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3-Methyl-6-methyleneoctane

Base Information Edit
  • Chemical Name:3-Methyl-6-methyleneoctane
  • CAS No.:74630-07-2
  • Molecular Formula:C10H20
  • Molecular Weight:140.269
  • Hs Code.:
  • Mol file:74630-07-2.mol
3-Methyl-6-methyleneoctane

Synonyms:3-Methyl-6-methyleneoctane

Suppliers and Price of 3-Methyl-6-methyleneoctane
Supply Marketing:Edit
Business phase:
The product has achieved commercial mass production*data from LookChem market partment
Manufacturers and distributors:
  • Manufacture/Brand
  • Chemicals and raw materials
  • Packaging
  • price
Total 3 raw suppliers
Chemical Property of 3-Methyl-6-methyleneoctane Edit
Chemical Property:
  • Boiling Point:161.0±7.0 °C(Predicted) 
  • PSA:0.00000 
  • Density:0.742±0.06 g/cm3(Predicted) 
  • LogP:3.77890 
Purity/Quality:

99% *data from raw suppliers

Safty Information:
  • Pictogram(s):  
  • Hazard Codes: 
MSDS Files:

SDS file from LookChem

Useful:
Technology Process of 3-Methyl-6-methyleneoctane

There total 5 articles about 3-Methyl-6-methyleneoctane which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
With biphenyl; 9,10-Dicyanoanthracene; In acetonitrile; at 20 ℃; Mechanism; Irradiation;
DOI:10.1021/ja00126a039
Guidance literature:
In trichlorofluoromethane; at 0 ℃; Further byproducts given. Yields of byproduct given; 1.) -78 deg C, direct photolyses, CFCl3; 2.) -78 deg C, sensitized photolyses;
DOI:10.1021/ja00388a031
Guidance literature:
Multi-step reaction with 2 steps
1: 1.) H2, 2.) HCl, 3.) NaNO2, 4.) LiAlH4, 5.) tert-butyl hypochlorite, Et3N
2: CCl3F / 0 °C / 1.) -78 deg C, direct photolyses, CFCl3; 2.) -78 deg C, sensitized photolyses
With hydrogenchloride; lithium aluminium tetrahydride; tert-butylhypochlorite; hydrogen; triethylamine; sodium nitrite; In trichlorofluoromethane;
DOI:10.1021/ja00388a031
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