Multi-step reaction with 11 steps
1.1: 83 percent / CuI; BF3*Et2O / tetrahydrofuran / -78 °C
2.1: 97 percent / p-toluenesulfonic acid / methanol / 2 h / 70 °C
3.1: potassium bis(trimethylsilyl)amide / tetrahydrofuran; toluene / 1 h / -78 °C
3.2: hexamethylphosphoramide / tetrahydrofuran; toluene / 2 h / -78 - 0 °C
4.1: 71 percent / triphenylarsine; lithium chloride; triethylamine / tris(dibenzylideneacetone)dipalladium(0) / acetonitrile / 1 h / 50 °C / 15201 Torr
5.1: 78 percent / diisobutylaluminium hydride / tetrahydrofuran; toluene / 2 h / -78 - 0 °C
6.1: 96 percent / triphenylphosphine; imidazole; iodine / diethyl ether; acetonitrile / 1 h / 0 °C
7.1: 95 percent / hexamethylphosphoramide / dimethylformamide / 2 h / 45 °C
8.1: n-BuLi; hexamethylphosphoramide / tetrahydrofuran; various solvent(s) / -78 °C
8.2: 65 percent / tetrahydrofuran / 2 h / -78 - -40 °C
9.1: 99 percent / aq. HCl / acetone / 4 h / 50 °C
10.1: 92 percent / copper(II) bromide / ethyl acetate / 2 h / 50 °C
11.1: 52 percent / 2,2'-azobisisobutyronitrile / toluene / 3 h / 100 °C
With
1H-imidazole; hydrogenchloride; N,N,N,N,N,N-hexamethylphosphoric triamide; copper(l) iodide; n-butyllithium; 2,2'-azobis(isobutyronitrile); triphenyl-arsane; boron trifluoride diethyl etherate; iodine; potassium hexamethylsilazane; diisobutylaluminium hydride; toluene-4-sulfonic acid; triethylamine; triphenylphosphine; lithium chloride; copper(ll) bromide;
tris-(dibenzylideneacetone)dipalladium(0);
In
tetrahydrofuran; methanol; diethyl ether; ethyl acetate; N,N-dimethyl-formamide; acetone; toluene; acetonitrile;
1.1: Addition / 2.1: Etherification / 3.1: Addition / 3.2: Substitution / 4.1: Carbonylation / 5.1: Reduction / 6.1: Iodination / 7.1: Substitution / 8.1: Metallation / 8.2: Alkylation / 9.1: Hydrolysis / 10.1: Bromination / 11.1: Alkylation;
DOI:10.1021/ol005750s