131651-65-5 Usage
General Description
Lithium nonafluorobutanesulfonate, also known as LiN(SO2C4F9), is a lithium salt compound commonly used in lithium-ion batteries as an electrolyte additive to improve the performance and stability of the battery. It is highly soluble in organic solvents and has good thermal stability, making it an ideal choice for use in high-energy-density batteries. This chemical also has potential applications in the field of electrochemistry and as a conductive salt in organic electronics. Additionally, it is used in research and development of new battery technologies and energy storage systems due to its ability to enhance the electrochemical properties of the battery. However, it is important to handle this chemical with proper precautions as it can be harmful if swallowed, inhaled, or comes in contact with skin.
Check Digit Verification of cas no
The CAS Registry Mumber 131651-65-5 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 1,3,1,6,5 and 1 respectively; the second part has 2 digits, 6 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 131651-65:
(8*1)+(7*3)+(6*1)+(5*6)+(4*5)+(3*1)+(2*6)+(1*5)=105
105 % 10 = 5
So 131651-65-5 is a valid CAS Registry Number.
InChI:InChI=1/C4HF9O3S.Li/c5-1(6,3(9,10)11)2(7,8)4(12,13)17(14,15)16;/h(H,14,15,16);/q;+1/p-1
131651-65-5Relevant articles and documents
Onium salt compound and radiation-sensitive resin composition
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, (2008/06/13)
An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1–10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
