10025-78-2

Basic information

• Product Name: Trichlorosilane
• Synonyms: TRICHLOROSILANE;Silane, trichloro;silanea-19;silici-chloroforme;silici-chloroforme(french);siliciumchloroform;siliconchloridehydride(sihcl3);trichloorsilaan
• CAS NO: 10025-78-2
• Molecular Formula: Cl₃HSi
• Molecular Weight: 135.45
• EINECS: 233-042-5
• Product Categories: Reduction;Si (Classes of Silicon Compounds);Si-Cl Compounds;Si-H Compounds;Silicon Compounds (for Synthesis);Synthetic Organic Chemistry;Trichlorosilanes;Chloro Silanes;POSS? Precursors and Intermediates;Protecting and Derivatizing Reagents;RSiCl3Protection and Derivatization;Silicon-Based;Silsesquioxanes: POSS? Nanohybrids
• Mol File: 10025-78-2.mol
• Article Data: 104

Chemical Properties

• Melting Point: -127 °C
• Boiling Point: 32-34 °C(lit.)
• Flash Point: 7 °F
• Appearance: Colorless/Liquid
• Density: 1.342 g/mL at 25 °C(lit.)
• Vapor Density: 1 (vs air)
• Vapor Pressure: 9.75 psi ( 20 °C)
• Refractive Index: 1.4-1.402
• Storage Temp.: Refrigerator
• Solubility: Soluble in benzene, ether, heptane, chloroform and carbon tetrac
• Explosive Limit: 70%
• Water Solubility: decomposes
• Sensitive: Air & Moisture Sensitive
• Stability: Stable, but extremely flammable. Pyrophoric - spontaneously ignites in air. Explosion hazard in air - note wide explosion limits
• Merck: 14,9646
• CAS DataBase Reference: Trichlorosilane(CAS DataBase Reference)
• NIST Chemistry Reference: Trichlorosilane(10025-78-2)
• EPA Substance Registry System: Trichlorosilane(10025-78-2)

Safety Data

• Hazard Codes: F+,C
• Statements: 12-14-17-20/22-29-35
• Safety Statements: 16-26-36/37/39-43-45-7/9-43A
• RIDADR: UN 1295 4.3/PG 1
• WGK Germany: 1
• RTECS: VV5950000
• F: 4.5-21-31
• TSCA: Yes
• HazardClass: 4.3
• PackingGroup: I
• Hazardous Substances Data: 10025-78-2(Hazardous Substances Data)

Usage

Physical and chemical properties

Trichlorosilane is pungent stench flowable volatile colorless liquid at room temperature and pressure. It is highly flammable in air, it also has the risk of fire at below-18 ℃, when meets open fire, it burns strongly with red flames and white smoke, and SiO2, HCl and Cl2 can generate: SiHCl3 + O2 → SiO2 + HCl + Cl2; the vapor of three chlorosilane and air can form a wide range of concentrations of explosive gas mixture, and it can cause violent explosion when be heated. The thermal stability is better than dichlorosilane, it can decompose into toxic fumes chloride (HCl), Cl2 and Si at 900℃. When meets moisture, it can generate smoke, it can react violently with water: 2SiHCl3 + 3H2O → (HSiO) 2O + 6HCl; It can decompose in lye and release hydrogen: SiHCl3 + 3NaOH + H2O → Si (OH) 4 + 3NaCl + H2; and when it contacts oxidative substances, explosive reaction can occur. The reaction with acetylene, hydrocarbons and other organic hydrocarbons can produce chlorosilane: SiHCl3 + CH≡CH → CH2CHSiCl3, SiHCl3 + CH2 = CH2 → CH3CH2SiCl3; In the presence of lithium aluminum hydride, lithium borohydride, SiHCl3 can be reduced to silane. When the container is subjected to strong shock, liquid SiHCl3 will fire. It is soluble in benzene, ether etc.. Anhydrous trichlorosilane can not corrode iron and stainless steel, but in the presence of moisture, it can corrode most metals.

