Technology Process of (3R,4S,5R,6R)-2-(4-(4-(tert-butyldimethylsilyloxy)benzyl)-5-methylthiophen-2-yl)-3,4,5-tris(trimethylsilyloxy)-6-((trimethylsilyloxy)methyl)-tetrahydro-2H-pyran-2-ol
There total 7 articles about (3R,4S,5R,6R)-2-(4-(4-(tert-butyldimethylsilyloxy)benzyl)-5-methylthiophen-2-yl)-3,4,5-tris(trimethylsilyloxy)-6-((trimethylsilyloxy)methyl)-tetrahydro-2H-pyran-2-ol which
guide to synthetic route it.
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synthetic route:
- Guidance literature:
-
tert-butyl(4-((5-iodo-2-methylthiophen-3-yl)methyl)phenoxy)dimethylsilane; (3R,4S,5R,6R)-3,4,5-tris((trimethylsilyl)oxy)-6-(((trimethylsilyl)oxy)methyl)tetrahydro-2H-pyran-2-one;
With
trimethylsilylmethyllithium;
In
tetrahydrofuran; pentane;
at -65 - -45 ℃;
for 1h;
With
sodium hydrogencarbonate;
In
tetrahydrofuran; water; pentane;
at 20 ℃;
for 0.5h;
- Guidance literature:
-
Multi-step reaction with 7 steps
1.1: acetic acid; pyridium tribromide / 4 h / 40 °C
2.1: N,N-dimethyl-formamide; oxalyl dichloride / dichloromethane / 2 h / 20 °C
2.2: 17 h / 0 - 20 °C
2.3: Cooling
3.1: boron trifluoride diethyl etherate; triethylsilane / dichloromethane; acetonitrile / 15 h / 0 - 20 °C
4.1: boron tribromide / dichloromethane / 3 h / 0 - 20 °C
4.2: 0 °C
5.1: sodium iodide; copper(l) iodide; N,N`-dimethylethylenediamine / 1,4-dioxane / 18 h / 120 °C / Inert atmosphere
6.1: dmap; 1H-imidazole / dichloromethane; N,N-dimethyl-formamide / 15 h / 20 °C
7.1: trimethylsilylmethyllithium / pentane; tetrahydrofuran / 1 h / -65 - -45 °C
7.2: 0.5 h / 20 °C
With
1H-imidazole; triethylsilane; dmap; copper(l) iodide; oxalyl dichloride; pyridium tribromide; boron trifluoride diethyl etherate; boron tribromide; trimethylsilylmethyllithium; acetic acid; N,N-dimethyl-formamide; sodium iodide; N,N`-dimethylethylenediamine;
In
tetrahydrofuran; 1,4-dioxane; dichloromethane; N,N-dimethyl-formamide; acetonitrile; pentane;
2.2: Friedel Crafts Acylation;
- Guidance literature:
-
Multi-step reaction with 6 steps
1.1: N,N-dimethyl-formamide; oxalyl dichloride / dichloromethane / 2 h / 20 °C
1.2: 17 h / 0 - 20 °C
1.3: Cooling
2.1: boron trifluoride diethyl etherate; triethylsilane / dichloromethane; acetonitrile / 15 h / 0 - 20 °C
3.1: boron tribromide / dichloromethane / 3 h / 0 - 20 °C
3.2: 0 °C
4.1: sodium iodide; copper(l) iodide; N,N`-dimethylethylenediamine / 1,4-dioxane / 18 h / 120 °C / Inert atmosphere
5.1: dmap; 1H-imidazole / dichloromethane; N,N-dimethyl-formamide / 15 h / 20 °C
6.1: trimethylsilylmethyllithium / pentane; tetrahydrofuran / 1 h / -65 - -45 °C
6.2: 0.5 h / 20 °C
With
1H-imidazole; triethylsilane; dmap; copper(l) iodide; oxalyl dichloride; boron trifluoride diethyl etherate; boron tribromide; trimethylsilylmethyllithium; N,N-dimethyl-formamide; sodium iodide; N,N`-dimethylethylenediamine;
In
tetrahydrofuran; 1,4-dioxane; dichloromethane; N,N-dimethyl-formamide; acetonitrile; pentane;
1.2: Friedel Crafts Acylation;