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75-76-3

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75-76-3 Usage

Chemical Description

Different sources of media describe the Chemical Description of 75-76-3 differently. You can refer to the following data:
1. Tetramethylsilane is an organosilicon compound with the formula (CH3)4Si.
2. Tetramethylsilane is an organic compound used as an internal reference in NMR spectroscopy.

Chemical Properties

Colorless clear liquid

Uses

Different sources of media describe the Uses of 75-76-3 differently. You can refer to the following data:
1. NMR reference standard. In semiconductor applications (chemical vapor deposition). Tetramethylsilane (TMS) is used as a chemical shift reference for proton, carbon-13, and silicon-29 analysis in organic solvents and is given 0 as its chemical shift position.
2. Tetramethylsilane is used as a building block in organometallic chemistry. It acts as a by-product in the production of methyl chlorosilanes. Also, it serves as a precursor to silicon dioxide or silicon carbide. It is used as internal reference standard for the calibration of chemical sift for 1, 13 and 29 NMR spectroscopy. In addition, it is used as an aviation fuel.

Definition

ChEBI: Tetramethylsilane is an organosilicon compound that is silane in which the hydrogens have been replaced by methyl groups.

General Description

Tetramethylsilane appears as a colorless, mildly acidic volatile liquid. A serious fire hazard. Mildly toxic by ingestion. Emits acrid smoke and fumes when heated to high temperatures. Less dense than water and insoluble in water, but soluble in most organic solvents. Used as an aviation fuel and as an internal standard for nmr analytical instruments.

Air & Water Reactions

Highly flammable. Tetramethylsilane is insoluble in water.

Reactivity Profile

Hydrides, such as Tetramethylsilane, are reducing agents and react rapidly and dangerously with oxygen and with other oxidizing agents, even weak ones. Thus, they are likely to ignite on contact with alcohols. Hydrides are incompatible with acids, alcohols, amines, and aldehydes.

Hazard

Flammable, high fire risk.

Health Hazard

May cause toxic effects if inhaled or absorbed through skin. Inhalation or contact with material may irritate or burn skin and eyes. Fire will produce irritating, corrosive and/or toxic gases. Vapors may cause dizziness or suffocation. Runoff from fire control or dilution water may cause pollution.

Fire Hazard

HIGHLY FLAMMABLE: Will be easily ignited by heat, sparks or flames. Vapors may form explosive mixtures with air. Vapors may travel to source of ignition and flash back. Most vapors are heavier than air. They will spread along ground and collect in low or confined areas (sewers, basements, tanks). Vapor explosion hazard indoors, outdoors or in sewers. Runoff to sewer may create fire or explosion hazard. Containers may explode when heated. Many liquids are lighter than water.

Purification Methods

Distil it from conc H2SO4 (after shaking with it) or LiAlH4, through a 5ft vacuum-jacketed column packed with glass helices into an ice-cooled condenser, then percolate it through silica gel to remove traces of halide. [Beilstein 4 IV 3875.]

Check Digit Verification of cas no

The CAS Registry Mumber 75-76-3 includes 5 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 2 digits, 7 and 5 respectively; the second part has 2 digits, 7 and 6 respectively.
Calculate Digit Verification of CAS Registry Number 75-76:
(4*7)+(3*5)+(2*7)+(1*6)=63
63 % 10 = 3
So 75-76-3 is a valid CAS Registry Number.
InChI:InChI=1/C4H12Si/c1-5(2,3)4/h1-4H3

75-76-3 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • Alfa Aesar

  • (A13148)  Tetramethylsilane, 99.9%   

  • 75-76-3

  • 25g

  • 438.0CNY

  • Detail
  • Alfa Aesar

  • (A13148)  Tetramethylsilane, 99.9%   

  • 75-76-3

  • 100g

  • 1453.0CNY

  • Detail
  • Sigma-Aldrich

  • (87920)  Tetramethylsilane  analytical standard, for NMR spectroscopy, ACS reagent

  • 75-76-3

  • 87920-25ML

  • 958.23CNY

  • Detail
  • Aldrich

  • (87921)  Tetramethylsilane  ≥99.0% (GC)

  • 75-76-3

  • 87921-100ML

  • 1,020.24CNY

  • Detail
  • Aldrich

  • (744301)  Tetramethylsilane  produced by Wacker Chemie AG, Burghausen, Germany, ≥99.0% (GC)

  • 75-76-3

  • 744301-250ML

  • 2,930.85CNY

  • Detail
  • Aldrich

  • (744301)  Tetramethylsilane  produced by Wacker Chemie AG, Burghausen, Germany, ≥99.0% (GC)

  • 75-76-3

  • 744301-1L

  • 10,138.05CNY

  • Detail
  • Aldrich

  • (523771)  Tetramethylsilane  electronic grade, ≥99.99% trace metals basis

  • 75-76-3

  • 523771-100ML

  • 2,543.58CNY

  • Detail
  • Sigma-Aldrich

  • (T24007)  Tetramethylsilane  ACS reagent, NMR grade, ≥99.9%

  • 75-76-3

  • T24007-25G

  • 356.85CNY

  • Detail
  • Sigma-Aldrich

  • (T24007)  Tetramethylsilane  ACS reagent, NMR grade, ≥99.9%

  • 75-76-3

  • T24007-100G

  • 1,477.71CNY

  • Detail

75-76-3SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name tetramethylsilane

