Technology Process of 1-[(1R,2R,4S)-5-O-(tert-butyldiphenylsilyl)-2,3-dideoxy-2-fluoro-2-phenylselanyl-4-thio-β-D-pentofuranosyl]uracil
There total 11 articles about 1-[(1R,2R,4S)-5-O-(tert-butyldiphenylsilyl)-2,3-dideoxy-2-fluoro-2-phenylselanyl-4-thio-β-D-pentofuranosyl]uracil which
guide to synthetic route it.
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synthetic route:
- Guidance literature:
-
Multi-step reaction with 10 steps
1.1: 94 percent / H2 / 5 percent Pd/C / ethyl acetate / 3 h
2.1: NaOH / ethanol; H2O / 2 h / 20 °C
2.2: dimethylsulfoxide / 1 h
3.1: 7.52 g / I2; imidazole; PPh3 / toluene / 4 h / 60 °C
4.1: 87 percent / dimethylformamide / 8 h / 20 °C
5.1: DIBAL-H / toluene; hexane / 1 h / -78 °C
6.1: Ac2O; DMSO / 24 h / 20 °C
7.1: LiHMDS / tetrahydrofuran / 1 h / -78 °C
7.2: TMSCl / tetrahydrofuran / -78 - 20 °C
7.3: 72 percent / tetrahydrofuran / 1 h / -78 °C
8.1: DIBAL-H / hexane; toluene / 1 h / -78 °C
9.1: TEA; DMAP / CH2Cl2 / 3 h / 20 °C
10.1: TMSOTf / acetonitrile
With
1H-imidazole; dmap; sodium hydroxide; trimethylsilyl trifluoromethanesulfonate; TEA; hydrogen; iodine; acetic anhydride; diisobutylaluminium hydride; dimethyl sulfoxide; triphenylphosphine; lithium hexamethyldisilazane;
5 percent Pd/C;
In
tetrahydrofuran; ethanol; hexane; dichloromethane; water; ethyl acetate; N,N-dimethyl-formamide; toluene; acetonitrile;
6.1: Moffat-type oxidation;
DOI:10.1021/jm020246+
- Guidance literature:
-
Multi-step reaction with 4 steps
1.1: LiHMDS / tetrahydrofuran / 1 h / -78 °C
1.2: TMSCl / tetrahydrofuran / -78 - 20 °C
1.3: 72 percent / tetrahydrofuran / 1 h / -78 °C
2.1: DIBAL-H / hexane; toluene / 1 h / -78 °C
3.1: TEA; DMAP / CH2Cl2 / 3 h / 20 °C
4.1: TMSOTf / acetonitrile
With
dmap; trimethylsilyl trifluoromethanesulfonate; TEA; diisobutylaluminium hydride; lithium hexamethyldisilazane;
In
tetrahydrofuran; hexane; dichloromethane; toluene; acetonitrile;
DOI:10.1021/jm020246+
- Guidance literature:
-
Multi-step reaction with 5 steps
1.1: Ac2O; DMSO / 24 h / 20 °C
2.1: LiHMDS / tetrahydrofuran / 1 h / -78 °C
2.2: TMSCl / tetrahydrofuran / -78 - 20 °C
2.3: 72 percent / tetrahydrofuran / 1 h / -78 °C
3.1: DIBAL-H / hexane; toluene / 1 h / -78 °C
4.1: TEA; DMAP / CH2Cl2 / 3 h / 20 °C
5.1: TMSOTf / acetonitrile
With
dmap; trimethylsilyl trifluoromethanesulfonate; TEA; acetic anhydride; diisobutylaluminium hydride; dimethyl sulfoxide; lithium hexamethyldisilazane;
In
tetrahydrofuran; hexane; dichloromethane; toluene; acetonitrile;
1.1: Moffat-type oxidation;
DOI:10.1021/jm020246+