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4-(Trimethylsilyl)benzamide

Base Information Edit
  • Chemical Name:4-(Trimethylsilyl)benzamide
  • CAS No.:17876-70-9
  • Molecular Formula:C10H15 N O Si
  • Molecular Weight:193.3177
  • Hs Code.:
  • NSC Number:131589
  • DSSTox Substance ID:DTXSID70299606
  • Wikidata:Q82042095
  • Mol file:17876-70-9.mol
4-(Trimethylsilyl)benzamide

Synonyms:4-(trimethylsilyl)benzamide;17876-70-9;NSC131589;SCHEMBL5470502;DTXSID70299606;NSC-131589

Suppliers and Price of 4-(Trimethylsilyl)benzamide
Supply Marketing:Edit
Business phase:
The product has achieved commercial mass production*data from LookChem market partment
Manufacturers and distributors:
  • Manufacture/Brand
  • Chemicals and raw materials
  • Packaging
  • price
Total 5 raw suppliers
Chemical Property of 4-(Trimethylsilyl)benzamide Edit
Chemical Property:
  • Vapor Pressure:0.00199mmHg at 25°C 
  • Boiling Point:291.1°Cat760mmHg 
  • Flash Point:129.8°C 
  • Density:1g/cm3 
  • Hydrogen Bond Donor Count:1
  • Hydrogen Bond Acceptor Count:1
  • Rotatable Bond Count:2
  • Exact Mass:193.092290636
  • Heavy Atom Count:13
  • Complexity:190
Purity/Quality:

99% *data from raw suppliers

Safty Information:
  • Pictogram(s):  
  • Hazard Codes: 
MSDS Files:

SDS file from LookChem

Useful:
  • Canonical SMILES:C[Si](C)(C)C1=CC=C(C=C1)C(=O)N
Technology Process of 4-(Trimethylsilyl)benzamide

There total 4 articles about 4-(Trimethylsilyl)benzamide which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
With benzophenone; Quantum yield; Mechanism; Irradiation; other sensitizers; other solvents;
Guidance literature:
With benzophenone; In cyclohexane; Quantum yield; Mechanism; Irradiation; photholysis in the presence and absence of polymers; other solvents and sensitizers;
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