Trichlorosilane

Trichlorosilane is also known as trichlorosilane, silicon chloroform, it can be used the raw material of polymer organic silicon compound. Trichlorosilane is not only the important intermediate of manufacturing silane coupling agent, and other organic silicon products, but also the major raw material to manufacture polysilicon. Silane coupling agent is an important, high-tech, high value-added silicone composite material, the non-crosslinked resin can crosslink or modify by silane coupling agent, so it is increasingly and widely used in glass fiber, foundry, tires rubber and other industries. Silicon tetrachloride which is the major byproduct in the production of trichlorosilane is also the main raw material of silicone, the manufactures contain silicon ester, silicone oil, high temperature insulation paint, silicone resin, silicone rubber and heat-resistant padded material . High-purity silicon tetrachloride or high-purity silica is important raw material in manufacturing of inorganic silicon compounds, quartz fibers and optical fiber. The main purpose of the polysilicon product: 1. It can be made into solar cell, the radiant energy can be turned into electrical energy; 2. high purity crystalline silicon is an important semiconductor material; 3. it is important material in cermet, Astronautical; 4. it can be used in optical fiber communication which is recent modern communication means; 5. it can be used in excellent properties of the organosilicon compounds.

Toxicity

After several minutes of inhaling trichlorosilane vapor, people show excitement, breathing reflex disorders, respiratory inflammation. When spills on the skin, it can cause necrosis, long-term healing of ulcers. Maximum allowable concentration is 1 mg/m3 (must test HCl). Production staff should wear closed-type overalls, protective masks, sealed glasses, latex gloves and other protective clothing to prevent direct contact with the respiratory organs, eyes and skin. Production equipment must be sealed, workshop should be ventilated. After work, people should take a shower, and aobserve personal hygiene. Production workers should have pre-employment and periodic medical examinations.

Chemical properties

It is colorless liquid. It is soluble in carbon disulfide, carbon tetrachloride, chloroform, benzene etc.

Uses

It can be used the raw material for polymer organic silicon compound, it can also be used in industrial instrumentation. It can be used the raw material for producing organic silicon compound, it is also the basic raw material of production polysilicon.

Production method

The method of boiling chlorination Silicon powder after dried is added into boiling chloride furnace, and reacts with dry hydrogen chloride gas which passes into the furnace of at 340 ℃. The generated crude trichlorosilane goes through the wet dust collector, condenser tube and comes into distillation column to separate silicon tetrachloride, trichlorosilane gas from the distillation column is condensed to obtain finished trichlorosilane. Si + 3HCl → SiHCl3 + H2

Category

Flammable liquid.

Toxicity grading

Mid toxicity.

Acute oral toxicity

rat LD50: 1030 mg/kg; Inhalation-Mouse LC50: 1500 mg/m/2 hours.

Flammability hazard characteristics

It is flammable in case of fire, high temperature, oxidant; it can generate toxic fumes of chlorides and fluorides in case of water or high temperature.

Storage characteristics

Treasury should be ventilated and low-temperature dried; it should be stored separately with oxidants, acids.

Extinguishing agent

Dry powder, dry sand, carbon dioxide, foam.

Chemical Properties

Clear liquid with acrid odor of hydrogen chloride

Uses

In organic synthesis.

Uses

Trichlorosilane is used in process of hydrosilylation. It is also used for reductive hydrazination which is a high yielding method for preparation of 1,1-disubstituted hydrazines.

General Description

A colorless fuming liquid with a pungent odor. Flash point 7°F. Vapor and liquid cause burns. More dense than water. Vapors are heavier than air.

Air & Water Reactions

Highly flammable. Ignites spontaneously in air [NFPA, 1991]. Reacts violently with water, steam, moisture in air to generate heat and flammable (H2) and corrosive (HCl) gases. [Handling Chemicals Safely 1980. p. 924].

Reactivity Profile

Trichlorosilane reacts with alcohols, acetone, light metals with generation of heat and combustible (H2) and corrosive (HCl) gases [Handling Chemicals Safely 1980. p. 924].

Health Hazard

Inhalation causes severe irritation of respiratory system. Liquid causes severe burns of eyes and skin. Ingestion causes severe burns of mouth and stomach.

Flammability and Explosibility

Substances and mixtureswhichincontactwithwateremitflammablegases

Chemical Reactivity

Reactivity with Water Reacts violently to form hydrogen chloride fumes (hydrochloric acid); Reactivity with Common Materials: Reacts with surface moisture to form hydrochloric acid which corrodes metals and generates flammable hydrogen gas; Stability During Transport: Stable; Neutralizing Agents for Acids and Caustics: Flush with water and rinse with sodium bicarbonate or lime solution; Polymerization: Not pertinent; Inhibitor of Polymerization: Not pertinent.

