Technology Process of C37H55NO5Si
There total 14 articles about C37H55NO5Si which
guide to synthetic route it.
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synthetic route:
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129056-41-3
(7S,13E,16S,17R,18R,19E)-7-tert-Butyldimethylsilyloxy-17,18-isopropylidenedioxy-16,18-dimethyl-10-phenyl[11]cytochalasa-6(12),13,19-triene-1,21-dione
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129056-42-4
(7S,13E,16S,17R,18R,19E,21R)-7-tert-Butyldimethylsilyloxy-21-hydroxy-17,18-isopropylidenedioxy-16,18-dimethyl-10-phenyl[11]cytochalasa-6(12),13,19-triene-1-one
- Guidance literature:
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With
sodium tetrahydroborate; cerium(III) chloride;
DOI:10.1039/c39900000464
- Guidance literature:
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Multi-step reaction with 8 steps
1: 90 percent / 2,6-lutidine
2: 75 percent / SOCl2, triethylamine
3: 75 percent / OsO4
4: 100 percent / toluene p-sulphonic acid / CHCl3
5: 70 percent / lithium di-isopropylamide (LDA) / -35 °C
6: 85 percent / KOH / methanol
7: 67 percent / H2O2 / H2O; pyridine
8: NaBH4, CeCl3
With
2,6-dimethylpyridine; potassium hydroxide; sodium tetrahydroborate; osmium(VIII) oxide; thionyl chloride; cerium(III) chloride; dihydrogen peroxide; toluene-4-sulfonic acid; triethylamine; lithium diisopropyl amide;
In
pyridine; methanol; chloroform; water;
DOI:10.1039/c39900000464
- Guidance literature:
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Multi-step reaction with 12 steps
2: 1.) LiN(SiMe3)2, PhSeCl, 2.) m-chloroperoxybenzoic acid, H2O2 / 2.) from -50 deg C to 0 deg C
3: toluene / 80 °C
4: 55 percent / OsO4
5: 90 percent / 2,6-lutidine
6: 75 percent / SOCl2, triethylamine
7: 75 percent / OsO4
8: 100 percent / toluene p-sulphonic acid / CHCl3
9: 70 percent / lithium di-isopropylamide (LDA) / -35 °C
10: 85 percent / KOH / methanol
11: 67 percent / H2O2 / H2O; pyridine
12: NaBH4, CeCl3
With
2,6-dimethylpyridine; potassium hydroxide; sodium tetrahydroborate; osmium(VIII) oxide; thionyl chloride; Phenylselenyl chloride; cerium(III) chloride; dihydrogen peroxide; toluene-4-sulfonic acid; triethylamine; 3-chloro-benzenecarboperoxoic acid; lithium hexamethyldisilazane; lithium diisopropyl amide;
In
pyridine; methanol; chloroform; water; toluene;
DOI:10.1039/c39900000464