101947-16-4

Basic information

• Product Name: 1H,1H,2H,2H-PERFLUORODECYLTRIETHOXYSILANE
• Synonyms: PERFLUOROALKYLTRIETHOXYSILANE;TRIETHOXY-1H,1H,2H,2H-PERFLUORODECYLSILANE;1H,1H,2H,2H-PERFLUORODECYLTRIETHOXYSILANE;(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)TRIETHOXYSILANE;(HEPTADECAFLUORO-1,1,2,2-TETRAHYDRODECYL)-1-TRIETHOXYSILANE;(Heptadecafluoro-1,1,2,2-tetrahydrodecyl)triethoxysilane? Perfluorodecyltriethoxysilane;PERFLUOROOCTYLETHYL TRIETHOXYSILANE;1H,1H,2H,2H-PERFLUORODECYLTRIETHOXYSILA&
• CAS NO: 101947-16-4
• Molecular Formula: C₁₆H₁₉F₁₇O₃Si
• Molecular Weight: 610.38
• EINECS: -0
• Product Categories: silicone additives
• Mol File: 101947-16-4.mol

Chemical Properties

• Boiling Point: 209-230 °C
• Flash Point: >230 °F
• Appearance: /
• Density: 1.389 g/mL at 25 °C
• Vapor Pressure: 0.00187mmHg at 25°C
• Refractive Index: n20/D 1.342
• Storage Temp.: under inert gas (nitrogen or Argon) at 2-8°C
• Solubility: Miscible with ethanol and tetrahydrofuran.
• Sensitive: Moisture Sensitive
• CAS DataBase Reference: 1H,1H,2H,2H-PERFLUORODECYLTRIETHOXYSILANE(CAS DataBase Reference)
• NIST Chemistry Reference: 1H,1H,2H,2H-PERFLUORODECYLTRIETHOXYSILANE(101947-16-4)
• EPA Substance Registry System: 1H,1H,2H,2H-PERFLUORODECYLTRIETHOXYSILANE(101947-16-4)

Safety Data

• Hazard Codes: C
• Statements: 34
• Safety Statements: 26-36/37/39-45
• RIDADR: UN 1760 8/PG 3
• WGK Germany: 3
• TSCA: No
• HazardClass: CORROSIVE
• Hazardous Substances Data: 101947-16-4(Hazardous Substances Data)

Usage

Chemical Properties

Colorless liquid

Uses

1H,1H,2H,2H-Perfluorodecyltriethoxysilane is used in making thin film transistors, polyethersulfone membranes, and a superwettable Janus membrane.

Application

1H,1H,2H,2H-Perfluorodecyltriethoxysilane(PFDTES) was used to functionalize hydrophobic ceramic membranes with nanosized pores. It was also used to functionalize Cu2(OH)3NO3 crystal to render it hydrophobic. The product may be used to coat nanosized medical devices. PFDTES is used for the superhydrophobicity of polyvinylidene fluoride(PVDF) to protect the metal surfaces from fouling. A cost effective and scalable superamphiphobic spray coating of PFDTES on stainless steel surfaces may potentially be used to create anti-icing and stain-resistant surfaces. It may be used to modify the surface of poly(methyl methacrylate(PMMA) for the fabrication of microfluidic chips.

General Description

1H,1H,2H,2H-Perfluorodecyltriethoxysilane(PFDTES) is a fluoroalkylsilanes(FAS) with low surface energy and high wettability due to the presence of fluorinated carbons. It is used as a superhydrophobic agent for synthesizing various functional coatings.

InChI:InChI=1/C16H19F17O3Si/c1-4-34-37(35-5-2,36-6-3)8-7-9(17,18)10(19,20)11(21,22)12(23,24)13(25,26)14(27,28)15(29,30)16(31,32)33/h4-8H2,1-3H3

Upstream product

• 998-30-1 Triethoxysilane 
• 21652-58-4 1H,1H,2H-perfluorodecene 

Relevant articles and documents

Method for synthesizing flurosilicon compound by using continuous flow microreactor

The invention belongs to the technical field of a fluorine-containing material, and particularly relates to a method for synthesizing a flurosilicon compound by using a continuous flow microreactor. The synthesis method is characterized in that the continuous flow microreactor is used as a reaction device; the method comprises the following steps of (1) flowing fluoroolefin, alkoxy silane and catalysts dissolved into organic solvents into a mixed reaction module M with the preset temperature T for mixed reaction respectively through metering pumps P1, P2 and P3 via a material passage A, a material passage B and a material passage C; (2) after the mixed reaction is completed, flowing reaction liquid flows out of an outlet D; performing post treatment by flow-out reaction liquid to obtain the flurosilicon compound. The synthesis method provided by the invention has the advantages of scientificalness, reasonableness, simplicity and easy implementation. The problems of serious heat release, difficult operation control, rigorous equipment requirement, low yield, long reaction time and the like in the existing chlorsilane silicon and hydrogen addition can be solved.