18865-74-2 Usage
Uses
Used in Metal-Organic Chemical Vapor Deposition (MOCVD) Applications:
TETRAKIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)ZIRCONIUM is used as a precursor in the process of MOCVD for the deposition of high-quality thin films. Its unique chemical structure allows for controlled growth and precise stoichiometry of the deposited material, making it a valuable component in the fabrication of advanced materials and devices.
Used in Piezoelectric and Ferroelectric Materials Industry:
TETRAKIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)ZIRCONIUM is used as a Zirconium source precursor for the synthesis of high-quality MOCVD of lead zirconate titanate (PZT) thin films. PZT is a widely used piezoelectric and ferroelectric material with applications in various fields, such as sensors, actuators, and memory devices. The use of this compound as a precursor ensures the formation of high-quality PZT films with desired properties, enhancing the performance of the final devices.
Check Digit Verification of cas no
The CAS Registry Mumber 18865-74-2 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,8,8,6 and 5 respectively; the second part has 2 digits, 7 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 18865-74:
(7*1)+(6*8)+(5*8)+(4*6)+(3*5)+(2*7)+(1*4)=152
152 % 10 = 2
So 18865-74-2 is a valid CAS Registry Number.
InChI:InChI=1/4C11H20O2.Zr/c4*1-10(2,3)8(12)7-9(13)11(4,5)6;/h4*7H2,1-6H3;