Safety Profile

Moderately toxic by ingestion and inhalation. A corrosive irritant to skin, eyes, and mucous membranes. A very dangerous fire hazard when exposed to heat, flame, or by chemical reaction. May be ignited by spark or impact. Spontaneously flammable in air. Explosive reaction with acetonitrile + diphenyl sulfoxide. Will react with water or steam to produce heat and toxic and corrosive fumes. Can react vigorously with oxidizing materials. To fight fire, use CO2, dry chemical. When heated to decomposition it emits toxic fumes of Cl-. See also CHLOROSILANES.

InChI:InChI=1/Cl3Si/c1-4(2)3

Synthetic route

silicon (7440-21-3) → Methyltrichlorosilane (75-79-6) + tetrachlorosilane (10026-04-7, 53609-55-5) + trichlorosilane (10025-78-2) + dimethylsilicon dichloride (75-78-5)

Conditions	Yield
With methylene chloride; copper In neat (no solvent) mixt. of CH3Cl/N2 (2:5) and Si-Cu (9:1) at 300°C;;	A 4% B n/a C n/a D 86.5%
With methylene chloride; copper In neat (no solvent) mixt. of CH3Cl/N2 (2:5) and Si-Cu (9:1) at 300°C;;	A 4% B n/a C n/a D 86.5%
With methylene chloride; copper In neat (no solvent) CH3Cl and Si-Cu mixt. (8:2) at 350°C;;

n-propyltrichlorosilane (141-57-1) → trichlorosilane (10025-78-2)

Conditions	Yield
With hydrogen; Rh, Re/C at 550℃; under 5807.73 Torr; for 10.1h; Product distribution / selectivity;	82%

hydrogenchloride (7647-01-0) + Cu(b),Si(20) (X%) → tetrachlorosilane (10026-04-7, 53609-55-5) + trichlorosilane (10025-78-2)

Conditions	Yield
In neat (no solvent) reaction at 300 °C;;	A 20% B 80%
In neat (no solvent) reaction at 300 °C;;	A 20% B 80%

ethyltrichlorosilane (115-21-9) → trichlorosilane (10025-78-2)

Conditions	Yield
With hydrogen; Rh, Re/C at 700℃; under 5947.36 Torr; for 17.8833h; Product distribution / selectivity;	75.3%

Methyltrichlorosilane (75-79-6) → tetrachlorosilane (10026-04-7, 53609-55-5) + trichlorosilane (10025-78-2)

Conditions	Yield
With hydrogen; Rh/C at 800℃; Product distribution / selectivity;	A 73.3% B 25.1%

tetrachlorosilane (10026-04-7, 53609-55-5) + hydrogen (1333-74-0) → trichlorosilane (10025-78-2)

Conditions	Yield
In neat (no solvent) SiCl4 reacted with H2 in thermo-plasma at 50 kW at 3500-5000 K;	72.9%
In neat (no solvent) Kinetics; byproducts: hydrogen chloride; bubbling H2 through liq. SiCl4 at constant temp.; introducing into the discharge zone; various product ratios yield various H2:SiCl4 molar ratio, molar energy input, and pressure; gas chromy.;	60%
at 900 - 1300℃; under 1125.11 - 3750.38 Torr; Product distribution / selectivity;

Methyltrichlorosilane (75-79-6) → trichlorosilane (10025-78-2)

Conditions	Yield
With hydrogen; Rh, Re/C at 550℃; under 4556.19 Torr; for 4.55h; Product distribution / selectivity;	70.8%

hydrogenchloride (7647-01-0) + silicon (7440-21-3) → trichlorosilane (10025-78-2)

Conditions	Yield
With CuO-ZnO-In2O3 mesocrystal microspheres Reagent/catalyst;	61.2%
In not given heating of silicon washed with HCl and dried in a stream of HCl at 450-500 °C;;
In not given heating of silicon washed with HCl and dried in a stream of HCl at 450-500 °C;;
at 230 - 260℃;

Methyltrichlorosilane (75-79-6) → Dichloromethylsilane (75-54-7) + tetrachlorosilane (10026-04-7, 53609-55-5) + trichlorosilane (10025-78-2)

