/m3) for sulfur hexafluoride. The TLV- TWA is the time-weighted average concentration for a normal 8-hour workday and a 40-hour workweek, to which nearly all workers may be repeatedly exposed, day after day, without adverse effect. OSHA lists an 8-hour Time-Weighted Average-Permissible Exposure Limit (TWA-PEL) of 1000 ppm (6000 mg/m3) for sulfur hexafluoride. TWA-PEL is the exposure limit that shall not be exceeded by the 8-hour TWAin any 8-hour work shift of a 40-hour workweek.

storage

All ofthe precautions necessary for the handling of any nonflammable gas must be taken.

Shipping

UN1080 Sulfur hexafluoride, Hazard Class: 2.2; Labels: 2.2-Nonflammable compressed gas. Cylinders must be transported in a secure upright position, in a wellventilated truck. Protect cylinder and labels from physical damage. The owner of the compressed gas cylinder is the only entity allowed by federal law (49CFR) to transport and refill them. It is a violation of transportation regulations to refill compressed gas cylinders without the express written permission of the owner.

Incompatibilities

May contain impurities that cause it to hydrolyze on contact with water, forming corrosive and toxic hydrogen fluoride. Vigorous reaction with disilane.

Waste Disposal

Return refillable compressed gas cylinders to supplier. Seal unused cylinders and return to suppliers.

Check Digit Verification of cas no

The CAS Registry Mumber 2551-62-4 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 2,5,5 and 1 respectively; the second part has 2 digits, 6 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 2551-62:
(6*2)+(5*5)+(4*5)+(3*1)+(2*6)+(1*2)=74
74 % 10 = 4
So 2551-62-4 is a valid CAS Registry Number.
InChI:InChI=1/2FH.H2S/h2*1H;1H2/q;;+2/p-2

2551-62-4SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 14, 2017

Revision Date: Aug 14, 2017

1.Identification

1.1 GHS Product identifier

Product name sulfur hexafluoride

1.2 Other means of identification

Product number -
Other names 1,4-Benzenedicarboxylic acid,2-sulfo

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:2551-62-4 SDS

2551-62-4Synthetic route

xenon fluoride

xenon fluoride

dithionitronium hexafluoroarsenate
80485-40-1

dithionitronium hexafluoroarsenate

A

bis(difluorothio)nitronium hexafluoroarsenate(V)
88446-29-1

bis(difluorothio)nitronium hexafluoroarsenate(V)

B

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
With fluorosulfonyl fluoride In not given XeF2 was condensed onto a frozen mixure of S2NAsF6 and SO2F2, mixt. wasstirred and shaken for 0.5 h at 0°C, mixt. was stirred at room temp. for 12h; volatiles were removed, product was dissolved in SO2, than SO2 was removed , product was recrystd. from SO2-SO2ClF; elem. anal.;A 99%
B <1
hydrogen fluoride
7664-39-3

hydrogen fluoride

sulfur dioxide
7446-09-5

sulfur dioxide

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

thionyl tetrafluoride
173009-97-7, 118492-84-5, 13709-54-1

thionyl tetrafluoride

C

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
In hydrogen fluoride byproducts: OF2; Electrolysis; 16°C, 6-8 Volt,;A 90.4%
B n/a
C n/a
In hydrogen fluoride byproducts: OF2; aq. HF; Electrolysis; 16°C, 6-8 Volt,;A 90.4%
B n/a
C n/a
fluorine
7782-41-4

fluorine

sulfur
7704-34-9

sulfur

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
In further solvent(s) fluorination (N2 carrier gas (ratio F/N2 1:5), 0 to -5°C, als solvent freon-11); low temp. fractional condensation; IR spectroscopy;90%
pentafluoro(fluorochloroamido)sulfur
74542-21-5

pentafluoro(fluorochloroamido)sulfur

A

(fluoroamido)pentafluorosulfur
74542-22-6

(fluoroamido)pentafluorosulfur

B

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
With Hg; CF3COOH In neat (no solvent) byproducts: ClHgOC(O)CF3; mixt. warmed in a reactor from -196°C to 0°C and stirred for 5 h; pumped through traps at -78, -110 and -196°C;A 90%
B n/a
fluorine
7782-41-4

