Photochemical Micropatterning of Silylated Glass Surface Bearing 3-Phenyldithiopropyl Group by KrF Laser Irradiation
Thin film of 3-phenyldithiopropyltrimethoxysilane (1) was prepared as a photoreactive surface of masked thiol by in-situ reaction of 3-mercaptopropyltrimethoxysilane (2) with diphenyldisulfide before deposition of the film on quartz substrate.The film of 1 undergoes photochemical oxygenation of sulfur atom more efficiently than of 2 upon KrF laser (248 nm) irradiation, where a thiyl redical is incorporated as a common intermediate.
Butyl(3-trimethoxysilylpropyl)disulfide. A new effective reagent for silicon surface modification and protein immobilization; preparation procedure
The synthesis of a new reagent for silicone and similar surface modification and protein immobilization -(n-butyl(3-trimethoxysilylpropyl)disulfide) - and its phenylanalog is presented.