Conditions	Yield
With hydrogen; Rh/C at 700℃; Product distribution / selectivity;	A 5.5% B 28.2% C 22.9%

tetrachlorosilane (10026-04-7, 53609-55-5) + hydrogen (1333-74-0) + silicon (7440-21-3) → trichlorosilane (10025-78-2)

Conditions	Yield
copper(l) chloride at 525℃; Product distribution / selectivity;	6.14%
at 525℃; Product distribution / selectivity;	4.6%
at 500℃; under 22502.3 Torr; Product distribution / selectivity; Industry scale;

1,2-Dichloropropane (26198-63-0, 78-87-5) + nitrogen + copper containing silicon → tetrachlorosilane (10026-04-7, 53609-55-5) + allyltrichlorosilane (107-37-9) + 1,2-bis-trichlorosilanyl-propane (18171-37-4) + trichlorosilane (10025-78-2)

Conditions	Yield
at 300℃; Produkt 5: 2-Dichlorsilyl-1-trichlorsilyl-propan;

chloroform (67-66-3) + silicon-copper → tetrachlorosilane (10026-04-7, 53609-55-5) + 1,1,1,3,3,3-hexachloro-1,3-disilapropane (4142-85-2) + tris(trichlorosilyl)methane (4775-56-8) + trichlorosilane (10025-78-2)

Conditions	Yield
at 300℃;

hydrogenchloride (7647-01-0) + tetrachlorosilane (10026-04-7, 53609-55-5) + hydrogen (1333-74-0) + silicon (7440-21-3) → trichlorosilane (10025-78-2)

Conditions	Yield
copper(l) chloride at 300℃; Product distribution / selectivity;

dibromochlorosilane (82146-27-8) + trimethylstannane (1631-73-8) → tribromosilane (7789-57-3) + SiClBrH2 (21479-75-4) + SiCl2HBr (82146-25-6) + trichlorosilane (10025-78-2) + monosilane (7440-21-3)

Conditions	Yield
In neat (no solvent) condensing of equimolar amts. of tinhydride and SiClHBr2 (trace of SiCl2HBr present) into cold finger, reaction at room temp. (30 min); further products; not isolated; IR spectroscopy;

hydrogenchloride (7647-01-0) + chloroform (67-66-3) + silicon (7440-21-3) → tetrachlorosilane (10026-04-7, 53609-55-5) + trichlorosilane (10025-78-2)

Conditions	Yield
With methylene chloride; cadmium; copper mixing of Cu and Si; drying (300°C, 5 h, dry nitrogen), rising temp. to 350°C, addn. of MeCl (4 h), removal of MeSiCl3 and Me2SiCl2, Cd addn. at room temp., rising temp. to 300°C, CHCl3 and HCl addn., 40 h; product collection, distn., receiver cooled to -20.degree, dist. of remains in flask,;

hydrogenchloride (7647-01-0) + silicon (7440-21-3) → tetrachlorosilane (10026-04-7, 53609-55-5) + trichlorosilane (10025-78-2)

Conditions	Yield
In solid Kinetics; gas-solid react.; temp. 200 - 600°C; not isolated; detn. by DSC, XRD;
In gas Kinetics; (H2) reacted at pressure 9.0E+4 Pa, and at temp. 623, 673, or 723 K, Q=300 sccm and concd. HCl=1.0, 3.3, 10 vol %;
In neat (no solvent) dried HCl is used; glowing heat;; product mixture obtained;;

tetrachlorosilane (10026-04-7, 53609-55-5) + trimethylstannane (1631-73-8) → trichlorosilane (10025-78-2) + trimethyltin(IV)chloride (1066-45-1) + monosilane (7440-21-3) + Dichlorosilane (4109-96-0)

Conditions	Yield
In neat (no solvent) inert atmosphere (N2, Ar or high vac.), room temperature, equimolar amts. of halosilane/tinhydride, reactn. time 36 h; not isolated; IR spectroscopy (identified 25-30% SiCl3H, 15% SiCl2H2 and 10% SiH4 in product mixt.);

trimethylstannane (1631-73-8) + bromo trichloro silane (13465-74-2) → tetrachlorosilane (10026-04-7, 53609-55-5) + trichlorosilane (10025-78-2) + monosilane (7440-21-3)