1.2 Other means of identification

Product number -
Other names trimethylchlorosilane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:75-76-3 SDS

75-76-3Synthetic route

tris(trimethylsilylmethyl)gallium
72708-53-3

tris(trimethylsilylmethyl)gallium

trimethylamine hydrochloride
593-81-7

trimethylamine hydrochloride

A

tetramethylsilane
75-76-3

tetramethylsilane

B

Ga(3+)*2CH2Si(CH3)3(1-)*Cl(1-)*N(CH3)3=Ga(CH2Si(CH3)3)2Cl*N(CH3)3
72709-13-8

Ga(3+)*2CH2Si(CH3)3(1-)*Cl(1-)*N(CH3)3=Ga(CH2Si(CH3)3)2Cl*N(CH3)3

Conditions
ConditionsYield
In benzene under N2 or Ar mixt. in stoich. quantity stirred at room temp. for 2 h; volatile components removed by vac. distn., crude product sublimed at 32°C; elem. anal.;A 100%
B 98.5%
tris(trimethylsilylmethyl)gallium
72708-53-3

tris(trimethylsilylmethyl)gallium

A

tetramethylsilane
75-76-3

tetramethylsilane

B

Ga2(6+)*2CH2Si(CH3)3(1-)*4Cl(1-)=[GaCl2(CH2Si(CH3)3)]2

Ga2(6+)*2CH2Si(CH3)3(1-)*4Cl(1-)=[GaCl2(CH2Si(CH3)3)]2

Conditions
ConditionsYield
With HCl under inert gas at 25°C for 12 h with 1:2 GaR3:HCl; vac. sublimation at 50°C; elem. anal.;A 99.6%
B 91%
tris(trimethylsilylmethyl)gallium
72708-53-3

tris(trimethylsilylmethyl)gallium

A

tetramethylsilane
75-76-3

tetramethylsilane

B

Ga2(6+)*2CH2Si(CH3)3(1-)*4Br(1-)=[GaBr2(CH2Si(CH3)3)]2

Ga2(6+)*2CH2Si(CH3)3(1-)*4Br(1-)=[GaBr2(CH2Si(CH3)3)]2

Conditions
ConditionsYield
With HBr under inert gas at 25°C for 12 h with 1:2 GaR3:HBr; extn. with benzene;A 99.5%
B 94.2%
tris(trimethylsilylmethyl)gallium
72708-53-3

tris(trimethylsilylmethyl)gallium

A

tetramethylsilane
75-76-3

tetramethylsilane

B

[Ga(CH2Si(CH3)3)2Br]2
72708-90-8

[Ga(CH2Si(CH3)3)2Br]2

Conditions
ConditionsYield
With HBr under inert gas at 25°C for 12 h with 1:1 GaR3:HBr; recrystn. from benzene;A 99.2%
B 94%
tris(trimethylsilylmethyl)gallium
72708-53-3

tris(trimethylsilylmethyl)gallium

A

((trimethylsilyl)methyl)gallium(III) chloride
72708-38-4, 72708-39-5

((trimethylsilyl)methyl)gallium(III) chloride

B

tetramethylsilane
75-76-3

tetramethylsilane

C

Ga2(6+)*2CH2Si(CH3)3(1-)*4Cl(1-)=[GaCl2(CH2Si(CH3)3)]2

Ga2(6+)*2CH2Si(CH3)3(1-)*4Cl(1-)=[GaCl2(CH2Si(CH3)3)]2

Conditions
ConditionsYield
With HCl In benzene HCl added in three equimolar portions by vac. distn. at -196°C, after each addn. mixt. warmed to room temp. and stirred for 1 h; volatile products fractionally distd., nonvolatile products extd. with n-pentane, insol. component collected, identified as Ga(CH2SiMe3)2Cl (elem. anal.), sol. fraction mixt. of Ga(CH2SiMe3)Cl2 and Ga(CH2SiMe3)3;A 50.5%
B 99.2%
C n/a
diphenylphosphane
829-85-6

diphenylphosphane

diisopropyl-carbodiimide
693-13-0

diisopropyl-carbodiimide

A

N,N′-diisopropyl-1,1-diphenylphosphanecarboximidamide
790655-23-1, 642494-33-5

N,N′-diisopropyl-1,1-diphenylphosphanecarboximidamide

B

tetramethylsilane
75-76-3

tetramethylsilane

Conditions
ConditionsYield
With C35H66Si3Y(1-)*C14H30LiO4(1+) In tetrahydrofuran at 80℃; for 1h; Mechanism; Reagent/catalyst; Solvent; Temperature; Schlenk technique; Inert atmosphere;A 97%
B n/a
tris{(trimethylsilyl)methyl}indium
69833-15-4

