Welcome to LookChem.com Sign In|Join Free

CAS

  • or

923956-62-1

Post Buying Request

923956-62-1 Suppliers

Recommended suppliersmore

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier
  • Bis(t-butylimido)bis(dimethylamino)molybdenum(VI), 98%

    Cas No: 923956-62-1

  • No Data

  • No Data

  • No Data

  • STREM
  • Contact Supplier

923956-62-1 Usage

General Description

Bis(t-butylimido)bis(dimethylamino)molybdenum(VI), 98% is a chemical compound that is commonly used in organic and inorganic synthesis. It is a molybdenum-based catalyst that is known for its high reactivity and selectivity in a variety of chemical reactions. Bis(t-butylimido)bis(dimethylamino)molybdenum(VI), 98% is often used in the production of polymers, pharmaceuticals, and other organic compounds. It is a dark green solid that is highly soluble in organic solvents, making it easy to work with in a laboratory setting. With a purity of 98%, this compound is highly reliable and effective in its use as a catalyst in various chemical processes.

Check Digit Verification of cas no

The CAS Registry Mumber 923956-62-1 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 9,2,3,9,5 and 6 respectively; the second part has 2 digits, 6 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 923956-62:
(8*9)+(7*2)+(6*3)+(5*9)+(4*5)+(3*6)+(2*6)+(1*2)=201
201 % 10 = 1
So 923956-62-1 is a valid CAS Registry Number.

923956-62-1Downstream Products

923956-62-1Relevant articles and documents

A ORGANIC-METAL PRECIRSOR COMPOUND AND OTHIN FILM PREPARED BY USING THE SAME

-

Paragraph 0197; 0201; 0202, (2020/07/21)

An organometallic precursor compound and an organometallic thin film manufacturing method using the same of the present invention satisfy high volatility and excellent chemical and thermal stability, and at the same time have a significantly improved thin film deposition rate even at low temperatures. In addition, by providing the organometallic precursor compound which can be used to form a dielectric thin film in a semiconductor device, it is possible to manufacture an organic metal-containing and/or metal-containing thin film having alleviated property deterioration due to by-products.COPYRIGHT KIPO 2020

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1

What can I do for you?
Get Best Price

Get Best Price for 923956-62-1