Conditions	Yield
In neat (no solvent) inert atmosphere (N2, Ar or high vac.), room temperature, equimolar amts. of halosilane/tinhydride, reactn. time 3 h; not isolated; IR spectroscopy (identified 85% SiCl3H, 5% SiH4 and 5% SiCl4 in product mixt.);

trimethylstannane (1631-73-8) + dibromo dichlorosilane (13465-75-3) → SiCl2HBr (82146-25-6) + trichlorosilane (10025-78-2) + trimethyltin bromide (1066-44-0) + monosilane (7440-21-3)

Conditions	Yield
In neat (no solvent) inert atmosphere (N2, Ar or high vac.), room temperature, two equiv. of tinhydride, reactn. time 2 h; not isolated; IR spectroscopy (identified 35-40% SiCl3H, 40% SiH4 and 10% SiCl2HBr in product mixt.);

calcium hydride (7789-78-8) + tetrachlorosilane (10026-04-7, 53609-55-5) → trichlorosilane (10025-78-2) + chlorosilane (13966-57-9) + Dichlorosilane (4109-96-0)

Conditions	Yield
In neat (no solvent) byproducts: H2, HCl; passing SiCl4 vapor over CaH2 below red heat;;	A n/a B 0% C 0%
In neat (no solvent) byproducts: H2, HCl; passing SiCl4 vapor over CaH2 below red heat;;	A n/a B 0% C 0%

nitrogen trichloride (10025-85-1) + monosilane (7440-21-3) → trichlorosilane (10025-78-2) + chlorosilane (13966-57-9)

Conditions	Yield
In gaseous matrix byproducts: HCl, H2; Ar carrier gas, room temp., static vac. glass reactor with quartz window (reaction mixt. made up in reactor); manometric monitoring, chemiluminescence spectroscopy;

tetrachlorosilane (10026-04-7, 53609-55-5) → trichlorosilane (10025-78-2)

Conditions	Yield
With Cu; H2S In neat (no solvent) byproducts: Cu sulfide, H2O; passing H2S through a mixture SiCl4 and Cu powder on boiling;;	0%
With H2 In neat (no solvent) reaction at glowing heat;;
With Zn; HCl In neat (no solvent) byproducts: H2; heating of SiCl4 with Zn powder in a HCl stream up to boiling;;
With hydrogen; silica gel; zinc In water at 450℃; for 48h;
With hydrogen; copper at 750℃; for 1h;

tetrachlorosilane (10026-04-7, 53609-55-5) + monosilane (7440-21-3) → trichlorosilane (10025-78-2) + chlorosilane (13966-57-9) + Dichlorosilane (4109-96-0)

Conditions	Yield
In gas reactor temp.: 250 - 500°C; detn. by gas chromy.;

tetrachlorosilane (10026-04-7, 53609-55-5) + hydrogen sulfide (7783-06-4) → trichlorosilane (10025-78-2)

Conditions	Yield
With Cu In neat (no solvent) byproducts: H2; treatment of the mixture in a liquid air cooled bomb tube;;	0%

hydrogenchloride (7647-01-0) + tetrachlorosilane (10026-04-7, 53609-55-5) → trichlorosilane (10025-78-2)

Conditions	Yield
With Zn In neat (no solvent) byproducts: H2; heating of SiCl4 with Zn and liquid HCl in a sealed tube at 100 °C;;	0%

tetrachlorosilane (10026-04-7, 53609-55-5) + hydrogen (1333-74-0) → hydrogenchloride (7647-01-0) + trichlorosilane (10025-78-2) + silicon (7440-21-3)

Conditions	Yield
byproducts: HCl; equil. reaction, at 1170-1540 K;

tetrachlorosilane (10026-04-7, 53609-55-5) + hydrogen (1333-74-0) → aluminium trichloride (7446-70-0) + trichlorosilane (10025-78-2) + Dichlorosilane (4109-96-0)

Conditions	Yield
With aluminium In neat (no solvent) byproducts: SiCl4; reaction by passing SiCl4 vapor with H2 (1:1) over Al at 400 °C;; distn.;;
With Al In neat (no solvent) byproducts: SiCl4; reaction by passing SiCl4 vapor with H2 (1:1) over Al at 400 °C;; distn.;;

tetrachlorosilane (10026-04-7, 53609-55-5) + hydrogen (1333-74-0) → trichlorosilane (10025-78-2) + Dichlorosilane (4109-96-0)