tris{(trimethylsilyl)methyl}indium

diphenylphosphane
829-85-6

diphenylphosphane

A

tetramethylsilane
75-76-3

tetramethylsilane

B

(((CH3)3SiCH2)2InP(C6H5)2)2

(((CH3)3SiCH2)2InP(C6H5)2)2

Conditions
ConditionsYield
In pentane byproducts: SiMe4; The reagents in benzene were combined in a reaction tube, evacuated and heated at 55°C for 7 d;; mixt. was cooled to -78°C, filtered, washed with benzene, recrystd. from pentane at -78°C; elem. anal.;;A 95%
B 93%
In pentane The reagents were combined in a reaction tube, evacuated and heated at 55°C for 3 d;; mixt. was cooled to -78°C, filtered, washed with pentane at -20°C; elem. anal.;;A n/a
B 94%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

tetramethylsilane
75-76-3

tetramethylsilane

Conditions
ConditionsYield
With iodine; (3S,3aS,4S,4aS,6S,8aR,8bR,11S)-6,11-dihydroxy-3-methyl-12-methylene-2-oxo-4a,6-ethano-3,8b-prop-1-enoperhydroindeno[1,2-b]furan-4-carboxylic acid Heating;92%
With iodine; (3S,3aS,4S,4aS,6S,8aR,8bR,11S)-6,11-dihydroxy-3-methyl-12-methylene-2-oxo-4a,6-ethano-3,8b-prop-1-enoperhydroindeno[1,2-b]furan-4-carboxylic acid Mechanism; Heating; other permethyloligosiloxanes;92%
(η5-C5Me5)(PMe3)2Ru(CH2SiMe3)
87640-52-6

(η5-C5Me5)(PMe3)2Ru(CH2SiMe3)

methyldiphenylsilane
776-76-1

methyldiphenylsilane

A

tetramethylsilane
75-76-3

tetramethylsilane

B

(η5-C5Me5)(PMe3)2ruthenium(Si(phenyl)2Me)

(η5-C5Me5)(PMe3)2ruthenium(Si(phenyl)2Me)

Conditions
ConditionsYield
In toluene In inert atmosphere, heating of Ru-complex with HSiEt3 (90°C, 9 h).; Evapn. in vac., recrystn. (toluene), elem. anal.;A n/a
B 92%
(η5-C5Me5)(PMe3)2Ru(CH2SiMe3)
87640-52-6

(η5-C5Me5)(PMe3)2Ru(CH2SiMe3)

Triethoxysilane
998-30-1

Triethoxysilane

A

tetramethylsilane
75-76-3

tetramethylsilane

B

(η5-C5Me5)(PMe3)ruthenium{Si(OEt)3}2H

(η5-C5Me5)(PMe3)ruthenium{Si(OEt)3}2H

C

trimethylphosphane
594-09-2

trimethylphosphane

Conditions
ConditionsYield
In inert atmosphere, heating of Ru-complex with HSi(OEt)3 (80°C, 12 h, closed vessel), briefly pumping to remove PMe3, continued heating (80°C, 6 h).; Evapn. in vac. gives a waxy solid, recrystn. (acetone), elem. anal.;A n/a
B 92%
C n/a
Octamethyltrisiloxane
107-51-7

Octamethyltrisiloxane

tetramethylsilane
75-76-3

tetramethylsilane

Conditions
ConditionsYield
With iodine; (3S,3aS,4S,4aS,6S,8aR,8bR,11S)-6,11-dihydroxy-3-methyl-12-methylene-2-oxo-4a,6-ethano-3,8b-prop-1-enoperhydroindeno[1,2-b]furan-4-carboxylic acid Heating;90%
methyltrimethicone
17928-28-8

methyltrimethicone

tetramethylsilane
75-76-3

tetramethylsilane

Conditions
ConditionsYield
With iodine; (3S,3aS,4S,4aS,6S,8aR,8bR,11S)-6,11-dihydroxy-3-methyl-12-methylene-2-oxo-4a,6-ethano-3,8b-prop-1-enoperhydroindeno[1,2-b]furan-4-carboxylic acid Heating;90%
1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane
3555-47-3

1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane

tetramethylsilane
75-76-3

tetramethylsilane

Conditions
ConditionsYield
With iodine; (3S,3aS,4S,4aS,6S,8aR,8bR,11S)-6,11-dihydroxy-3-methyl-12-methylene-2-oxo-4a,6-ethano-3,8b-prop-1-enoperhydroindeno[1,2-b]furan-4-carboxylic acid Heating;90%
2-(Trimethylsilyl)ethanol
2916-68-9

2-(Trimethylsilyl)ethanol

tetramethylsilane
75-76-3

tetramethylsilane

Conditions
ConditionsYield
With To(M)Rh(CO)2 In benzene at 20℃; for 36h; Inert atmosphere; Irradiation;87%
chloro(trimethylsilyl)methyl lithium
63830-85-3

chloro(trimethylsilyl)methyl lithium

[diphenylmanganese]
20699-69-8

[diphenylmanganese]

