256495-17-7Relevant articles and documents
NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME
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Paragraph 0178; 0190; 0191, (2018/08/29)
PROBLEM TO BE SOLVED: To provide a semiconductor material and a coating having high solubility in solvents and having high filling property, high heat resistance, and/or high etching resistance, and to provide a method for manufacturing a semiconductor using the semiconductor material, and to provide a novel compound. SOLUTION: Provided are: a semiconductor material consisting of a specific aromatic hydrocarbon ring derivative; methods for manufacturing a coating and a semiconductor using the semiconductor material; and a compound consisting of a specific aromatic hydrocarbon ring derivative. SELECTED DRAWING: None COPYRIGHT: (C)2018,JPOandINPIT
Hexaphenylbenzene as a rigid template for the straightforward syntheses of "star-shaped" glycodendrimers
Chabre, Yoann M.,Brisebois, Patrick P.,Abbassi, Leila,Kerr, Sheena C.,Fahy, John V.,Marcotte, Isabelle,Roy, Rene
supporting information; experimental part, p. 724 - 727 (2011/03/22)
Original glycodendrimers emanating from propargylated hexaphenylbenzene cores and containing up to 54 peripheral sugar ligands have been synthesized by Cu(I)-catalyzed [1,3]-dipolar cycloadditions using both convergent and divergent approaches.
Hydroxyphenylbenzene derivatives as glass forming molecules for high resolution photoresists
Ober, Christopher K.,De Silva, Anuja
experimental part, p. 1903 - 1910 (2009/09/24)
This paper presents a fundamental study to relate molecular architecture to the amorphous properties of hydroxyphenylbenzene molecular glass derivatives. These studies demonstrates that the branched hydroxyphenylbenzene derivatives can form stable molecular glasses despite the π-π interactions present. Through this research, design concepts to stabilize the amorphous nature and to increase the glass transition temperature (Tg) based on asymmetric molecular structures, bulky substituents, conformation states and molecular size are explored. An understanding of such behavior is important for the development of hydroxyphenylbenzene derivatives as potential molecular photoresists for patterning below 50 nm. This research has helped to identify potential candidates to be evaluated as positive-tone photoresists for lithographic applications for extreme ultraviolet (EUV, λ = 13.4 nm) lithography. The first reported sub-30 nm feature sizes for hydroxyphenylbenzene derivatives were demonstrated with high Tg materials. The Royal Society of Chemistry.