Conditions	Yield
With co-catalyst: pyrimidine or P(OPh)3; tri-n-butyl-tin hydride In toluene absence of air; H2-stream; further alternate co-catalysts: PCy3 or PBu3 or N-methylimidazole or pyridine or chinoline; gas chromy.;
tri-n-butyl-tin hydride In acetonitrile absence of air; H2-stream; gas chromy.;
With Al or Mg or Zn In neat (no solvent, gas phase) passing SiCl4 vapor and H2 over granulated Al, Mg or Zn at 350-450 °C;; condensation of the gaseous reaction product by dry ice, separation of the mixture by fractionation;;
With Al or Mg or Zn In gas passing SiCl4 vapor and H2 over granulated Al, Mg or Zn at 350-450 °C;; condensation of the gaseous reaction product by dry ice, separation of the mixture by fractionation;;

trichlorosilane (10025-78-2) + 5-((4-dodec-11-en-1-yl)phenyl)-5’-(4-hexylphenyl)-2,2’-bithiophene → trichloro(12-(4-(5’-(4-hexylphenyl)-[2,2’-bithiophen]-5-yl)phenyl)dodecyl)silane

Conditions	Yield
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In toluene at 90℃; Glovebox; Sealed tube;	100%

4-vinylpyridine (100-43-6) + trichlorosilane (10025-78-2) → trichloro(hydrido)bis(4-vinylpyridine)silicon (1154061-81-0)

Conditions	Yield
In toluene at -78 - 20℃;	99.5%

2-octene (111-67-1) + trichlorosilane (10025-78-2) → (n-hep-1-me)SiCl3 (18225-07-5)

Conditions	Yield
In not given HSiCl3 and 2-octene at 50-60°C with peroxide;;	99%

oct-1-ene (111-66-0) + trichlorosilane (10025-78-2) → octyltrichlorosilane (5283-66-9)

Conditions	Yield
In not given HSiCl3 and 1-octene at about 55°C with diacetylperoxide;;	99%
In neat (no solvent) HSiCl3 and 1-octene at 150°C in presence of Cu;;
In neat (no solvent) HSiCl3 and 1-octene at 300°C under pressure;;
In neat (no solvent) HSiCl3 and 1-octene at 300°C under pressure;;

1.2-CH2CHCH2-1.2-C2B10H10 (30620-32-7) + trichlorosilane (10025-78-2) → 1,2-[(CH2)3SiCl3]2-1,2-C2B10H10 (888501-94-8)

Conditions	Yield
With catalyst:Karstedt platinum catalyst (3-3.5percent Pt) In neat (no solvent) (Ar); stirred for 2 h at room temp.; evapd., obtained as oil;	99%

p-phenylpyridine (939-23-1) + trichlorosilane (10025-78-2) → trichloro(hydrido)bis(4-phenylpyridine)silicon (1154061-84-3)

Conditions	Yield
In toluene at -78 - 20℃;	99%

pyridine (110-86-1) + trichlorosilane (10025-78-2) → trichloro(hydrido)bis(pyridine)silicon (17748-48-0, 38685-10-8)

Conditions	Yield
In toluene at -78 - 20℃;	98.8%

C5H10Cl4N2Si (1421683-29-5) + trichlorosilane (10025-78-2) → C5H12Cl2N2Si (1610766-37-4)

Conditions	Yield
In tetrahydrofuran at 20℃; for 12h; Inert atmosphere; Schlenk technique;	98%

dmap (1122-58-3) + trichlorosilane (10025-78-2) → trichlorobis[4-(dimethylamino)pyridine](hydrido)silicon (1154061-83-2)

Conditions	Yield
In tetrahydrofuran at -78 - 20℃;	97.4%

[(1',1'-diallyloxycarbonyl)-1,2-methano]-1,2-dihydro-C60-fullerene (1355962-66-1) + trichlorosilane (10025-78-2) → TSMC (1443224-20-1)

Conditions	Yield
With dicyclopentadienyl platinum dichloride In toluene at 70℃; for 24h; Inert atmosphere; Schlenk technique;	97%

trichlorosilane (10025-78-2) → silicon (7440-21-3)