A

biphenyl
92-52-4

biphenyl

B

tetramethylsilane
75-76-3

tetramethylsilane

C

benzyltrimethylsilane
770-09-2

benzyltrimethylsilane

Conditions
ConditionsYield
With hydrogenchloride In tetrahydrofuran mixing of MnPh2 with Li-salt in THF (molar ratio 1:2, -78°C, 1 h), rise of temp. to 25°C (over 1 h); gas liquid chromy. after quenching with 2 N HCl;A 4%
B n/a
C 82%
potassium hydride

potassium hydride

tris{(trimethylsilyl)methyl}indium
69833-15-4

tris{(trimethylsilyl)methyl}indium

A

tetramethylsilane
75-76-3

tetramethylsilane

B

K(1+)*In(CH2Si(CH3)3)3H(1-)=KIn(CH2Si(CH3)3)3H
87461-82-3

K(1+)*In(CH2Si(CH3)3)3H(1-)=KIn(CH2Si(CH3)3)3H

C

hydrogen
1333-74-0

hydrogen

Conditions
ConditionsYield
In pentane under N2, pentane added to KH, In-compd. (molar ratio 1:3) added, frozen to -196°C, evacuated, warmed to room temp., stirred for 3 d, opened; filtered, washed with pentane, solvent removed, benzene added, warmed to room temp., filtered, solvent removed by vac. distn.;A 0%
B 80.9%
C 0%
tetra-n-butylammonium nitridotetrakis(trimethylsilylmethyl)ruthenium(VI)
102649-21-8

tetra-n-butylammonium nitridotetrakis(trimethylsilylmethyl)ruthenium(VI)

cis-tetra-n-butylammonium nitridodochlorobis(trimethylsilylmethyl)ruthenium(VI)
112817-65-9

cis-tetra-n-butylammonium nitridodochlorobis(trimethylsilylmethyl)ruthenium(VI)

B

tetramethylsilane
75-76-3

tetramethylsilane

Conditions
ConditionsYield
With HCl In toluene bubbling of HCl(g) to the Ru compd. in toluene at room temp. for 1 h; evapn. (vacuum), washing with hexane and recrystn. from toluene-hexane at -30°C; elem. anal.;A 79%
B n/a
With HCl In diethyl ether addn. of excess of HCl(g) to the Ru compd. in ether under N2 at -78°C, warming to room temp. and stirring for 40-60 min; evapn. (vacuum), washing with hexane and recrystn. from toluene-hexane at -30°C; elem. anal.;A 71%
B n/a
(η5-C5Me5)(PMe3)2Ru(CH2SiMe3)
87640-52-6

(η5-C5Me5)(PMe3)2Ru(CH2SiMe3)

diphenylsilyl chloride
1631-83-0

diphenylsilyl chloride

A

tetramethylsilane
75-76-3

tetramethylsilane

B

(η5-C5Me5)(PMe3)ruthenium{Si(phenyl)2Cl}2H

(η5-C5Me5)(PMe3)ruthenium{Si(phenyl)2Cl}2H

C

trimethylphosphane
594-09-2

trimethylphosphane

Conditions
ConditionsYield
In inert atmosphere, heating of Ru-complex with HSi(Ph2Cl)3 (110°C, 16 h, closed vessel, stirring), periodic pumping to remove PMe3.; Cooling to room temp., addn. of pentane, cooling (-78°C, 6 h), filtn. of pale yellow crystals, washing (pentane, -78°C), drying in vac, elem. anal.;A n/a
B 78%
C n/a
(η5-C5Me5)(PMe3)2Ru(CH2SiMe3)
87640-52-6

(η5-C5Me5)(PMe3)2Ru(CH2SiMe3)

HSiPh3
789-25-3

HSiPh3

A

tetramethylsilane
75-76-3

tetramethylsilane

B

(η5-C5Me5)(PMe3)2ruthenium(Si(phenyl)3)

(η5-C5Me5)(PMe3)2ruthenium(Si(phenyl)3)

Conditions
ConditionsYield
In toluene In inert atmosphere, heating of Ru-complex with HSiEt3 (100°C, 6 h).; Cooling (6 h, -50°C), filtn., drying in vac., elem. anal.;A n/a
B 78%
chloro(trimethylsilyl)methyl lithium
63830-85-3

chloro(trimethylsilyl)methyl lithium

Dibenzol-chrom(II)
13518-85-9

Dibenzol-chrom(II)

A

biphenyl
92-52-4

biphenyl

B

tetramethylsilane
75-76-3

tetramethylsilane

C

benzyltrimethylsilane
770-09-2

benzyltrimethylsilane

Conditions
ConditionsYield
With hydrogenchloride In tetrahydrofuran mixing of CrPh2 with Li-salt in THF (molar ratio 1:1.5, -78°C, 1 h), rise of temp. to 25°C (over 1 h); gas liquid chromy. after quenching with 2 N HCl;A n/a
B n/a
C 76%
Li(1+)*4O(C2H5)2*Lu(3+)*4CH2Si(CH3)3(1-) = {Li(O(C2H5)2)4}{Lu(CH2Si(CH3)3)4}

