- Reaction of Hydrogen Peroxide with Organosilanes under Chemical Vapour Deposition Conditions
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When a stream of vapour at low pressure which contained a mixture of H2O2 with an organosilane, RSiH3 (R = alkyl or alkenyl), impinged on a silicon wafer, deposition of oxide films of nominal composition RxSiO(2-0.5x), where x 3 or higher alkenyl groups. or higher alkenylgroups. Possible mechanism for the Si-C bond cleavage reaction are discussed, with energetic rearrangement of radical intermediates of type Si(H)(R)(OOH)' being favoured.
- Moore, Darren L.,Taylor, Mark P.,Timms, Peter L.
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p. 2673 - 2678
(2007/10/03)
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- Synthesis and characterization of mono-, bis-, tris-, and tetrakis(trimthylsilylmethyl)silanes: (Me3SiCH2)xSiH4-x (x = 1-4)
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The mono-, bis-, tris, and tetrakis(trimethylsilylmethyl)silanes, (Me3SiCH2)xSiH4-x(x = 1-4), have been prepared for use as "models" of the various Si-centered functional units in a complex, highly branched polycarbosilane polymer of the approximate composition, "(SiH2CH2)n".These compounds have been characterized by GC, IR, 1H, 13C, 29Si NMR, MS, and elemental analysis.The IR and NMR data for this series of compounds show distinct trends on increasing substitution, which are related to the structural differences within the series.
- Whitmarsh, Chris K.,Interrante, Leonard V.
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