66548-21-8 Usage
Uses
Used in Organic Synthesis:
Tert-butyl-methoxy-dimethylsilane is used as a protecting group for alcohol functional groups in organic synthesis, allowing chemists to temporarily mask these groups during reactions to prevent unwanted side reactions.
Used in Pharmaceutical Production:
In the pharmaceutical industry, tert-butyl-methoxy-dimethylsilane is utilized as a reagent in the synthesis of various drugs, contributing to the development of new medicinal compounds.
Used in Agrochemical Production:
Similarly, in agrochemical manufacturing, this compound is employed to synthesize a range of products, including pesticides and herbicides, enhancing crop protection and yield.
Used in Specialty Chemicals Production:
Tert-butyl-methoxy-dimethylsilane is also used in the creation of specialty chemicals, which are tailored for specific applications in various industries, such as coatings, adhesives, and materials science.
Used in Research and Development Laboratories:
In research settings, this compound is a valuable tool for exploring new synthetic pathways and developing innovative chemical processes, further expanding the horizons of chemical science and technology.
Check Digit Verification of cas no
The CAS Registry Mumber 66548-21-8 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 6,6,5,4 and 8 respectively; the second part has 2 digits, 2 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 66548-21:
(7*6)+(6*6)+(5*5)+(4*4)+(3*8)+(2*2)+(1*1)=148
148 % 10 = 8
So 66548-21-8 is a valid CAS Registry Number.
66548-21-8Relevant articles and documents
Hafnium Triflate as a Highly Potent Catalyst for Regio- and Chemoselective Deprotection of Silyl Ethers
Zheng, Xiu-An,Kong, Rui,Huang, Hua-Shan,Wei, Jing-Ying,Chen, Ji-Zong,Gong, Shan-Shan,Sun, Qi
, p. 944 - 953 (2019/02/10)
As a Group IVB transition metal Lewis acid, hafnium triflate [Hf(OTf) 4 ] exhibited exceptionally high potency in desilylations. Since the amounts of Hf(OTf) 4 required for the deprotection of 1°, 2°, 3° alkyl and aryl tert -butyldimethylsilyl (TBS) ethers are significantly different, ranging from 0.05 mol% to 3 mol%, regioselective deprotection of TBS could be easily implemented. Moreover, chemoselective cleavage of different silyl ethers or removal of TBS in the presence of most hydroxyl protecting groups was also accomplished. NMR analyses of silyl products from TBS deprotection indicated that Hf(OTf) 4 -catalyzed desilylation may proceed via different mechanisms, depending on the solvent used.