Li(1+)*4O(C2H5)2*Lu(3+)*4CH2Si(CH3)3(1-) = {Li(O(C2H5)2)4}{Lu(CH2Si(CH3)3)4}

A

tetramethylsilane
75-76-3

tetramethylsilane

B

Li(1+)*Lu(3+)*2CH2Si(CH3)3(1-)*CHSi(CH3)3(2-) = Li{Lu(CH2Si(CH3)3)2CHSi(CH3)3}

Li(1+)*Lu(3+)*2CH2Si(CH3)3(1-)*CHSi(CH3)3(2-) = Li{Lu(CH2Si(CH3)3)2CHSi(CH3)3}

Conditions
ConditionsYield
In benzene kept at room temp. for 7 d; removal of solvent, dissoln. in pentane and cooled to -10°C;A n/a
B 76%
chloro(trimethylsilyl)methyl lithium
63830-85-3

chloro(trimethylsilyl)methyl lithium

Diphenylkobalt
20537-43-3

Diphenylkobalt

A

biphenyl
92-52-4

biphenyl

B

tetramethylsilane
75-76-3

tetramethylsilane

C

benzyltrimethylsilane
770-09-2

benzyltrimethylsilane

Conditions
ConditionsYield
With hydrogenchloride In tetrahydrofuran mixing of CoPh2 with Li-salt in THF (molar ratio 1:1.5, -78°C, 1 h), rise of temp. to 25°C (over 1 h); gas liquid chromy. after quenching with 2 N HCl;A 70%
B n/a
C 12%
{(η5-C5H5)2Zr(p-Tol)2}

{(η5-C5H5)2Zr(p-Tol)2}

chloro(trimethylsilyl)methyl lithium
63830-85-3

chloro(trimethylsilyl)methyl lithium

A

tetramethylsilane
75-76-3

tetramethylsilane

B

(4,4'-dimethyl-1,1'-biphenyl)
613-33-2

(4,4'-dimethyl-1,1'-biphenyl)

C

1-((trimethylsilyl)methyl)-4-methylbenzene
7450-04-6

1-((trimethylsilyl)methyl)-4-methylbenzene

Conditions
ConditionsYield
With hydrogenchloride In tetrahydrofuran mixing of Zr-complex with Li-salt in THF (molar ratio 1:1, -78°C, 1 h), rise of temp. to 25°C (over 1 h); gas liquid chromy. after quenching with 2 N HCl;A n/a
B n/a
C 70%
{(C5H5)2Nb(CH2Si(CH3)3)Cl}(1+)*PF6(1-)={(C5H5)2Nb(CH2Si(CH3)3)Cl}PF6
106420-40-0

{(C5H5)2Nb(CH2Si(CH3)3)Cl}(1+)*PF6(1-)={(C5H5)2Nb(CH2Si(CH3)3)Cl}PF6

A

tetramethylsilane
75-76-3

tetramethylsilane

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With H2O In [(2)H6]acetone 1 equiv. of H2O in acetone-d6; not isolated; detected by NMR and GC;A <5
B 70%
triethylsilane
617-86-7

triethylsilane

(η5-C5Me5)(PMe3)2Ru(CH2SiMe3)
87640-52-6

(η5-C5Me5)(PMe3)2Ru(CH2SiMe3)

A

tetramethylsilane
75-76-3

tetramethylsilane

B

(η5-C5Me5)(PMe3)2ruthenium(SiEt3)

(η5-C5Me5)(PMe3)2ruthenium(SiEt3)

Conditions
ConditionsYield
In further solvent(s) In inert atmosphere, refluxing of Ru-complex in HSiEt3 (5 h).; Evapn. of yellow soln. to dryness, dissolving (pentane), concg., cooling (-40°C), elem. anal.;A n/a
B 68%
diphenylbis(η-cyclopentadienyl)zhafnium(IV)

diphenylbis(η-cyclopentadienyl)zhafnium(IV)

chloro(trimethylsilyl)methyl lithium
63830-85-3

chloro(trimethylsilyl)methyl lithium

A

biphenyl
92-52-4

biphenyl

B

tetramethylsilane
75-76-3

tetramethylsilane

C

benzyltrimethylsilane
770-09-2

benzyltrimethylsilane

Conditions
ConditionsYield
With hydrogenchloride In tetrahydrofuran mixing of Hf-complex with Li-salt in THF (molar ratio 1:1.3, -78°C, 1 h), rise of temp. to 25°C (over 1 h); gas liquid chromy. after quenching with 2 N HCl;A 2%
B n/a
C 65%
((C2H5)3P)2Ni(C6H5)2

((C2H5)3P)2Ni(C6H5)2

chloro(trimethylsilyl)methyl lithium
63830-85-3

chloro(trimethylsilyl)methyl lithium

A

biphenyl
92-52-4

biphenyl

B

tetramethylsilane
75-76-3

tetramethylsilane

C

benzyltrimethylsilane
770-09-2

benzyltrimethylsilane

Conditions
ConditionsYield
With hydrogenchloride In tetrahydrofuran mixing of (Et3P)2NiPh2 with Li-salt in THF (molar ratio 1:1.5, -78°C, 1 h), rise of temp. to 25°C (over 1 h); gas liquid chromy. after quenching with 2 N HCl;A 65%
B n/a
C 9%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

A

tetramethylsilane
75-76-3

tetramethylsilane

B

trimethylsilyl iodide
16029-98-4

trimethylsilyl iodide

C

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

D

tetradecamethylhexasiloxane
107-52-8

tetradecamethylhexasiloxane

Conditions
ConditionsYield
With gallium(III) iodide at 140 - 170℃; for 5h; Yields of byproduct given;A 61%
B n/a
C n/a
D n/a
With gallium(III) iodide at 140 - 170℃; for 5h; Title compound not separated from byproducts;A 61%
B n/a
C n/a
D n/a
With gallium(III) iodide at 140 - 170℃; for 5h; Yield given; Title compound not separated from byproducts;A 61%
B n/a
C n/a
D n/a
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

