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C65H108O8Si4

Base Information
  • Chemical Name:C65H108O8Si4
  • CAS No.:1322588-83-9
  • Molecular Formula:C65H108O8Si4
  • Molecular Weight:1129.91
  • Hs Code.:
C<sub>65</sub>H<sub>108</sub>O<sub>8</sub>Si<sub>4</sub>

Synonyms:C65H108O8Si4

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Chemical Property of C65H108O8Si4
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Technology Process of C65H108O8Si4

There total 16 articles about C65H108O8Si4 which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
Multi-step reaction with 9 steps
1: potassium hydride / tetrahydrofuran
2: sodium periodate; osmium(VIII) oxide; 4-methylmorpholine N-oxide
3: lithium diisopropyl amide
4: acetic acid; tetramethylammonium triacetoxyborohydride / acetonitrile / 22 h / -30 °C
5: 2,6-dimethylpyridine
6: hydrogenchloride / isopropyl alcohol / 6 h / 70 °C
7: oxalyl dichloride; dimethyl sulfoxide
8: lithium hexamethyldisilazane / 1 h / -78 °C
9: 2,6-dimethylpyridine
With 2,6-dimethylpyridine; hydrogenchloride; sodium periodate; osmium(VIII) oxide; oxalyl dichloride; potassium hydride; acetic acid; dimethyl sulfoxide; 4-methylmorpholine N-oxide; lithium hexamethyldisilazane; tetramethylammonium triacetoxyborohydride; lithium diisopropyl amide; In tetrahydrofuran; isopropyl alcohol; acetonitrile; 3: Aldol addition / 7: Swern oxidation;
DOI:10.1080/00397911.2010.516462
Guidance literature:
Multi-step reaction with 7 steps
1: toluene-4-sulfonic acid / tetrahydrofuran
2: acetic acid / water
3: 2,6-dimethylpyridine
4: hydrogenchloride / isopropyl alcohol / 6 h / 70 °C
5: oxalyl dichloride; dimethyl sulfoxide
6: lithium hexamethyldisilazane / 1 h / -78 °C
7: 2,6-dimethylpyridine
With 2,6-dimethylpyridine; hydrogenchloride; oxalyl dichloride; toluene-4-sulfonic acid; acetic acid; dimethyl sulfoxide; lithium hexamethyldisilazane; In tetrahydrofuran; water; isopropyl alcohol; 5: Swern oxidation;
DOI:10.1080/00397911.2010.516462
upstream raw materials:

C37H54O7Si

C40H58O7Si

C55H94O7Si3

C53H90O6Si3

Downstream raw materials:

C57H100O7Si4

C57H100O7Si4

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