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Tantalum dioxide

Base Information Edit
  • Chemical Name:Tantalum dioxide
  • CAS No.:12036-14-5
  • Molecular Formula:O2Ta
  • Molecular Weight:212.947
  • Hs Code.:
  • DSSTox Substance ID:DTXSID90152820
  • Wikidata:Q4332868
  • Mol file:12036-14-5.mol
Tantalum dioxide

Synonyms:Tantalum dioxide;dioxotantalum;12036-14-5;Dioxyde de tantale;TaO2;Tantalum oxide (TaO2);DTXSID90152820;Q4332868

Suppliers and Price of Tantalum dioxide
Supply Marketing:Edit
Business phase:
The product has achieved commercial mass production*data from LookChem market partment
Manufacturers and distributors:
  • Manufacture/Brand
  • Chemicals and raw materials
  • Packaging
  • price
Total 4 raw suppliers
Chemical Property of Tantalum dioxide Edit
Chemical Property:
  • Boiling Point:°Cat760mmHg 
  • Flash Point:°C 
  • PSA:18.46000 
  • Density:g/cm3 
  • LogP:-0.12860 
  • Hydrogen Bond Donor Count:0
  • Hydrogen Bond Acceptor Count:2
  • Rotatable Bond Count:0
  • Exact Mass:212.93783
  • Heavy Atom Count:3
  • Complexity:18.3
Purity/Quality:

98%,99%, *data from raw suppliers

Safty Information:
  • Pictogram(s):  
  • Hazard Codes: 
MSDS Files:

SDS file from LookChem

Useful:
  • Canonical SMILES:O=[Ta]=O
Technology Process of Tantalum dioxide

There total 2 articles about Tantalum dioxide which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
In solid matrix; Irradiation (UV/VIS); by co-deposition of laser-ablated tantalum atoms with 0.5% O2 in Ar; irradn. at 250 < λ < 580 nm for 15 min followed by 25 K annealing; IR spectra monitoring;
DOI:10.1016/j.chemphys.2008.03.026
Guidance literature:
In solid matrix; by co-deposition of laser-ablated tantalum atoms with 0.5% O2 +2 % Xe inAr; annealing to 43 K; IR spectra monitoring;
DOI:10.1016/j.chemphys.2008.03.026
upstream raw materials:

oxygen

Refernces Edit
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