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C59H94O8Si3

Base Information Edit
C<sub>59</sub>H<sub>94</sub>O<sub>8</sub>Si<sub>3</sub>

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The product has achieved commercial mass production*data from LookChem market partment
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Chemical Property of C59H94O8Si3 Edit
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Technology Process of C59H94O8Si3

There total 15 articles about C59H94O8Si3 which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
With lithium hexamethyldisilazane; at -78 ℃; for 1h;
DOI:10.1080/00397911.2010.516462
Guidance literature:
Multi-step reaction with 8 steps
1: potassium hydride / tetrahydrofuran
2: sodium periodate; osmium(VIII) oxide; 4-methylmorpholine N-oxide
3: lithium diisopropyl amide
4: acetic acid; tetramethylammonium triacetoxyborohydride / acetonitrile / 22 h / -30 °C
5: 2,6-dimethylpyridine
6: hydrogenchloride / isopropyl alcohol / 6 h / 70 °C
7: oxalyl dichloride; dimethyl sulfoxide
8: lithium hexamethyldisilazane / 1 h / -78 °C
With 2,6-dimethylpyridine; hydrogenchloride; sodium periodate; osmium(VIII) oxide; oxalyl dichloride; potassium hydride; acetic acid; dimethyl sulfoxide; 4-methylmorpholine N-oxide; lithium hexamethyldisilazane; tetramethylammonium triacetoxyborohydride; lithium diisopropyl amide; In tetrahydrofuran; isopropyl alcohol; acetonitrile; 3: Aldol addition / 7: Swern oxidation;
DOI:10.1080/00397911.2010.516462
Guidance literature:
Multi-step reaction with 6 steps
1: toluene-4-sulfonic acid / tetrahydrofuran
2: acetic acid / water
3: 2,6-dimethylpyridine
4: hydrogenchloride / isopropyl alcohol / 6 h / 70 °C
5: oxalyl dichloride; dimethyl sulfoxide
6: lithium hexamethyldisilazane / 1 h / -78 °C
With 2,6-dimethylpyridine; hydrogenchloride; oxalyl dichloride; toluene-4-sulfonic acid; acetic acid; dimethyl sulfoxide; lithium hexamethyldisilazane; In tetrahydrofuran; water; isopropyl alcohol; 5: Swern oxidation;
DOI:10.1080/00397911.2010.516462
upstream raw materials:

C37H54O7Si

C40H58O7Si

C55H94O7Si3

C53H90O6Si3

Downstream raw materials:

C57H100O7Si4

C57H100O7Si4

C65H108O8Si4

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