132928-72-4Relevant articles and documents
Photochemical Micropatterning of Silylated Glass Surface Bearing 3-Phenyldithiopropyl Group by KrF Laser Irradiation
Ichinose, Nobuyuki,Sugimura, Hiroyuki,Uchida, Tatsuya,Shimo, Nobuo,Masuhara, Hiroshi
, p. 1961 - 1964 (1993)
Thin film of 3-phenyldithiopropyltrimethoxysilane (1) was prepared as a photoreactive surface of masked thiol by in-situ reaction of 3-mercaptopropyltrimethoxysilane (2) with diphenyldisulfide before deposition of the film on quartz substrate.The film of 1 undergoes photochemical oxygenation of sulfur atom more efficiently than of 2 upon KrF laser (248 nm) irradiation, where a thiyl redical is incorporated as a common intermediate.