fluorine

sulfur
7704-34-9

sulfur

A

disulfur decafluoride
5714-22-7

disulfur decafluoride

B

disulfur difluoride
13709-35-8

disulfur difluoride

C

sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

D

hydrogen fluoride
7664-39-3

hydrogen fluoride

E

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
In neat (no solvent) byproducts: OF2; introduction of F2 into steel chamber, sulfur in compartments; detailed description of apparatus and handling given;; first passing through Ni (or Monel) tube (400°C); second Cu column (H2O sprayed); passed into steel column (containing carbon/Fe shavings; aq. NaOH sprayed); dried in column (containing solid NaOH, BaO or P2O5);;A n/a
B n/a
C n/a
D n/a
E 87%
(fluoroamido)pentafluorosulfur
74542-22-6

(fluoroamido)pentafluorosulfur

(fluoroimido)tetrafluorosulfur
74542-20-4

(fluoroimido)tetrafluorosulfur

B

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
With KF In neat (no solvent) byproducts: OSF2, CF3C(O)F, KF*HF; SF5NHF was condensed to the reactor with KF at -196°C, the reactor was held at 0°C for 7 h; pumped through traps at -110, -125 and -196°C;A 85%
B n/a
thiazyl trifluoride
15930-75-3

thiazyl trifluoride

chlorine monofluoride
7790-89-8

chlorine monofluoride

fluorine
7782-41-4

fluorine

A

(SF4NCl)2
79593-52-5

(SF4NCl)2

B

pentafluoro(fluorochloroamido)sulfur
74542-21-5

pentafluoro(fluorochloroamido)sulfur

C

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
In neat (no solvent) The reactor with SF3N and ClF was warmed from -196°C to -78°C over 14 h; addn. of F2, warming; pumped through traps at -78, -115, and -196°C;A n/a
B 75%
C n/a
sulfur dioxide
7446-09-5

sulfur dioxide

fluorine
7782-41-4

fluorine

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

oxygen
80937-33-3

oxygen

C

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
In neat (no solvent) heating in cooled copper tube (water) to 650°C; description of apparatus given;; condensed (liquid O2); passed through flasks containing H2O and hot aq. KOH; dried over P2O5;;A n/a
B n/a
C 70%
tetrafluorohydrazine
10036-47-2

tetrafluorohydrazine

pentafluoro(1,1,2,2,2-pentafluoroethyl)-λ6-sulfane
354-67-6

pentafluoro(1,1,2,2,2-pentafluoroethyl)-λ6-sulfane

A

carbon tetrafluoride
75-73-0

carbon tetrafluoride

B

Hexafluoroethane
76-16-4

Hexafluoroethane

C

Perfluoroethylamine
354-80-3

Perfluoroethylamine

D

sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

E

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
NF3 formed too;A n/a
B n/a
C 70%
D n/a
E n/a
NF3 formed too;A n/a
B n/a
C 70%
D n/a
E n/a
thiazyl trifluoride
15930-75-3

thiazyl trifluoride

fluorine
7782-41-4

fluorine

A

F5SNSF4
81625-46-9

F5SNSF4

B

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
byproducts: N2; from -78 to 20°C;A 50%
B n/a
bis(pentafluorosulfur) peroxide
12395-41-4

bis(pentafluorosulfur) peroxide

sulfur dioxide
7446-09-5

sulfur dioxide

A

thionyl tetrafluoride
173009-97-7, 118492-84-5, 13709-54-1

thionyl tetrafluoride

B

pentafluorosulfur fluorosulfonate
81439-35-2

pentafluorosulfur fluorosulfonate

C

sulfur trioxide
7446-11-9

sulfur trioxide

D

thionyl fluoride
7783-42-8

thionyl fluoride

E

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
byproducts: SiF4, sulfur; other Radiation; photochemical reaction with 253.7 nm radiation, 48 h;A n/a
B 45%
C n/a
D n/a
E n/a
thiocyanogen
505-14-6

