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N-(N-hexadecyl)formamide is a chemical compound belonging to the class of amides, characterized by a hexadecyl group attached to the nitrogen atom of the formamide molecule. It is known for its ability to enhance the solubility of hydrophobic substances in aqueous solutions and is commonly used in various industrial and research applications.

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  • 53396-33-1 Structure
  • Basic information

    1. Product Name: N-(N-HEXADECYL)FORMAMIDE
    2. Synonyms: N-(N-HEXADECYL)FORMAMIDE;N-FORMYL-N-HEXADECYLAMINE
    3. CAS NO:53396-33-1
    4. Molecular Formula: C17H35NO
    5. Molecular Weight: 269.47
    6. EINECS: N/A
    7. Product Categories: N/A
    8. Mol File: 53396-33-1.mol
  • Chemical Properties

    1. Melting Point: 43-44 °C
    2. Boiling Point: 401.7°C at 760 mmHg
    3. Flash Point: 248.9°C
    4. Appearance: /
    5. Density: 0.854g/cm3
    6. Vapor Pressure: 1.16E-06mmHg at 25°C
    7. Refractive Index: 1.449
    8. Storage Temp.: N/A
    9. Solubility: N/A
    10. PKA: 16.39±0.23(Predicted)
    11. CAS DataBase Reference: N-(N-HEXADECYL)FORMAMIDE(CAS DataBase Reference)
    12. NIST Chemistry Reference: N-(N-HEXADECYL)FORMAMIDE(53396-33-1)
    13. EPA Substance Registry System: N-(N-HEXADECYL)FORMAMIDE(53396-33-1)
  • Safety Data

    1. Hazard Codes: N/A
    2. Statements: N/A
    3. Safety Statements: 24/25
    4. WGK Germany:
    5. RTECS:
    6. HazardClass: N/A
    7. PackingGroup: N/A
    8. Hazardous Substances Data: 53396-33-1(Hazardous Substances Data)

53396-33-1 Usage

Uses

Used in Emulsion Production:
N-(N-hexadecyl)formamide is used as a surfactant for the production of emulsions, due to its ability to stabilize oil and water mixtures.
Used in Organic Synthesis:
N-(N-hexadecyl)formamide serves as a solvent in organic synthesis, facilitating various chemical reactions.
Used in Chemical Reactions:
N-(N-hexadecyl)formamide is utilized as a component in various chemical reactions, contributing to the formation of desired products.
Used in Solubility Enhancement:
N-(N-hexadecyl)formamide is used to enhance the solubility of hydrophobic substances in aqueous solutions, making it useful in processes where increased solubility is required.

Check Digit Verification of cas no

The CAS Registry Mumber 53396-33-1 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 5,3,3,9 and 6 respectively; the second part has 2 digits, 3 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 53396-33:
(7*5)+(6*3)+(5*3)+(4*9)+(3*6)+(2*3)+(1*3)=131
131 % 10 = 1
So 53396-33-1 is a valid CAS Registry Number.
InChI:InChI=1/C17H35NO/c1-2-3-4-5-6-7-8-9-10-11-12-13-14-15-16-18-17-19/h17H,2-16H2,1H3,(H,18,19)

53396-33-1 Well-known Company Product Price

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  • Alfa Aesar

  • (B20404)  N-(n-Hexadecyl)formamide, 97%   

  • 53396-33-1

  • 10g

  • 1105.0CNY

  • Detail
  • Alfa Aesar

  • (B20404)  N-(n-Hexadecyl)formamide, 97%   

  • 53396-33-1

  • 50g

  • 2659.0CNY

  • Detail

53396-33-1SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 18, 2017

Revision Date: Aug 18, 2017

1.Identification

1.1 GHS Product identifier

Product name N-hexadecylformamide

1.2 Other means of identification

Product number -
Other names N-FORMYL-N-HEXADECYLAMINE

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:53396-33-1 SDS

53396-33-1Downstream Products

53396-33-1Relevant articles and documents

KOtBu-Promoted Transition-Metal-Free Transamidation of Primary and Tertiary Amides with Amines

