Technology Process of (2S,3S,4R)-2,4-bis(2,2-dimethylpropanoyloxymethyl)-5-(4-methoxybenzoyloxy)pentane-1,3-diol
There total 10 articles about (2S,3S,4R)-2,4-bis(2,2-dimethylpropanoyloxymethyl)-5-(4-methoxybenzoyloxy)pentane-1,3-diol which
guide to synthetic route it.
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synthetic route:
- Guidance literature:
-
With
hydrogen;
Raney Nickel (W2);
In
ethanol;
at 20 ℃;
for 26h;
DOI:10.1248/cpb.48.1761
- Guidance literature:
-
Multi-step reaction with 10 steps
1.1: 86 percent / p-TsOH*H2O / dimethylformamide / 4 h / 55 °C
2.1: 95 percent / n-Bu3SnH; MgBr2 / CH2Cl2 / 1 h / 20 °C
3.1: 87 percent / DMSO; (COCl)2; Et3N / CH2Cl2 / 2.5 h / -78 °C
4.1: n-BuLi / hexane; tetrahydrofuran / 0.5 h / 0 °C
4.2: 83 percent / hexane; tetrahydrofuran / 6 h
5.1: 9-borabicyclo[3.3.1]nonane / tetrahydrofuran / 24 h / 20 °C
5.2: 66 percent / aq. KOH; H2O2 / tetrahydrofuran / 0.5 h
6.1: 99 percent / Et3N; DMAP / CH2Cl2 / 3 h / 20 °C
7.1: 86 percent / 4 N aq. HCl / tetrahydrofuran / 6 h / 55 °C
8.1: Pb(OAc)4 / benzene / 0.17 h / 20 °C
8.2: LiAlH4 / diethyl ether / 0.33 h / 0 °C
9.1: 84 percent / Et3N; DMAP / CH2Cl2 / 1 h / 20 °C
10.1: 91 percent / H2 / Raney nickel (W2) / ethanol / 26 h / 20 °C
With
lead(IV) acetate; hydrogenchloride; dmap; n-butyllithium; oxalyl dichloride; hydrogen; tri-n-butyl-tin hydride; toluene-4-sulfonic acid; dimethyl sulfoxide; triethylamine; 9-bora-bicyclo[3.3.1]nonane; magnesium bromide;
Raney Nickel (W2);
In
tetrahydrofuran; ethanol; hexane; dichloromethane; N,N-dimethyl-formamide; benzene;
3.1: Swern oxidation / 4.2: Wittig methylenation;
DOI:10.1248/cpb.48.1761
- Guidance literature:
-
Multi-step reaction with 7 steps
1.1: n-BuLi / hexane; tetrahydrofuran / 0.5 h / 0 °C
1.2: 83 percent / hexane; tetrahydrofuran / 6 h
2.1: 9-borabicyclo[3.3.1]nonane / tetrahydrofuran / 24 h / 20 °C
2.2: 66 percent / aq. KOH; H2O2 / tetrahydrofuran / 0.5 h
3.1: 99 percent / Et3N; DMAP / CH2Cl2 / 3 h / 20 °C
4.1: 86 percent / 4 N aq. HCl / tetrahydrofuran / 6 h / 55 °C
5.1: Pb(OAc)4 / benzene / 0.17 h / 20 °C
5.2: LiAlH4 / diethyl ether / 0.33 h / 0 °C
6.1: 84 percent / Et3N; DMAP / CH2Cl2 / 1 h / 20 °C
7.1: 91 percent / H2 / Raney nickel (W2) / ethanol / 26 h / 20 °C
With
lead(IV) acetate; hydrogenchloride; dmap; n-butyllithium; hydrogen; triethylamine; 9-bora-bicyclo[3.3.1]nonane;
Raney Nickel (W2);
In
tetrahydrofuran; ethanol; hexane; dichloromethane; benzene;
1.2: Wittig methylenation;
DOI:10.1248/cpb.48.1761