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C57H100O7Si4

Base Information
  • Chemical Name:C57H100O7Si4
  • CAS No.:1322588-84-0
  • Molecular Formula:C57H100O7Si4
  • Molecular Weight:1009.76
  • Hs Code.:
C<sub>57</sub>H<sub>100</sub>O<sub>7</sub>Si<sub>4</sub>

Synonyms:

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Chemical Property of C57H100O7Si4
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Technology Process of C57H100O7Si4

There total 18 articles about C57H100O7Si4 which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
With trifluoroacetic acid; In benzene; at 20 ℃; for 72h; optical yield given as %de; stereoselective reaction;
DOI:10.1080/00397911.2010.516462
Guidance literature:
Multi-step reaction with 8 steps
1: acetic acid / water
2: 2,6-dimethylpyridine
3: hydrogenchloride / isopropyl alcohol / 6 h / 70 °C
4: oxalyl dichloride; dimethyl sulfoxide
5: lithium hexamethyldisilazane / 1 h / -78 °C
6: 2,6-dimethylpyridine
7: 2,3-dicyano-5,6-dichloro-p-benzoquinone / dichloromethane; water / 1 h / 20 °C
8: trifluoroacetic acid / benzene / 72 h / 20 °C
With 2,6-dimethylpyridine; hydrogenchloride; oxalyl dichloride; acetic acid; dimethyl sulfoxide; trifluoroacetic acid; 2,3-dicyano-5,6-dichloro-p-benzoquinone; lithium hexamethyldisilazane; In dichloromethane; water; isopropyl alcohol; benzene; 4: Swern oxidation;
DOI:10.1080/00397911.2010.516462
Guidance literature:
Multi-step reaction with 9 steps
1: toluene-4-sulfonic acid / tetrahydrofuran
2: acetic acid / water
3: 2,6-dimethylpyridine
4: hydrogenchloride / isopropyl alcohol / 6 h / 70 °C
5: oxalyl dichloride; dimethyl sulfoxide
6: lithium hexamethyldisilazane / 1 h / -78 °C
7: 2,6-dimethylpyridine
8: 2,3-dicyano-5,6-dichloro-p-benzoquinone / dichloromethane; water / 1 h / 20 °C
9: trifluoroacetic acid / benzene / 72 h / 20 °C
With 2,6-dimethylpyridine; hydrogenchloride; oxalyl dichloride; toluene-4-sulfonic acid; acetic acid; dimethyl sulfoxide; trifluoroacetic acid; 2,3-dicyano-5,6-dichloro-p-benzoquinone; lithium hexamethyldisilazane; In tetrahydrofuran; dichloromethane; water; isopropyl alcohol; benzene; 5: Swern oxidation;
DOI:10.1080/00397911.2010.516462
upstream raw materials:

C37H54O7Si

C40H58O7Si

C55H94O7Si3

C53H90O6Si3

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