50561-30-3Relevant articles and documents
Pulsed discharge jet spectroscopy of DSiF and the equilibrium molecular structure of monofluorosilylene
Harper, Warren W.,Hostutler, David A.,Clouthier, Dennis J.
, p. 4367 - 4375 (1996)
The jet-cooled laser induced fluorescence excitation spectrum of the ? 1A″- X? 1A′ band system of DSiF has been observed using the pulsed discharge jet technique. Vibrational analysis of the spectrum yielded upper state harmonic vibrational frequencies of ω1 = 1322, ω2 = 444, and ω3 = 867 cm-1. Vibronic bands involving all of the upper state fundamentals of HSiF and DSiF have now been rotationally analyzed, allowing a determination of the excited state equilibrium structure as r′e(SiH) = 1.526 ± 0.014 ?, r′e(SiF) = 1.597 ± 0.003 ?, and θ′e(HSiF) = 115.0 ± 0.6°. The harmonic frequencies and centrifugal distortion constants were used to obtain harmonic force fields and average (rz) structures for the ground and excited states. The ground state average structure was used to estimate the equilibrium structure of r″e(SiH) = 1.528 ± 0.005 ?, r″e(SiF) = 1.603 ± 0.003 ?, and θ″e(HSiF) = 96.9 ± 0.5°.
Unimolecular Decomposition of SiH4, SiH3F, and SiH2F2 at High Temperatures
Koshi, Mitsuo,Kato, Shin,Matsui, Hiroyuki
, p. 1223 - 1227 (2007/10/02)
The thermal decomposition of SiH4, SiH3F, and SiH2F2 diluted in Ar was studied behind incident shock waves by monitoring IR emission from these reactant molecules.The rate constants of the unimolecular decomposition for all of three molecules were found t
Matrix isolation studies of the reactions of silicon atoms: II. Infrared spectrum and structure of matrix-isolated fluorosilylene: HSiF
Ismail, Zakya Kafafi,Fredin, Leif,Hauge, Robert H.,Margrave, John L.
, p. 1626 - 1631 (2007/10/02)
Silicon spontaneously reacts with HF and DF to form the molecules HSiF and DSiF in solid argon.Photolysis of the matrix during deposition greatly enhances the yield of these products.Frequencies for the three infrared active modes of HSiF and DSiF have be
