174063-95-7 Usage
Uses
Used in Pharmaceutical Applications:
8,10-Heneicosadiynoic acid is used as a bioactive compound for its potential role in modulating immune responses and inflammation. Its unique structure allows it to interact with biological systems, making it a promising candidate for the development of new pharmaceuticals targeting various inflammatory and immune-related conditions.
Used in Antimicrobial Applications:
8,10-Heneicosadiynoic acid is used as an antimicrobial agent due to its potential to inhibit the growth of certain microorganisms. Its presence in natural sources and its ability to target specific microbial pathways make it a valuable component in the development of new antimicrobial therapies and products.
Used in Industrial Applications:
8,10-Heneicosadiynoic acid is used as a bioactive compound in various industrial applications, including the development of new materials and products with enhanced properties. Its unique structure and potential for interaction with other compounds make it a valuable component in the creation of innovative industrial products.
Used in Medical Research:
8,10-Heneicosadiynoic acid is used as a subject of medical research to further explore its potential applications and mechanisms of action. Studies are being conducted to better understand its effects on immune responses, inflammation, and other biological processes, with the aim of identifying new therapeutic targets and developing novel treatments for various diseases and conditions.
Check Digit Verification of cas no
The CAS Registry Mumber 174063-95-7 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 1,7,4,0,6 and 3 respectively; the second part has 2 digits, 9 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 174063-95:
(8*1)+(7*7)+(6*4)+(5*0)+(4*6)+(3*3)+(2*9)+(1*5)=137
137 % 10 = 7
So 174063-95-7 is a valid CAS Registry Number.
InChI:InChI=1/C21H34O2/c1-2-3-4-5-6-7-8-9-10-11-12-13-14-15-16-17-18-19-20-21(22)23/h2-10,15-20H2,1H3,(H,22,23)
174063-95-7Relevant articles and documents
Plenty of Room at the Top: A Multi-Scale Understanding of nm-Resolution Polymer Patterning on 2D Materials
Brooks, Jacob T.,Claridge, Shelley A.,Davis, Tyson C.,Hayes, Tyler R.,Shi, Anni,Singh, Anamika,Villarreal, Terry A.
supporting information, p. 25436 - 25444 (2021/10/29)
Lamellar phases of alkyldiacetylenes in which the alkyl chains lie parallel to the substrate represent a straightforward means for scalable 1-nm-resolution interfacial patterning. This capability has the potential for substantial impacts in nanoscale electronics, energy conversion, and biomaterials design. Polymerization is required to set the 1-nm functional patterns embedded in the monolayer, making it important to understand structure–function relationships for these on-surface reactions. Polymerization can be observed for certain monomers at the single-polymer scale using scanning probe microscopy. However, substantial restrictions on the systems that can be effectively characterized have limited utility. Here, using a new multi-scale approach, we identify a large, previously unreported difference in polymerization efficiency between the two most widely used commercial diynoic acids. We further identify a core design principle for maximizing polymerization efficiency in these on-surface reactions, generating a new monomer that also exhibits enhanced polymerization efficiency.