A

tetramethylsilane
75-76-3

tetramethylsilane

B

trimethylsilyl iodide
16029-98-4

trimethylsilyl iodide

C

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

D

dodecamethyl-cyclohexasiloxane
540-97-6

dodecamethyl-cyclohexasiloxane

Conditions
ConditionsYield
With gallium(III) iodide at 140 - 170℃; for 5h; Yield given; Title compound not separated from byproducts;A 61%
B n/a
C n/a
D n/a
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

A

tetramethylsilane
75-76-3

tetramethylsilane

B

trimethylsilyl iodide
16029-98-4

trimethylsilyl iodide

C

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

D

hexadecamethylheptasiloxane
541-01-5

hexadecamethylheptasiloxane

Conditions
ConditionsYield
With gallium(III) iodide at 140 - 170℃; for 5h; Yield given; Title compound not separated from byproducts;A 61%
B n/a
C n/a
D n/a
tetramethylsilane
75-76-3

tetramethylsilane

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Conditions
ConditionsYield
With 1,2-dichloro-ethane; aluminium trichloride at 130℃; for 17h;100%
With hydrogenchloride; aluminium trichloride
With chlorine; iodine In tetrachloromethane at 30℃;
With hydrogenchloride
tetramethylsilane
75-76-3

tetramethylsilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

chlorotrimethylgermane
1529-47-1

chlorotrimethylgermane

C

tetramethylgermane
865-52-1

tetramethylgermane

Conditions
ConditionsYield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 2/1, at 180°C for 2.75 h, cooled; NMR, mass spectra, chromy.;A 100%
B 18%
C 82%
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 2/1, at 180°C for 4.5 h, cooled; NMR, mass spectra, chromy.;A 100%
B 23%
C 77%
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 2/1, at 200°C for 3.5 h, cooled; NMR, mass spectra, chromy.;A 100%
B 13%
C 87%
tetramethylsilane
75-76-3

tetramethylsilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

chlorotrimethylgermane
1529-47-1

chlorotrimethylgermane

C

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 2/1, at 200°C for 15 h, cooled; NMR, mass spectra, chromy.;A 50%
B 100%
C 50%
tetramethylsilane
75-76-3

tetramethylsilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

A

methyltrichlorogermane
993-10-2

methyltrichlorogermane

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

C

dichlorodimethylgermanium
1529-48-2

dichlorodimethylgermanium

Conditions
ConditionsYield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 0.5/1, at 200°C for 28 h, cooled; NMR, mass spectra, chromy.;A 64%
B 100%
C 36%
tetramethylsilane
75-76-3

tetramethylsilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

A

chlorotrimethylgermane
1529-47-1

chlorotrimethylgermane

B

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

C

dichlorodimethylgermanium
1529-48-2

dichlorodimethylgermanium

Conditions
ConditionsYield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 1/1, at 200°C for 56 h, cooled; NMR, mass spectra, chromy.;A 14%
B 100%
C 86%
tetramethylsilane
75-76-3

tetramethylsilane

trifluorormethanesulfonic acid
1493-13-6

trifluorormethanesulfonic acid

trimethylsilyl trifluoromethanesulfonate
27607-77-8

trimethylsilyl trifluoromethanesulfonate

Conditions
ConditionsYield
for 1h; Ambient temperature;99%
tetramethylsilane
75-76-3

tetramethylsilane

(η5-C5Me5)W(NO)(CH2CMe3)2

(η5-C5Me5)W(NO)(CH2CMe3)2

[(C5(CH3)5)W(NO)(CH2Si(CH3)3)(CH2C(CH3)3)]

[(C5(CH3)5)W(NO)(CH2Si(CH3)3)(CH2C(CH3)3)]

Conditions
ConditionsYield
reaction at 70°C for 2 days;99%
tetramethylsilane
75-76-3

tetramethylsilane

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

N-chlorosulphonyl-methanesulphonamide

N-chlorosulphonyl-methanesulphonamide

Conditions
ConditionsYield
With bis(chlorosulfonyl)amine In dichloromethane at 30℃; for 18h; Yields of byproduct given;A n/a
B 97%
tetramethylsilane
75-76-3

tetramethylsilane

Cyclopentane
287-92-3

Cyclopentane

carbon monoxide
201230-82-2

carbon monoxide

1-cyclopentylethanone
6004-60-0

1-cyclopentylethanone

Conditions
ConditionsYield
With aluminum tri-bromide; 1,2-dibromomethane In tetrachloromethane at 0℃;97%
3-diethylaminopropyllithium
219614-89-8

3-diethylaminopropyllithium

tetramethylsilane
75-76-3

tetramethylsilane

Na(1+)*Co(CO)4(1-)*1.1((CH2)4O)=Na{Co(CO)4}*1.1((CH2)4O)

Na(1+)*Co(CO)4(1-)*1.1((CH2)4O)=Na{Co(CO)4}*1.1((CH2)4O)

