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PSS-Allyl-Heptacyclopentyl substituted

Base Information
  • Chemical Name:PSS-Allyl-Heptacyclopentyl substituted
  • CAS No.:205131-81-3
  • Molecular Formula:C38H68O12Si8
  • Molecular Weight:941.631
  • Hs Code.:
  • DSSTox Substance ID:DTXSID90402493
  • Nikkaji Number:J1.636.751F
  • Wikidata:Q82205907
  • Mol file:205131-81-3.mol
PSS-Allyl-Heptacyclopentyl substituted

Synonyms:PSS-Allyl-Heptacyclopentyl substituted;205131-81-3;1,3,5,7,9,11,13-heptacyclopentyl-15-prop-2-enyl-2,4,6,8,10,12,14,16,17,18,19,20-dodecaoxa-1,3,5,7,9,11,13,15-octasilapentacyclo[9.5.1.13,9.15,15.17,13]icosane;1-ALLYL-3 5 7 9 11 13 15-HEPTACYCLO-;starbld0004330;SCHEMBL15442636;DTXSID90402493;1-Allyl-3,5,7,9,11,13,15-heptacyclopentylpentacyclo[9.5.1.13,9.15,15.17,13]icosaneoctasiloxane;Allyl-Heptacyclopentyl Substituted;1-Allyl-3,5,7,9,11,13,15-Heptacyclopentylpentacyclo[9.5.1.13,9.15,15.17,13]Ctasiloxane

Suppliers and Price of PSS-Allyl-Heptacyclopentyl substituted
Supply Marketing:
Business phase:
The product has achieved commercial mass production*data from LookChem market partment
Manufacturers and distributors:
  • Manufacture/Brand
  • Chemicals and raw materials
  • Packaging
  • price
  • Sigma-Aldrich
  • PSS-Allyl-Heptacyclopentyl substituted
  • 1g
  • $ 172.00
  • American Custom Chemicals Corporation
  • 1-ALLYL-3,5,7,9,11,13,15-HEPTACYCLOPENTYLPENTACYCLO[9.5.1.1(3,9).1(5,15).1(7,13)]OCTASILOXANE 95.00%
  • 5MG
  • $ 498.94
Total 26 raw suppliers
Chemical Property of PSS-Allyl-Heptacyclopentyl substituted
Chemical Property:
  • Flash Point:>230 °F  
  • PSA:110.76000 
  • LogP:10.56020 
  • Hydrogen Bond Donor Count:0
  • Hydrogen Bond Acceptor Count:12
  • Rotatable Bond Count:9
  • Exact Mass:940.28648988
  • Heavy Atom Count:58
  • Complexity:1380
Purity/Quality:

98%,99%, *data from raw suppliers

PSS-Allyl-Heptacyclopentyl substituted *data from reagent suppliers

Safty Information:
  • Pictogram(s):  
  • Hazard Codes: 
MSDS Files:

SDS file from LookChem

Useful:
  • Canonical SMILES:C=CC[Si]12O[Si]3(O[Si]4(O[Si](O1)(O[Si]5(O[Si](O2)(O[Si](O3)(O[Si](O4)(O5)C6CCCC6)C7CCCC7)C8CCCC8)C9CCCC9)C1CCCC1)C1CCCC1)C1CCCC1
  • Uses Polyhedral oligomeric silsesquioxane (POSS) monomer, useful as model for silica surfaces, and for the formation of novel polymeric materials.
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