Ghosh, Tridev,Jana, Snehasish,Dash, Jyotirmayee

supporting information, p. 6690 - 6694 (2019/09/12)

This work discloses transamidation of primary and tertiary amides with a range of aryl, heteroaryl, and aliphatic amines using potassium tert-butoxide. The reaction proceeds at room temperature under transition-metal-free conditions providing secondary amides in high yields. Moreover, reaction of cyclopropyl amine with tertiary amides proceeds with ring-opening to provide a rapid access to enamides.

Supported nano-gold-catalyzed N-formylation of amines with paraformaldehyde in water under ambient conditions

Ke, Zhengang,Zhang, Yan,Cui, Xinjiang,Shi, Feng

, p. 808 - 816 (2016/02/12)

A simple and efficient Au/Al2O3 catalyst was prepared by the co-precipitation method for the oxidative N-formylation of amines with paraformaldehyde. Under the optimized reaction conditions, excellent amine conversion and N-formamide selectivity can be obtained with up to 97% yield with water as the solvent under ambient conditions. This catalyst tolerated a wide range of primary amines and second amines, and it can be reused for at least five runs without obvious deactivation.

Multicomponent synthesis of Ugi-type ceramide analogues and neoglycolipids from lipidic isocyanides

Perez-Labrada, Karell,Brouard, Ignacio,Mendez, Inmaculada,Rivera, Daniel G.

experimental part, p. 4660 - 4670 (2012/07/27)

Unique types of ceramide and glycolipid architectures were obtained by means of Ugi reactions incorporating lipidic isocyanides as surrogates of sphingolipids. The multicomponent nature of this approach allowed for a highly efficient assembly process, whe

Comprehensive investigation of self-assembled monolayer formation on ferromagnetic thin film surfaces

Hoertz, Paul G.,Niskala, Jeremy R.,Dai, Peng,Black, Hayden T.,You, Wei

supporting information; experimental part, p. 9763 - 9772 (2009/02/04)

We report a simple, universal method for forming high surface coverage SAMs on ferromagnetic thin (≤100 nm) films of Ni, Co, and Fe. Unlike previous reports, our technique is broadly applicable to different types of SAMs and surface types. Our data constitutes the first comprehensive examination of SAM formation on three different ferromagnetic surface types using two different surface-binding chemistries (thiol and isocyanide) under three different preparation conditions: (1) SAM formation on electroreduced films using a newly developed electroreduction approach, (2) SAM formation on freshly evaporated surfaces in the glovebox, and (3) SAM formation on films exposed to atmospheric conditions beforehand. The extent of SAM formation for all three conditions was probed by cyclic voltammetry for surfaces functionalized with either (11-thiolundecyl)ferrocene (Fc-(CH2)11-SH) or (11-isocyanoundecyl)ferrocene (Fc-(CH2)11-NC). SAM formation was also probed for straight-chain molecules, hexadecanethiol and hexadecaneisocyanide, with contact angle measurements, X-ray photoelectron spectroscopy, and reflection-absorption infrared spectroscopy (RAIRS). The results show that high surface coverage SAMs with low surface-oxide content can be achieved for thin, evaporated Ni and Co films using our electroreduction process with thiols. The extent of SAM formation on electroreduced films is comparable to what has been observed for SAMs/Au and to what we observe for SAMs/Ni, Co, and Fe samples prepared in the glovebox.

Rapid and Selective Formylation With Pentafluorophenyl Formate

Kisfaludy, Lajos,Oetvoes, Laszlo

, p. 510 (2007/10/02)

Pentafluorophenyl formate reacts smoothly with N-nucleophiles under mild conditions to give the N-formyl derivatives, whereas O- and S-nucleophiles remain unaffected even in the presence of a tertiary base.

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