Gallium trichloride
13450-90-3

Gallium trichloride

tetracarbonyl{(3-(diethylamino)propyl)methyl}galliocobalt

tetracarbonyl{(3-(diethylamino)propyl)methyl}galliocobalt

Conditions
ConditionsYield
In diethyl ether (inert gas); GaCl3 and SiMe4 is stirred under high vacuum, heated to 70-80°C, evapn. of the volatiles, residue is dissolved in Et2O, cooled to 0°C, dropwise addn. of the Li-salt in Et2O and after various steps addn. of the Co-complex; filtration, evapn. of the solvent, elem. anal.;96%
tetramethylsilane
75-76-3

tetramethylsilane

[(η5-C5Me5)W(NO)(CH2C(CH3)3)(η3-CH2CHCHPh)]

[(η5-C5Me5)W(NO)(CH2C(CH3)3)(η3-CH2CHCHPh)]

Cp*W(NO)(CH2SiMe3)(η3-CH2CHCHPh)

Cp*W(NO)(CH2SiMe3)(η3-CH2CHCHPh)

Conditions
ConditionsYield
at 85℃; for 9h; Sealed tube; Glovebox; Inert atmosphere;96%
tetramethylsilane
75-76-3

tetramethylsilane

tetradecanoyl chloride
112-64-1

tetradecanoyl chloride

pentadecan-2-one
2345-28-0

pentadecan-2-one

Conditions
ConditionsYield
With aluminium trichloride In dichloromethane for 4h; Ambient temperature;95%
tetramethylsilane
75-76-3

tetramethylsilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

chlorotrimethylgermane
1529-47-1

chlorotrimethylgermane

C

methyltrichlorogermane
993-10-2

methyltrichlorogermane

D

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

E

dichlorodimethylgermanium
1529-48-2

dichlorodimethylgermanium

Conditions
ConditionsYield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 1/1, at 200°C for 22 h, cooled; NMR, mass spectra, chromy.;A 6%
B 30%
C 15%
D 94%
E 56%
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 0.5/1, at 200°C for 6 h, cooled; NMR, mass spectra, chromy.;A 26%
B 33%
C 30%
D 74%
E 37%
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 1/1, at 200°C for 6 h, cooled; NMR, mass spectra, chromy.;A 60%
B 54%
C 11%
D 40%
E 35%
2-methyl-but-2-ene
513-35-9

2-methyl-but-2-ene

tetramethylsilane
75-76-3

tetramethylsilane

2,2-Dimethylbutane
75-83-2

2,2-Dimethylbutane

Conditions
ConditionsYield
With hydrogenchloride; aluminium trichloride In dichloromethane at 20℃; for 1h;92%
tetramethylsilane
75-76-3

tetramethylsilane

perfluorobutanesulfonic acid
375-73-5

perfluorobutanesulfonic acid

Nonafluorobutansulfonsaeure-trimethylsilylester
68734-62-3

Nonafluorobutansulfonsaeure-trimethylsilylester

Conditions
ConditionsYield
10°C;92%
tetramethylsilane
75-76-3

tetramethylsilane

1,3,5-trisbromobenzene
626-39-1

1,3,5-trisbromobenzene

3,5-dibromo-1-trimethylsilylbenzene
17878-23-8

3,5-dibromo-1-trimethylsilylbenzene

Conditions
ConditionsYield
Stage #1: 1,3,5-trisbromobenzene With n-butyllithium In tetrahydrofuran; hexane; toluene at -78℃; for 0.25h; Inert atmosphere;
Stage #2: tetramethylsilane In tetrahydrofuran; hexane; toluene at -78 - 20℃; Inert atmosphere;
92%
tetramethylsilane
75-76-3

tetramethylsilane

germaniumtetrachloride
10038-98-9

germaniumtetrachloride

A

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

B

chlorotrimethylgermane
1529-47-1

chlorotrimethylgermane

C

tetramethylgermane
865-52-1

tetramethylgermane

D

dimethylsilicon dichloride
75-78-5

dimethylsilicon dichloride

Conditions
ConditionsYield
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 4/1, at 200°C for 8 h, cooled; NMR, mass spectra, chromy.;A 91%
B 60%
C 40%
D 9%
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 0.33/1, at 200°C for 5 h, cooled; NMR, mass spectra, chromy.;A 89%
B 74%
C 26%
D 11%
aluminium bromide In neat (no solvent) molar ratio Me4Si/GeCl4 = 3/1, at 200°C for 21 h, cooled; NMR, mass spectra, chromy.;A 80%
B 80%
C 20%
D 20%
tetramethylsilane
75-76-3

tetramethylsilane

monosilane
7440-21-3

monosilane

Conditions
ConditionsYield
With lithium aluminium tetrahydride; calcium hydride at 55℃; for 5h; Inert atmosphere;90.6%

75-76-3Relevant articles and documents

Structural tracking of the potassium-mediated magnesiation of anisole

Clegg, William,Conway, Ben,Garcia-Alvarez, Pablo,Kennedy, Alan R.,Mulvey, Robert E.,Russo, Luca,Sassmannshausen, Joerg,Tuttle, Tell

, p. 10702 - 10706 (2009)

Final destination: The potassium-mediated magnesiation of anisole has been monitored by a combination of X-ray crystallographic and NMR spectroscopic studies. Departing from a heteroleptic alkyl-amido base and anisole, the reaction first stops at an ortho