thiocyanogen

fluorine
7782-41-4

fluorine

A

thiazyl trifluoride
15930-75-3

thiazyl trifluoride

B

sulphur cyanide pentafluoride
1512-13-6

sulphur cyanide pentafluoride

C

sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

D

thionyl fluoride
7783-42-8

thionyl fluoride

E

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
In further solvent(s) byproducts: (FCN)3; reactn. of a soln. of dirhodane in FCl2C-CClF2 with diluted F2 (F2:N2 0 1:10); cooled down to -183°C; solvent removed by condensation; mixt. condensed to aq. KOH-soln. at room temp. to remove SF4, SOF and (FCN)3; sepn. by fractionated condensation at -127°C, -140°C, -196°C;A 8%
B 5%
C 30%
D 40%
E 3%
pentafluorosulfur hypofluorite
15179-32-5

pentafluorosulfur hypofluorite

sulfur dioxide
7446-09-5

sulfur dioxide

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

pentafluorosulfur fluorosulfonate
81439-35-2

pentafluorosulfur fluorosulfonate

C

sulfur trioxide
7446-11-9

sulfur trioxide

D

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
10 h, 50°C; SO3 and SF5OSO2F was separated by water;
bis(pentafluorosulfur) peroxide
12395-41-4

bis(pentafluorosulfur) peroxide

sulfur dioxide
7446-09-5

sulfur dioxide

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

thionyl tetrafluoride
173009-97-7, 118492-84-5, 13709-54-1

thionyl tetrafluoride

C

bis(pentafluorosulfur)oxide
42310-84-9

bis(pentafluorosulfur)oxide

D

pentafluorosulfur fluorosulfonate
81439-35-2

pentafluorosulfur fluorosulfonate

E

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
byproducts: SiF4; in a Ni-autoclave, 225°C, 5 h, further products; distn.;
disulfur decafluoride
5714-22-7

disulfur decafluoride

sulfur dioxide
7446-09-5

sulfur dioxide

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

pentafluorosulfur fluorosulfonate
81439-35-2

pentafluorosulfur fluorosulfonate

C

sulfur trioxide
7446-11-9

sulfur trioxide

D

thionyl fluoride
7783-42-8

thionyl fluoride

E

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
byproducts: SiF4, sulfur; other Radiation; photochemical reaction with 253.7 nm radiation, in glass vessel;
nitrogen trifluoride
7783-54-2

nitrogen trifluoride

sulfur trioxide
7446-11-9

sulfur trioxide

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
under pressure, 230-440 °C, molar ratio 1:1;
nitrogen trifluoride
7783-54-2

nitrogen trifluoride

sulfur trioxide
7446-11-9

sulfur trioxide

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
under pressure, 230-440 °C, molar ratio of NF3:SO3 = 2:1;
dioxygen difluoride
7783-44-0

dioxygen difluoride

hydrogen sulfide
7783-06-4

hydrogen sulfide

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
byproducts: O2, HF; 130 to 195 K;
byproducts: O2, HF; 130 to 195 K;
oxygen

oxygen

sulfur hexafluoride anion

sulfur hexafluoride anion

A

oxygen anion

oxygen anion

B

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
In neat (no solvent, gas phase) Kinetics; at 298 K; not isolated, detected by mass spectra;
fluorine
7782-41-4

fluorine

sulfur
7704-34-9

sulfur

A

disulfur decafluoride
5714-22-7

disulfur decafluoride

B

disulfur difluoride
13709-35-8

disulfur difluoride

C

sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

D

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
In neat (no solvent) F2 and burning sulfur;;
In neat (no solvent) F2 and burning sulfur;;
hydrogen fluoride
7664-39-3

