13569-32-9Relevant articles and documents
Mechanism of thermal decomposition of allyltrichlorosilane with formation of three labile intermediates: dichlorosilylene, allyl radical, and atomic chlorine
Boganov,Promyslov,Krylova,Zaitseva,Egorov
, p. 1216 - 1224 (2016)
It is experimentally found that allyltrichlorosilane dissociates under vacuum pyrolysis (~10–2 Torr) at temperatures above 1100 K to form three labile intermediates: allyl radical, dichlorosilylene, and monoatomic chlorine. On the basis of experimental and theoretical data obtained, it is shown that the decomposition reaction proceeds in two steps. The first step is a typical reaction of homolytic decomposition to two radicals (C3H5 and SiCl3) at the weakest Si—C bond. Due to weakness of the Si—Cl bond in the SiCl3 radical, the energy of which is even somewhat lower than the dissociation energy of the Si—C bond in starting AllSiCl3, this radical undergoes further dissociation to SiCl2 and Cl, thus resulting in three intermediates of different classes of highly reactive species formed from AllSiCl3.
Lavrushenko, B. B.,Bakianov, A. V.,Strunin, V. P.
, p. 479 - 482 (1990)
Formation of 1,1-dichloro-2-vinyl-1-silacyclopropane by a photoinduced reaction between dichlorosilylene and 1,3-butadiene
Boganov, Sergey E.,Promyslov, Vladimir M.,Rynin, Stanislav S.,Krylova, Irina V.,Egorov, Mikhail P.
, p. 574 - 576 (2018/12/13)
A matrix FTIR study of interaction between SiCl2 and 1,3-butadiene revealed that at low temperatures, it stops at the step of complexation between the reactants. This allowed us to investigate a photochemical version of this interaction resulti
The detection of O=SiCl2 as an intermediate during the combustion process of SiCl4 with O2
Junker,Wilkening,Binnewies,Schnockel
, p. 1531 - 1535 (2007/10/03)
During the technical important combustion of SiCl4 with oxygen [SiCl4(g) + O2(g) = SiO2(s) + 2·Cl2(g)] many intermediates have been detected in the past. However, the presence of the primary species O=SiCl2 has been discussed controversially until today. With the help of matrix isolation technique we have now been successful to monitor O=SiCl2 via its IR spectrum. With the help of quantum chemical calculations the thermodynamic data have been calculated first. On this basis it was possible to find the optimal conditions to trap OSiCl2 from the high-temperature equilibrium. Furthermore it could be shown via IR spectroscopy and quantum chemical calculations, that the radical OSiCl does not play a significant role within this combustion process.