Catalytic Difunctionalization of Unactivated Alkenes with Unreactive Hexamethyldisilane through Regeneration of Silylium Ions

Wu, Qian,Roy, Avijit,Irran, Elisabeth,Qu, Zheng-Wang,Grimme, Stefan,Klare, Hendrik F. T.,Oestreich, Martin

, p. 17307 - 17311 (2019)

A metal-free, intermolecular syn-addition of hexamethyldisilane across simple alkenes is reported. The catalytic cycle is initiated and propagated by the transfer of a methyl group from the disilane to a silylium-ion-like intermediate, corresponding to the (re)generation of the silylium-ion catalyst. The key feature of the reaction sequence is the cleavage of the Si?Si bond in a 1,3-silyl shift from silicon to carbon. A central intermediate of the catalysis was structurally characterized by X-ray diffraction, and the computed reaction mechanism is fully consistent with the experimental findings.

Polymer and metal oxide supported alkali metal naphthalenides: Application in the generation of lithium and sodium reagents

Van Den Ancker, Tania R.,Raston, Colin L.

, p. 283 - 300 (1998)

Highly coloured paramagnetic polymer supported lithium 5,5′ and sodium 6,6′ naphthalenide complexes have been prepared from the reaction of THF solutions of lithium and sodium biphenylide with polystyrene bearing -CH2SiMe2(C10H7) groups. Treating chloropropyl functionalised silica, alumina and titania surfaces with H3Al · NMe3 or H3Ga · NMe3 afford hydroxyl depleted surfaces. Successive treatment with lithium biphenylide, 1-(chlorodimethylsilyl)naphthalene and an alkali biphenylide affords supported alkali naphthalenide complexes which generate in high yield lithium and sodium reagents when treated with a range of organic halides, nitriles and phosphates, as found for 6,6′ and 7,7′.

Bildung siliciumorganischer Verbindungen. CVII. Bildung und Struktur des trans-trans-trans-Nonamethyl-hexasilaperhydrophenalens

Fritz, G.,Volk, H.,Straub, M.,Schnering, H. G. von,Peters, K.,Peters, E.-M.

, p. 109 - 118 (1988)

trans-trans-trans-2,2,4,6,6,8,10,10,12-Nonamethyl-2,4,6,8,10,12-hexasilaperhydrophenalene 6 (m.p. 170 deg C) is formed from the substituted cyclic carbosilane 3 at 25 deg C (5 h) in the presence of AlBr3 by elimination of SiMe4.At 35 deg C (5 h) the formation of the all-cis-isomer 6a is observed in addition to 6.On the other hand the thermal transformation of 6 into 6a was not observed below 420 deg C.None of the other possible isomers were detected.Compound 6 reacts with MeLi to give 7 via lithiation of the central C atom.The hydrolysis of 7 leads to a mixture of 6 and 6a in a 2/1 ratio.Compound 6 crystallizes orthorhombically space group P212121 (no.19); a = 2221.3, b = 1651.3, c = 667.3 pm; Z = 4; 2169 hkl; R = 0.053).Owing to the different size of the substituents on both sides of the polycyclic system the molecule is arched and the six-membered rings are flattened.The Si-C bond lengths decrease progressively from the central C atom to the periphery of the molecule(188.5 to 186.2 pm).It is shown that only the curvature of the polycyclic system causes a decrease in the endocyclic bond angles at the Si atoms (to 108.2 deg) and an increase in those at the C atoms (to 118.0 deg) as well as the flattening of the six-membered rings.

A General and Selective Synthesis of Methylmonochlorosilanes from Di-, Tri-, and Tetrachlorosilanes

Naganawa, Yuki,Nakajima, Yumiko,Sakamoto, Kei

supporting information, p. 601 - 606 (2021/01/13)

Direct catalytic transformation of chlorosilanes into organosilicon compounds remains challenging due to difficulty in cleaving the strong Si-Cl bond(s). We herein report the palladium-catalyzed cross-coupling reaction of chlorosilanes with organoaluminum reagents. A combination of [Pd(C3H5)Cl]2 and DavePhos ligand catalyzed the selective methylation of various dichlorosilanes 1, trichlorosilanes 5, and tetrachlorosilane 6 to give the corresponding monochlorosilanes.

Hydrodechlorination of (CH3)3SiCHCl2 over Pd, Ni, Co and Fe supported on AlF3

Hina, Rateb,Arafa, Isam,Ennab, Omar

, p. 353 - 358 (2017/03/23)

Gas phase hydrodechlorination (HDC) process of Me3SiCHCl 2 was studied in a flow reactor at 200 °C using a 2% metal loading (w/w) of four different monometallic catalysts (Pd/AlF 3, Ni/AlF 3,Co/AlF 3 and Fe/AlF 3). The catalysts were prepared by sol-gel method and structurally examined by BET method, FT-IR and XPS techniques. The XPS technique showed that Ni II, Fe III and Co III exist as oxides. The major products in the HDC process of Me 3SiCHCl 2 were identified by GC and GC-MS and found to include Me 3SiCH 2Cl, Me 3SiCl, and Me 4Si. The effect of these catalysts on the quantitative conversion, selectivity and conversion rates are reported. [Figure not available: see fulltext.]

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