hydrogen fluoride

hydrogen sulfide
7783-06-4

hydrogen sulfide

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
With potassium fluoride In hydrogen fluoride Electrochem. Process; 5% KF, electrofluorination;
With sodium fluoride In hydrogen fluoride Electrochem. Process; 5% NaF, electrofluorination;
With NaF In hydrogen fluoride HF (liquid); Electrochem. Process; 5% NaF, electrofluorination;
With KF In hydrogen fluoride HF (liquid); Electrochem. Process; 5% KF, electrofluorination;
ammonium thiocyanate

ammonium thiocyanate

potassium dihydrogen trifluoride

potassium dihydrogen trifluoride

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

nitrogen
7727-37-9

nitrogen

C

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

D

dinitrogen monoxide
10024-97-2

dinitrogen monoxide

Conditions
ConditionsYield
In neat (no solvent) byproducts: CF4, CO2; Electrochem. Process; electrofluorination in a molten KH2F3 at 120°C ( amorphous carbon used as anode, Pt-rod as reference electrode); gas chromy., IR;
sodium nitrate
7631-99-4

sodium nitrate

sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

A

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

B

thionyl tetrafluoride
173009-97-7, 118492-84-5, 13709-54-1

thionyl tetrafluoride

C

sodium fluoride

sodium fluoride

D

thionyl fluoride
7783-42-8

thionyl fluoride

E

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
byproducts: N2, NO; 200 - 300°C, 8 h; content of formed gas mixture: 27 vol.-% SOF4, 27 vol.-% SOF2, 5.2 vol.-% SF6, 1 vol.-% SO2F2, 35 vol.-% N2, 1 vol.-% NO;
byproducts: N2, NO; 200 - 300°C, 8 h; content of formed gas mixture: 27 vol.-% SOF4, 27 vol.-% SOF2, 5.2 vol.-% SF6, 1 vol.-% SO2F2, 35 vol.-% N2, 1 vol.-% NO;
hydrogen sulfide
7783-06-4

hydrogen sulfide

A

sulfur
7704-34-9

sulfur

B

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
With FH*F0.5K0.5 byproducts: F2; Electrochem. Process; electrolyte: KF*2HF; anode: amorphous carbon; temp.: 120°C;
hydrogen sulfide
7783-06-4

hydrogen sulfide

fluorine
7782-41-4

fluorine

A

disulfur difluoride
13709-35-8

disulfur difluoride

B

sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

C

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
Kinetics; byproducts: HF; reaction of H2S and F2 in inert gases;
hydrogen sulfide
7783-06-4

hydrogen sulfide

fluorine
7782-41-4

fluorine

A

sulfur tetrafluoride
7783-60-0

sulfur tetrafluoride

B

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
Kinetics; byproducts: HF; reaction of gaseous H2S and F2 in inert gases (He, Ar, N2, CF4, or CO2); determined by IR spectroscopy;
silver fluoride

silver fluoride

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Conditions
ConditionsYield
With chlorine; sulfur In neat (no solvent) heating for 3-5 hours at 400-500°C in presence of Cl2;;
With chlorine; sulfur In neat (no solvent) heating for 3-5 hours at 400-500°C in presence of Cl2;;
bis(pentamethylcyclopentadienyl)chromium
74507-61-2

bis(pentamethylcyclopentadienyl)chromium

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

bis(pentamethylcyclopentadienyl)chromocinium (pentafluoro)bis(pentamethylcyclopentadienyl)dichromate(III)
942422-06-2

bis(pentamethylcyclopentadienyl)chromocinium (pentafluoro)bis(pentamethylcyclopentadienyl)dichromate(III)

Conditions
ConditionsYield
In hexane (N2); Schlenk technique; SF6 was syringed to soln. of Cr complex in hexane; flask was swirled several times; left to sit for 2 h; supernatant removed; residue washed (toluene, pentane); dried (vac.); elem. anal.;85%
[Rh(H){9,9-dimethyl-4,5-bis(ditert-butylphosphino)xanthene}]

[Rh(H){9,9-dimethyl-4,5-bis(ditert-butylphosphino)xanthene}]

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

[Rh(FHF){9,9-dimethyl-4,5-bis(ditert-butylphosphino)xanthene}]

[Rh(FHF){9,9-dimethyl-4,5-bis(ditert-butylphosphino)xanthene}]

