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  • Ion beam modification of NICKEL DIMETHYLGLYOXIME (cas 13478-93-8) dispersed polymer films

  • Add time:08/10/2019    Source:sciencedirect.com

    Different concentrations of NICKEL DIMETHYLGLYOXIME (cas 13478-93-8) (DMG) complex were dispersed in polymethyl methacrylate (PMMA) films. PMMA was synthesized by a solution polymerization technique. These films were irradiated with 80 MeV O6+ ions at a fluence of 1 x 1011 ions/cm2. The dielectric properties were measured as a function of frequency using an LCR meter. The surface morphology was studied by microhardness tester and atomic force microscopy (AFM). It was observed that hardness and electrical conductivity of the films increase with the concentration of the dispersed metal complex and also with the fluence. This suggests that ion beam irradiation promotes metal to polymer adhesion, and converts the polymeric structure into a hydrogen depleted carbon network, which makes the polymer harder and more conductive. Atomic force microscopy shows that the average roughness (Ra) of the irradiated films is lower than that of the unirradiated films.

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    Prev:Recovery of dimethylglyoxime (DMG) from Ni-DMG complexes
    Next:Enzymic oxidation of 3-HYDROXYXANTHINE (cas 13479-29-3) to 3-hydroxyuric acid)

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