Multi-step reaction with 16 steps
1.1: TiCl4 / CH2Cl2 / -78 °C
2.1: CSA / benzene / 20 °C
3.1: 91 percent / LiAlH4 / diethyl ether / -78 °C
4.1: 93 percent / Et2Zn / diethyl ether / 20 °C
5.1: N-iodosuccinimide / 20 °C
6.1: n-Bu3SnH; AIBN / benzene / Heating
7.1: 97 percent / imidazole / dimethylformamide / 20 °C
8.1: 78 percent / TiCl4 / CH2Cl2 / -78 - -40 °C
9.1: 98 percent / 2,6-lutidine / CH2Cl2 / 0 °C
10.1: 89 percent / 2,3-dichloro-5,6-dicyano-1,4-benzoquinone / CH2Cl2; H2O / 20 °C
11.1: (COCl)2; DMSO / CH2Cl2 / -78 °C
11.2: 90 percent / Et3N / CH2Cl2 / -78 - 0 °C
12.1: 76 percent / NaN(SiMe3)2 / toluene / 0 - 20 °C
13.1: 85 percent / PhI(OCOCF3)2 / CH2Cl2; acetonitrile; H2O / 20 °C
14.1: tetrahydrofuran / 0 °C
15.1: 2,6-lutidine / CH2Cl2 / 20 °C
16.1: TESOTf; 2,6-lutidine / CH2Cl2 / 20 °C
With
1H-imidazole; 2,6-dimethylpyridine; N-iodo-succinimide; lithium aluminium tetrahydride; oxalyl dichloride; 2,2'-azobis(isobutyronitrile); camphor-10-sulfonic acid; diethylzinc; tri-n-butyl-tin hydride; triethylsilyl trifluoromethyl sulfonate; sodium hexamethyldisilazane; titanium tetrachloride; dimethyl sulfoxide; 2,3-dicyano-5,6-dichloro-p-benzoquinone; bis-[(trifluoroacetoxy)iodo]benzene;
In
tetrahydrofuran; diethyl ether; dichloromethane; water; N,N-dimethyl-formamide; toluene; acetonitrile; benzene;
1.1: Cycloaddition / 2.1: acidolysis / 3.1: Reduction / 4.1: Cycloaddition / 5.1: Ring cleavage / 6.1: Dehalogenation / 7.1: silylation / 8.1: Condensation / 9.1: silylation / 10.1: Oxidation / 11.1: Condensation / 11.2: Elimination / 12.1: Wittig reaction / 13.1: Ring cleavage / 14.1: Addition / 15.1: silylation / 16.1: dealkylation;
DOI:10.1021/ja971946k