Conditions
ConditionsYield
In (2)H8-toluene at -196 - 20℃; under 760.051 Torr; for 96h; Inert atmosphere;83%
triethylsilane
617-86-7

triethylsilane

[Rh(μ-H)(1,3-bis(diisopropylphosphanyl)propane)]2

[Rh(μ-H)(1,3-bis(diisopropylphosphanyl)propane)]2

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

[Rh2(μ-H)(μ-SSiEt3)(1,3-bis(diisopropylphosphanyl)propane)2]

[Rh2(μ-H)(μ-SSiEt3)(1,3-bis(diisopropylphosphanyl)propane)2]

Conditions
ConditionsYield
In toluene at 20℃; under 760.051 Torr; for 240h; Temperature; Time; Solvent; Inert atmosphere;72%
trichlorothiophosphine
3982-91-0

trichlorothiophosphine

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

A

ClS2(1+)
80799-96-8

ClS2(1+)

B

PSCl2(1+)
52826-97-8

PSCl2(1+)

C

PSCl3(1+)

PSCl3(1+)

D

Cl3FP(1+)
64710-27-6

Cl3FP(1+)

E

PCl3(1+)

PCl3(1+)

Conditions
ConditionsYield
In gas Kinetics; byproducts: S2(1+), PFCl3, F; High Pressure; ions generated in an electron impact high-pressure ion source contg. SF6were selected using a quadrupole mass filter before being injected into a region contg. He; 298 K; S*PSCl3(1+), SF, SFCl, S2, ClF, ClP, FS2, S2 (1+), PFCl3, F were also obtained; monitoring by quadrupole mass spectrometer at the end of the flow tube;A 4%
B 14%
C 69%
D 6%
E 3%
trichlorothiophosphine
3982-91-0

trichlorothiophosphine

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

A

FS2(1+)
43431-44-3

FS2(1+)

B

PSCl3(1+)

PSCl3(1+)

C

S*PSCl3(1+)

S*PSCl3(1+)

D

Cl3FP(1+)
64710-27-6

Cl3FP(1+)

E

PCl3(1+)

PCl3(1+)

Conditions
ConditionsYield
In gas Kinetics; byproducts: SF2, F2, PFCl3; High Pressure; the ions were generated in an electron impact high-pressure ion source contg. SF6; the ions were selected using a quadrupole mass filter before being injected into a drift region contg. He carrier gas; 298 K; SF2, F2, PFCl3, FS2, SSF2 were also obtained; monitoring by quadrupole mass spectrometer at the end of the flow tube;;A 8%
B 66%
C 13%
D 8%
E 5%
bis(pentamethylcyclopentadienyl)chromium
74507-61-2

bis(pentamethylcyclopentadienyl)chromium

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

(p-dimethylaminopyridine)di(fluoro)(pentamethylcyclopentadienyl)chromium
942422-04-0

(p-dimethylaminopyridine)di(fluoro)(pentamethylcyclopentadienyl)chromium

Conditions
ConditionsYield
In toluene (N2); Schlenk technique; Me2NC5H4N was added to soln. of Cr complex in toluene; flask was swirled several times; SF6 was syringed; stirred overnight; solvent removed (vac.); washed (toluene, pentane); dried (vac.); elem. anal.;59%
vanadocene

vanadocene

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

(fluoro)bis(cyclopentadienyl)vanadium
942422-03-9

(fluoro)bis(cyclopentadienyl)vanadium

Conditions
ConditionsYield
In toluene (N2); Schlenk technique; SF6 was bubbled through soln. of V complex in toluene; stirred at ambient temp. overnight; filtered through Schlenk frit; concd.; kept at -60°C overnight; elem. anal.;58%
bis(pentamethylcyclopentadienyl)chromium
74507-61-2

bis(pentamethylcyclopentadienyl)chromium

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

[Cr(C5Me5)F3][(μ3-S)(Cr(C5Me5)(μ2-F))3]

