Technology Process of C45H71SO8SiN3
There total 26 articles about C45H71SO8SiN3 which
guide to synthetic route it.
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synthetic route:
- Guidance literature:
-
Multi-step reaction with 10 steps
1.1: 95 percent / H2 / Pd/C / ethyl acetate / 760.05 Torr
2.1: 91 percent / Et3SiH; BF3*OEt2 / CH2Cl2 / 0 °C
3.1: 91 percent / LiAlH4 / diethyl ether / 0 °C
4.1: 94 percent / I2; PPh3; imidazole / acetonitrile; benzene / 20 - 60 °C
5.1: t-BuLi / tetrahydrofuran / -78 °C
5.2: 95 percent / -78 - 0 °C
6.1: 89 percent / O2 / PdCl2; CuCl / H2O; dimethylformamide
7.1: 98 percent / NaN3 / dimethylsulfoxide / 50 °C
8.1: 89 percent / LiHMDS; Et3N / tetrahydrofuran / -78 °C
9.1: 93 percent / MgBr2*OEt2 / CH2Cl2 / 0 °C
10.1: (cyclohexyl)2BCl; iPr2NEt / CH2Cl2 / -78 °C
10.2: -78 - 0 °C
10.3: H2O2 / methanol / 0 - 20 °C / pH 7
With
1H-imidazole; triethylsilane; lithium aluminium tetrahydride; sodium azide; boron trifluoride diethyl etherate; dicyclohexylboron chloride; hydrogen; iodine; tert.-butyl lithium; oxygen; triethylamine; N-ethyl-N,N-diisopropylamine; triphenylphosphine; magnesium bromide; lithium hexamethyldisilazane;
palladium on activated charcoal; copper(l) chloride; palladium dichloride;
In
tetrahydrofuran; diethyl ether; dichloromethane; water; dimethyl sulfoxide; ethyl acetate; N,N-dimethyl-formamide; acetonitrile; benzene;
6.1: Wacker oxidation / 9.1: Mukaiyama aldol addition;
DOI:10.1002/anie.200701520
- Guidance literature:
-
Multi-step reaction with 9 steps
1.1: 91 percent / Et3SiH; BF3*OEt2 / CH2Cl2 / 0 °C
2.1: 91 percent / LiAlH4 / diethyl ether / 0 °C
3.1: 94 percent / I2; PPh3; imidazole / acetonitrile; benzene / 20 - 60 °C
4.1: t-BuLi / tetrahydrofuran / -78 °C
4.2: 95 percent / -78 - 0 °C
5.1: 89 percent / O2 / PdCl2; CuCl / H2O; dimethylformamide
6.1: 98 percent / NaN3 / dimethylsulfoxide / 50 °C
7.1: 89 percent / LiHMDS; Et3N / tetrahydrofuran / -78 °C
8.1: 93 percent / MgBr2*OEt2 / CH2Cl2 / 0 °C
9.1: (cyclohexyl)2BCl; iPr2NEt / CH2Cl2 / -78 °C
9.2: -78 - 0 °C
9.3: H2O2 / methanol / 0 - 20 °C / pH 7
With
1H-imidazole; triethylsilane; lithium aluminium tetrahydride; sodium azide; boron trifluoride diethyl etherate; dicyclohexylboron chloride; iodine; tert.-butyl lithium; oxygen; triethylamine; N-ethyl-N,N-diisopropylamine; triphenylphosphine; magnesium bromide; lithium hexamethyldisilazane;
copper(l) chloride; palladium dichloride;
In
tetrahydrofuran; diethyl ether; dichloromethane; water; dimethyl sulfoxide; N,N-dimethyl-formamide; acetonitrile; benzene;
5.1: Wacker oxidation / 8.1: Mukaiyama aldol addition;
DOI:10.1002/anie.200701520
- Guidance literature:
-
Multi-step reaction with 8 steps
1.1: 91 percent / LiAlH4 / diethyl ether / 0 °C
2.1: 94 percent / I2; PPh3; imidazole / acetonitrile; benzene / 20 - 60 °C
3.1: t-BuLi / tetrahydrofuran / -78 °C
3.2: 95 percent / -78 - 0 °C
4.1: 89 percent / O2 / PdCl2; CuCl / H2O; dimethylformamide
5.1: 98 percent / NaN3 / dimethylsulfoxide / 50 °C
6.1: 89 percent / LiHMDS; Et3N / tetrahydrofuran / -78 °C
7.1: 93 percent / MgBr2*OEt2 / CH2Cl2 / 0 °C
8.1: (cyclohexyl)2BCl; iPr2NEt / CH2Cl2 / -78 °C
8.2: -78 - 0 °C
8.3: H2O2 / methanol / 0 - 20 °C / pH 7
With
1H-imidazole; lithium aluminium tetrahydride; sodium azide; dicyclohexylboron chloride; iodine; tert.-butyl lithium; oxygen; triethylamine; N-ethyl-N,N-diisopropylamine; triphenylphosphine; magnesium bromide; lithium hexamethyldisilazane;
copper(l) chloride; palladium dichloride;
In
tetrahydrofuran; diethyl ether; dichloromethane; water; dimethyl sulfoxide; N,N-dimethyl-formamide; acetonitrile; benzene;
4.1: Wacker oxidation / 7.1: Mukaiyama aldol addition;
DOI:10.1002/anie.200701520