Technology Process of C41H56O6Si
There total 7 articles about C41H56O6Si which
guide to synthetic route it.
The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:
synthetic route:
- Guidance literature:
-
Multi-step reaction with 7 steps
1: pyridinium p-toluenesulfonate / N,N-dimethyl-formamide / 20 °C / Inert atmosphere
2: lithium aluminium tetrahydride / tetrahydrofuran / Inert atmosphere
3: triethylamine tris(hydrogen fluoride) / tetrahydrofuran / Inert atmosphere
4: N,N-dimethyl-formamide / Inert atmosphere
5: Dess-Martin periodane / Inert atmosphere
6: indium / N,N-dimethyl-formamide / Inert atmosphere
7: Dess-Martin periodane / Inert atmosphere
With
indium; lithium aluminium tetrahydride; pyridinium p-toluenesulfonate; Dess-Martin periodane; triethylamine tris(hydrogen fluoride);
In
tetrahydrofuran; N,N-dimethyl-formamide;
5: Dess-Martin oxidation / 7: Dess-Martin oxidation;
DOI:10.1002/chem.201002932
- Guidance literature:
-
Multi-step reaction with 3 steps
1: Dess-Martin periodane / Inert atmosphere
2: indium / N,N-dimethyl-formamide / Inert atmosphere
3: Dess-Martin periodane / Inert atmosphere
With
indium; Dess-Martin periodane;
In
N,N-dimethyl-formamide;
1: Dess-Martin oxidation / 3: Dess-Martin oxidation;
DOI:10.1002/chem.201002932
- Guidance literature:
-
Multi-step reaction with 5 steps
1: triethylamine tris(hydrogen fluoride) / tetrahydrofuran / Inert atmosphere
2: N,N-dimethyl-formamide / Inert atmosphere
3: Dess-Martin periodane / Inert atmosphere
4: indium / N,N-dimethyl-formamide / Inert atmosphere
5: Dess-Martin periodane / Inert atmosphere
With
indium; Dess-Martin periodane; triethylamine tris(hydrogen fluoride);
In
tetrahydrofuran; N,N-dimethyl-formamide;
3: Dess-Martin oxidation / 5: Dess-Martin oxidation;
DOI:10.1002/chem.201002932