[Cr(C5Me5)F3][(μ3-S)(Cr(C5Me5)(μ2-F))3]

Conditions
ConditionsYield
In toluene (N2); Schlenk technique; SF6 was syringed to soln. of Cr complex in toluene; flask was swirled several times; left to sit for 24 h; filtered through Celite; kept at -30°C for 2-3 d; supernatant syringed; dried (vac.); elem. anal.;50%
[((HC(CtBuNC6H3(iPr)2)2)NiI)2(μ-η1:η1-N2)]
1163771-24-1

[((HC(CtBuNC6H3(iPr)2)2)NiI)2(μ-η1:η1-N2)]

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

[(HC(CtBuNC6H3(iPr)2)2)NiIIF]

[(HC(CtBuNC6H3(iPr)2)2)NiIIF]

Conditions
ConditionsYield
In benzene for 168h; Inert atmosphere;40%
SIMes·AlMe3

SIMes·AlMe3

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

C23H32AlFN2

C23H32AlFN2

Conditions
ConditionsYield
In (2)H8-toluene at 70℃; for 15h; Inert atmosphere; Sealed tube;30%
sulfur trioxide
7446-11-9

sulfur trioxide

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

fluorosulfonyl fluoride
640723-20-2, 2699-79-8, 12769-73-2

fluorosulfonyl fluoride

Conditions
ConditionsYield
byproducts: SiF4; 250 °C, closed glass ampoule;20%
bis(pentamethylcyclopentadienyl)chromium
74507-61-2

bis(pentamethylcyclopentadienyl)chromium

toluene
108-88-3

toluene

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

A

[Cr(C5Me5)F3][(μ3-S)(Cr(C5Me5)(μ2-F))3]

[Cr(C5Me5)F3][(μ3-S)(Cr(C5Me5)(μ2-F))3]

B

[Cr8(C5(CH3)5)6F18]*4C7H8

[Cr8(C5(CH3)5)6F18]*4C7H8

Conditions
ConditionsYield
In toluene (N2); Schlenk technique; SF6 was syringed to soln. of Cr complex in toluene; flask was swirled several times; left to sit for 5 d; supernatant syringed; dried (vac.); mechanically septd. in glovebox;A n/a
B 16%
Ch St nanodiamond

Ch St nanodiamond

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

Ch St nanodiamond, SF6 plasma modified

Ch St nanodiamond, SF6 plasma modified

Conditions
ConditionsYield
Plasma;
lanthanum(III) oxide

lanthanum(III) oxide

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

lanthanum(III) fluoride
13709-38-1

lanthanum(III) fluoride

Conditions
ConditionsYield
In neat (no solvent) SF6-stream, powdered oxide, 714°C, exothermic react.;;>99
water
7732-18-5

water

sulfur(VI) hexafluoride
2551-62-4

sulfur(VI) hexafluoride

hydrogen fluoride
7664-39-3

hydrogen fluoride

Conditions
ConditionsYield
In gas Electric Arc; electric discharge or sparking in SF6 at 200 - 300 kPa; not isolated, detected by IR;

2551-62-4Relevant articles and documents

Streng, A.

, p. 1380 - 1385 (1963)

Refinement of the autoneutralization lifetimes of short lived states of SF6-

Appelhans, A. D.,Delmore, J. E.

, p. 5561 - 5570 (1988)

Previous measurements of the autoneutralization lifetime of SF6- indicated there are multiple states (lifetimes) and that the distribution of states is controlled, at least in part, by the temperature of the SF6 molecules prior to electron capture.These measurements indicated the existence of a short lived state with a lifetime of the order of 2 μs.The experimental apparatus has been revised to confirm the existence of the short lived state and provide a more accurate measurement of the lifetime.

The standard molar enthalpy of formation at 298.15 K of VS1.043 by combustion calorimetry in fluorine

Lewis, Brett M.,O'Hare, P. A. G.,Mukdeeprom, Pannee,Edwards, Jimmie G.

