C₃₅H₆₃IO₄Si₂

Base Information

Chemical Name:C₃₅H₆₃IO₄Si₂
CAS No.:944052-19-1
Molecular Formula:C₃₅H₆₃IO₄Si₂
Molecular Weight:730.958
Hs Code.:

C<sub>35</sub>H<sub>63</sub>IO<sub>4</sub>Si<sub>2</sub>

Synonyms:C₃₅H₆₃IO₄Si₂

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Chemical Property of C₃₅H₆₃IO₄Si₂

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Technology Process of C₃₅H₆₃IO₄Si₂

There total 20 articles about C₃₅H₆₃IO₄Si₂ which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 86.0%

: 944052-18-0
C₃₇H₆₅IO₅Si₂

: 944052-19-1
C₃₅H₆₃IO₄Si₂

Guidance literature:: With sodium hydroxide; In tetrahydrofuran; methanol; at 0 ℃; for 0.166667h;
DOI:10.1016/j.tetlet.2007.04.016

Reference yield:

: 944052-04-4
C₃₅H₄₈O₄Si

: 944052-19-1
C₃₅H₆₃IO₄Si₂

Guidance literature:: Multi-step reaction with 19 steps

1.1: 78 percent / Li; liq. NH₃ / tetrahydrofuran / 0.17 h / -33 °C

2.1: 70 percent / Et₃N; DMAP / CH₂Cl₂ / 0 - 20 °C

3.1: 92 percent / TBAF / tetrahydrofuran / 0 - 20 °C

4.1: (COCl)2; DMSO; Et₃N / CH₂Cl₂ / 2 h / -78 - 0 °C

5.1: CH₂Cl₂ / 20 °C

6.1: 86 percent / LiBH₄ / tetrahydrofuran / 16 h / 0 - 20 °C

7.1: 96 percent / NaHMDS / tetrahydrofuran; dimethylformamide / 0 - 20 °C

8.1: 65 percent / TFA / 2-methyl-propan-2-ol / 2 h / 20 °C

9.1: 100 percent / 2,6-lutidine / 0.17 h / 0 °C

10.1: 75 percent / HF; pyridine / tetrahydrofuran / 5 h / 0 - 20 °C

11.1: SO₃; pyridine; DMSO / CH₂Cl₂ / 0.5 h / 0 - 20 °C

12.1: CH₂Cl₂ / 20 °C

13.1: 100 percent / DIBAL-H / CH₂Cl₂ / 0.25 h / -78 °C

14.1: SO₃; pyridine; DMSO / CH₂Cl₂ / 0.5 h / 0 - 20 °C

15.1: Ph₃P / CH₂Cl₂ / 0.5 h / 0 °C

15.2: EtMgBr / tetrahydrofuran / 1 h / -78 - 0 °C

16.1: 72 percent / nBuLi / tetrahydrofuran / -78 - 20 °C

17.1: 100 percent / Et₃N; DMAP / CH₂Cl₂ / 0.08 h / 0 °C

18.1: Bu₃SnH / Pd(Ph₃P)2Cl₂ / tetrahydrofuran / 0.5 h / 20 °C

18.2: I₂ / CH₂Cl₂ / 0.5 h / -78 - 0 °C

19.1: 86 percent / NaOH / tetrahydrofuran; methanol / 0.17 h / 0 °C

With pyridine; 2,6-dimethylpyridine; dmap; sodium hydroxide; lithium borohydride; n-butyllithium; oxalyl dichloride; hydrogen fluoride; sulfur trioxide; tetrabutyl ammonium fluoride; ammonia; tri-n-butyl-tin hydride; sodium hexamethyldisilazane; lithium; diisobutylaluminium hydride; dimethyl sulfoxide; triethylamine; triphenylphosphine; trifluoroacetic acid; bis-triphenylphosphine-palladium(II) chloride; In tetrahydrofuran; methanol; dichloromethane; N,N-dimethyl-formamide; tert-butyl alcohol;
DOI:10.1016/j.tetlet.2007.04.016

Reference yield:

: C₃₂H₄₄O₄Si

: 944052-19-1
C₃₅H₆₃IO₄Si₂

Guidance literature:: Multi-step reaction with 20 steps

1.1: 98 percent / CSA / CH₂Cl₂ / 0 - 20 °C

2.1: 78 percent / Li; liq. NH₃ / tetrahydrofuran / 0.17 h / -33 °C

3.1: 70 percent / Et₃N; DMAP / CH₂Cl₂ / 0 - 20 °C

4.1: 92 percent / TBAF / tetrahydrofuran / 0 - 20 °C

5.1: (COCl)2; DMSO; Et₃N / CH₂Cl₂ / 2 h / -78 - 0 °C

6.1: CH₂Cl₂ / 20 °C

7.1: 86 percent / LiBH₄ / tetrahydrofuran / 16 h / 0 - 20 °C

8.1: 96 percent / NaHMDS / tetrahydrofuran; dimethylformamide / 0 - 20 °C

9.1: 65 percent / TFA / 2-methyl-propan-2-ol / 2 h / 20 °C

10.1: 100 percent / 2,6-lutidine / 0.17 h / 0 °C

11.1: 75 percent / HF; pyridine / tetrahydrofuran / 5 h / 0 - 20 °C

12.1: SO₃; pyridine; DMSO / CH₂Cl₂ / 0.5 h / 0 - 20 °C

13.1: CH₂Cl₂ / 20 °C

14.1: 100 percent / DIBAL-H / CH₂Cl₂ / 0.25 h / -78 °C

15.1: SO₃; pyridine; DMSO / CH₂Cl₂ / 0.5 h / 0 - 20 °C

16.1: Ph₃P / CH₂Cl₂ / 0.5 h / 0 °C

16.2: EtMgBr / tetrahydrofuran / 1 h / -78 - 0 °C

17.1: 72 percent / nBuLi / tetrahydrofuran / -78 - 20 °C

18.1: 100 percent / Et₃N; DMAP / CH₂Cl₂ / 0.08 h / 0 °C

19.1: Bu₃SnH / Pd(Ph₃P)2Cl₂ / tetrahydrofuran / 0.5 h / 20 °C

19.2: I₂ / CH₂Cl₂ / 0.5 h / -78 - 0 °C

20.1: 86 percent / NaOH / tetrahydrofuran; methanol / 0.17 h / 0 °C

With pyridine; 2,6-dimethylpyridine; dmap; sodium hydroxide; lithium borohydride; n-butyllithium; oxalyl dichloride; camphor-10-sulfonic acid; hydrogen fluoride; sulfur trioxide; tetrabutyl ammonium fluoride; ammonia; tri-n-butyl-tin hydride; sodium hexamethyldisilazane; lithium; diisobutylaluminium hydride; dimethyl sulfoxide; triethylamine; triphenylphosphine; trifluoroacetic acid; bis-triphenylphosphine-palladium(II) chloride; In tetrahydrofuran; methanol; dichloromethane; N,N-dimethyl-formamide; tert-butyl alcohol;
DOI:10.1016/j.tetlet.2007.04.016