Multi-step reaction with 11 steps
1.1: Cp2ZrCl2; DIBAL / tetrahydrofuran; hexane / 0.5 h / 55 °C
1.2: 86 percent / I2 / tetrahydrofuran; hexane / 0.25 h / 0 °C
2.1: 40 percent / CrCl2; NiCl2 / dimethylsulfoxide / 25 h / 25 °C
3.1: VO(acac)2; TBHP / toluene / 2.5 h / 0 °C
3.2: 91 percent / dimethylsulfide / toluene / 0.5 h / 24 °C
4.1: 100 percent / 2,6-lutidine / tetrahydrofuran / 0.17 h / 0 - 25 °C
5.1: 97 percent / DDQ; pH 7 buffer / CH2Cl2 / 0.83 h / 0 °C / pH 7
6.1: CSA / CH2Cl2 / 0.42 h / 0 °C
6.2: 80 percent / triethylamine / CH2Cl2 / 0.5 h / 0 - 25 °C
7.1: 61 percent / (COCl)2; triethylamine; DMSO / CH2Cl2 / 1.25 h / -78 - 0 °C
8.1: 71 percent / HF*Py; pyridine / tetrahydrofuran / 144 h / 25 °C
9.1: 27 percent / NaBH4 / methanol / 0.25 h / 0 °C
10.1: PPTS / benzene / 3 h / 80 °C
11.1: DIBAL / CH2Cl2; hexane / 2 h / -20 °C
With
pyridine; 2,6-dimethylpyridine; chromium dichloride; tert.-butylhydroperoxide; sodium tetrahydroborate; zirconocene dichloride; oxalyl dichloride; bis(acetylacetonate)oxovanadium; pH 7 buffer; camphor-10-sulfonic acid; pyridinium p-toluenesulfonate; diisobutylaluminium hydride; pyridine hydrogenfluoride; dimethyl sulfoxide; triethylamine; 2,3-dicyano-5,6-dichloro-p-benzoquinone; nickel dichloride;
In
tetrahydrofuran; methanol; hexane; dichloromethane; dimethyl sulfoxide; toluene; benzene;
2.1: Nozaki-Hiyama-Kishi reaction / 7.1: Swern oxidation;
DOI:10.1016/j.tet.2006.05.014