, p. 1325 - 1331 (1987)

The standard molar enthalpy of formation ΔfH0m of VS1.043 has been determined by fluorine-combustion calorimetry.The results obtained, -(230.3+/-2.2)kJ*mol-1 at 298.15 K and p0 = 101.325 kP

Schumb, W. C.,Gamble, E. L.

, p. 4302 - 4308 (1930)

F5SN(H)Xe+; a rare example of xenon bonded to sp 3-hybridized nitrogen; synthesis and structural characterization of [F5SN(H)Xe][AsF6]

Smith, Gregory L.,Mercier, Helene P. A.,Schrobilgen, Gary J.

, p. 4173 - 4184 (2009/02/01)

The salt [F5SN(H)Xe][AsF6] has been synthesized by the reaction of [F5SNH3][AsF6] with XeF 2 in anhydrous HF (aHF) and BrF5 solvents and by solvolysis of [F3S=NXeF][AsF6] in aHF. Both F 5SN(H)Xe+ and F5SNH3+ have been characterized by 129Xe, 19F, and 1H NMR spectroscopy in aHF (-20°C) and BrF5 (supercooled to -70°C). The yellow [F5SN(H)Xe][AsF6] salt was crystallized from aHF at -20°C and characterized by Raman spectroscopy at -45°C and by single-crystal X-ray diffraction at -173°C. The Xe-N bond length (2.069(4) A) of the F5SN(H)Xe+ cation is among the shortest Xe-N bonds presently known. The cation interacts with the AsF6- anion by means of a Xe...F-As bridge in which the Xe...F distance (2.634(3) A) is significantly less than the sum of the Xe and F van der Waals radii (3.63 A) and the AsF6 - anion is significantly distorted from Oh symmetry. The 19F and 129Xe NMR spectra established that the [F 5SN(H)Xe][AsF6] ion pair is dissociated in aHF and BrF5 solvents. The F5SN(H)Xe+ cation decomposes by HF solvolysis to F5SNH3+ and XeF 2, followed by solvolysis of F5SNH3+ to SF6 and NH4+. A minor decomposition channel leads to small quantities of F5SNF2. The colorless salt, [F5SNH3][AsF6], was synthesized by the HF solvolysis of F3S≡NAsF5 and was crystallized from aHF at -35°C. The salt was characterized by Raman spectroscopy at -160°C, and its unit cell parameters were determined by low-temperature X-ray diffraction. Electronic structure calculations using MP2 and DFT methods were used to calculate the gas-phase geometries, charges, bond orders, and valencies as well as the vibrational frequencies of F5SNH 3+ and F5SN(H)Xe+ and to aid in the assignment of their experimental vibrational frequencies. In addition to F 5TeN(H)Xe+, the F5SN(H)Xe+ cation provides the only other example of xenon bonded to an sp3-hybridized nitrogen center that has been synthesized and structurally characterized. These cations represent the strongest Xe-N bonds that are presently known.

Pentafluoronitrosulfane, SF5NO2

Lu, Norman,Thrasher, Joseph S.,Von Ahsen, Stefan,Willner, Helge,Hnyk, Drahomir,Oberhammer, Heinz

, p. 1783 - 1788 (2008/10/09)

The synthesis of pentafluoronitrosulfane, SF5NO2, is accomplished either by reacting N(SF5)3 with NO 2 or by the photolysis of a SF5Br/NO2 mixture using diazo lamps. The product is purified by treatment with CsF and repeated trap-to-trap condensation. The solid compound melts at -78°C, and the extrapolated boiling point is 9°C. SF5NO2 is characterized by 19F, 15N NMR, IR, Raman, and UV spectroscopy as well as by mass spectrometry. The molecular structure of SF 5NO2 is determined by gas electron diffraction. The molecule possesses C2v symmetry with the NO2 group staggering the equatorial S-F bonds and an extremely long 1.903(7) A S-N bond. Calculated bond enthalpies depend strongly on the computational method: 159 (MP2/6-311G++(3df)) and 87 kJ mol-1 (B3LYP/6-311++G-(3df)). The experimental geometry and vibrational spectrum are reproduced reasonably well by quantum chemical calculations.

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