Technology Process of 2-Acetamido-4-O-(2-acetamido-3,4,6-tri-O-benzyl-2-desoxy-β-D-glucopyranosyl)-1,6-di-O-acetyl-2-desoxy-3-O-<(R)-1-(methoxycarbonyl)ethyl>-β-D-glucopyranose
There total 10 articles about 2-Acetamido-4-O-(2-acetamido-3,4,6-tri-O-benzyl-2-desoxy-β-D-glucopyranosyl)-1,6-di-O-acetyl-2-desoxy-3-O-<(R)-1-(methoxycarbonyl)ethyl>-β-D-glucopyranose which
guide to synthetic route it.
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synthetic route:
- Guidance literature:
-
Multi-step reaction with 6 steps
1: 1.) NaH / 1.) DME, room temp.; 2.) 3 h
2: 70 percent / 60percent CF3COOH / CH2Cl2 / 2 h / Ambient temperature
3: 3 g / pyridine / dimethylformamide / 12 h / 0 °C
4: 39 percent / CF3SO3Si(CH3)3 / CH2Cl2; hexane / -15 °C
5: 53 percent / 1 M (NBu4)F / tetrahydrofuran / 1.) 6 h, reflux, 2.) 3 h
6: 1.) NaBH4, NiCl2, H3BO3 / 1.) CH3OH, 5 deg C
With
pyridine; sodium tetrahydroborate; trimethylsilyl trifluoromethanesulfonate; tetrabutyl ammonium fluoride; boric acid; sodium hydride; trifluoroacetic acid; nickel dichloride;
In
tetrahydrofuran; hexane; dichloromethane; N,N-dimethyl-formamide;
- Guidance literature:
-
Multi-step reaction with 3 steps
1: 39 percent / CF3SO3Si(CH3)3 / CH2Cl2; hexane / -15 °C
2: 53 percent / 1 M (NBu4)F / tetrahydrofuran / 1.) 6 h, reflux, 2.) 3 h
3: 1.) NaBH4, NiCl2, H3BO3 / 1.) CH3OH, 5 deg C
With
sodium tetrahydroborate; trimethylsilyl trifluoromethanesulfonate; tetrabutyl ammonium fluoride; boric acid; nickel dichloride;
In
tetrahydrofuran; hexane; dichloromethane;
- Guidance literature:
-
Multi-step reaction with 7 steps
1: 88 percent / p-toluenesulfonic acid / dimethylformamide / 12 h / Ambient temperature
2: 1.) NaH / 1.) CH2Cl2, 40 deg C; 2.) 40 deg C, 6 h; room temp., 12 h
3: 71 percent / 60percent CF3COOH / CH2Cl2 / 8 h / Ambient temperature
4: 3 g / pyridine / dimethylformamide / 12 h / 0 °C
5: 39 percent / CF3SO3Si(CH3)3 / CH2Cl2; hexane / -15 °C
6: 53 percent / 1 M (NBu4)F / tetrahydrofuran / 1.) 6 h, reflux, 2.) 3 h
7: 1.) NaBH4, NiCl2, H3BO3 / 1.) CH3OH, 5 deg C
With
pyridine; sodium tetrahydroborate; trimethylsilyl trifluoromethanesulfonate; tetrabutyl ammonium fluoride; boric acid; sodium hydride; toluene-4-sulfonic acid; trifluoroacetic acid; nickel dichloride;
In
tetrahydrofuran; hexane; dichloromethane; N,N-dimethyl-formamide;