Welcome to LookChem.com Sign In|Join Free
  • or

Encyclopedia

ClGe(NC(C6H5)2)Cr(CO)5

Base Information
  • Chemical Name:ClGe(NC(C6H5)2)Cr(CO)5
  • CAS No.:115775-75-2
  • Molecular Formula:C18H10ClCrGeNO5
  • Molecular Weight:480.32
  • Hs Code.:
ClGe(NC(C<sub>6</sub>H<sub>5</sub>)2)Cr(CO)5

Synonyms:

Suppliers and Price of ClGe(NC(C6H5)2)Cr(CO)5
Supply Marketing:
Business phase:
The product has achieved commercial mass production*data from LookChem market partment
Manufacturers and distributors:
  • Manufacture/Brand
  • Chemicals and raw materials
  • Packaging
  • price
Total 0 raw suppliers
Chemical Property of ClGe(NC(C6H5)2)Cr(CO)5
Chemical Property:
Purity/Quality:
Safty Information:
  • Pictogram(s):  
  • Hazard Codes: 
MSDS Files:
Useful:
Technology Process of ClGe(NC(C6H5)2)Cr(CO)5

There total 3 articles about ClGe(NC(C6H5)2)Cr(CO)5 which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
In benzene; byproducts: Et3GeH, Et3GeCl; addn. of (Et3Ge)2Hg to soln. of complex in benzene, 5d, 20°C, stirred, darkness, sepn. of Hg, evapn. in reduced pressure, pptn. of powder by addn. of pentane or hexane, partial decompn., under argon; identified by IR and (1)H-NMR;
DOI:10.1016/S0022-328X(00)98909-5
Guidance literature:
In hexane; byproducts: Et3GeCl, THF; addn. of Et3GeNCPh2 to suspn. of Cr complex in hexane, 3h, ambient temp., equimolar ratio of educts, stirred, sepn. of ppt., washed with hexane, dried, under argon; elem. anal.;
DOI:10.1016/S0022-328X(00)98909-5
Guidance literature:
With triethylamine; In benzene; addn. of triethylamine to soln. of complex, 4h, 20°C, stirred, evapn. in reduced pressure, treatment of residue with THF/ether, under argon;
DOI:10.1016/S0022-328X(00)98909-5
Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1 Customer Service

What can I do for you?
Get Best Price

Get Best Price for 115775-75-2