1333493-49-4Relevant articles and documents
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A RESIST PATTERN AND SULFONIUM COMPOUND
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Paragraph 0199; 0200; 0201, (2013/03/26)
A radiation-sensitive resin composition includes a sulfonium compound represented by a general formula (1), and a first polymer that serves as a base resin. R represents a group represented by a general formula (2). n1 to n3 each independently represent an integer of 0 to 5 and n1+n2+n3≧1. X? represents an anion. The sulfonium compound is preferably a compound represented by a following general formula (1-1).