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C28H34N4O5S3

Base Information Edit
C<sub>28</sub>H<sub>34</sub>N<sub>4</sub>O<sub>5</sub>S<sub>3</sub>

Synonyms:C28H34N4O5S3

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The product has achieved commercial mass production*data from LookChem market partment
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Chemical Property of C28H34N4O5S3 Edit
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Technology Process of C28H34N4O5S3

There total 13 articles about C28H34N4O5S3 which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
(5R,8S,11S)-8-isopropyl-5-methyl-11-((E)-4-(tritylthio)but-1-en-1-yl)-10-oxa-3,17-dithia-7,14,19,20-tetraazatricyclo[14.2.1.12,5]icosa-1(18),2(20),16(19)-triene-6,9,13-trione; With chlorotriisopropylsilane; trifluoroacetic acid; In dichloromethane; at 0 - 20 ℃; for 3h;
salicylic alcohol; In dichloromethane;
DOI:10.1021/jm200432a
Guidance literature:
Multi-step reaction with 4 steps
1: lithium hydroxide / tetrahydrofuran; water / 1.25 h / 0 °C
2: diethylamine / dichloromethane / 3 h / 20 °C
3: 1-hydroxy-7-aza-benzotriazole; N-ethyl-N,N-diisopropylamine; HATU / dichloromethane / 30 h / 20 °C
4: chlorotriisopropylsilane; trifluoroacetic acid / dichloromethane / 3 h / 0 - 20 °C
With 1-hydroxy-7-aza-benzotriazole; chlorotriisopropylsilane; diethylamine; N-ethyl-N,N-diisopropylamine; HATU; trifluoroacetic acid; lithium hydroxide; In tetrahydrofuran; dichloromethane; water;
DOI:10.1021/jm200432a
Guidance literature:
Multi-step reaction with 3 steps
1: diethylamine / dichloromethane / 3 h / 20 °C
2: 1-hydroxy-7-aza-benzotriazole; N-ethyl-N,N-diisopropylamine; HATU / dichloromethane / 30 h / 20 °C
3: chlorotriisopropylsilane; trifluoroacetic acid / dichloromethane / 3 h / 0 - 20 °C
With 1-hydroxy-7-aza-benzotriazole; chlorotriisopropylsilane; diethylamine; N-ethyl-N,N-diisopropylamine; HATU; trifluoroacetic acid; In dichloromethane;
DOI:10.1021/jm200432a
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