Conditions	Yield
Stage #1: trichlorosilane under 3.75038 Torr; for 6h; Pulsed microwave radiation (25-50W); Stage #2: With hydrogen at 900℃;	96.7%
With hydrogen chemical vapor deposition (8% SiHCl3 in H2, 1100°C);
With hydrogen chemical vapor deposition (hot-wall reactor, basic pressure 10 or 76 Torr, 1223 K);

picoline (108-89-4) + trichlorosilane (10025-78-2) → trichloro(hydrido)bis(4-methylpyridine)silicon (1154061-79-6)

Conditions	Yield
In toluene at -78 - 20℃;	96.3%

4-tert-butylpyridine (3978-81-2) + trichlorosilane (10025-78-2) → bis(4-tert-butylpyridine)trichloro(hydrido)silicon (1154061-82-1)

Conditions	Yield
In toluene at -78 - 20℃;	96.1%

trichlorosilane (10025-78-2) + phenol (108-95-2) → triphenoxysilane (3898-65-5)

Conditions	Yield
at 50℃; for 4h;	96%

allyl methacrylate (96-05-9) + trichlorosilane (10025-78-2) → 3-(trichlorosilyl)propyl 2-methylprop-2-enoate (7351-61-3)

Conditions	Yield
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex In toluene at 70℃; for 3h;	96%

trichlorosilane (10025-78-2) + hydrogen (1333-74-0) → monosilane (7440-21-3)

Conditions	Yield
With titanium tetrachloride In melt melting NaCl, KCl and AlCl3 at ca. 150°C, heating to ca. 300°C, addn. of TiCl4 and Al under H2 within 2 h, addn. of more Al at 230°C, then addn. of SiHCl3 under H2 with stirring within 1 h; sepn. of the chlorosilane/silane mixture by fractional condensation and rectification;	96%

(carbonyl)(chloro)(hydrido)tris(triphenylphosphine)ruthenium(II) (157072-60-1, 61521-25-3, 166941-05-5, 16971-33-8) + trichlorosilane (10025-78-2) → Ru(SiCl3)Cl(CO)(P(C6H5)3)2

Conditions	Yield
In toluene at 60℃; for 0.333333h; Inert atmosphere; Schlenk technique;	96%

KRYTOX allyl ether KDP-4599 + trichlorosilane (10025-78-2) → KRYTOX 3-trichlorosilylpropyl KDP-4599

Conditions	Yield
dihydrogen hexachloroplatinate at 165℃; for 6h;	95%
dihydrogen hexachloroplatinate at 175℃; for 8h;	95%

decacarbonyldirhenium(0) (14285-68-8) + trichlorosilane (10025-78-2) → Re(CO)5(SiCl3)

Conditions	Yield
In hexane under N2; Re2(CO)10 and the silane in hexane was pressurized with CO (70 atm., autoklave), heated at 200°C for 16 h; cooled, gases were vented, washed with hexane, dried with a stream of N2, sublimation;	95%

trichlorosilane (10025-78-2) + 2,3,4,5,6-pentafluorophenylmagnesium bromide (879-05-0) → tris(pentafluorophenyl)silane (20160-40-1)

Conditions	Yield
In diethyl ether reaction at -12°C (1hour) and heating under reflux for 12 hours;;	95%
In diethyl ether reaction at -12°C (1hour) and heating under reflux for 12 hours;;	95%

dodecacarbonyl-triangulo-triruthenium (15243-33-1) + trichlorosilane (10025-78-2) → cis-Ru(CO)4(SiCl3)2 (36570-60-2)

Conditions	Yield
In hexane byproducts: CO; Irradiation (UV/VIS); in a closed quartz tube filled with CO gas (2 atm) irradiation during 3d with stirring; cooling at -78°C, 2h, drying the crystals in vac., sublimation at 40°C, 0.02 Torr onto a probe cooled to -78°C;	95%

trichlorosilane (10025-78-2) + water (7732-18-5) → hidrogen-silsesquioxane

Conditions	Yield
In water addn. of water to silicon compd. at -78°C with stirring; filtration, washing ppt. with water, drying in vac. at 85°C overnight;	95%
In diethyl ether cooling (ice), stirring (1 d, room temp.); filtn., washing, drying (vac. 1E-3 mbar, 2 d, 80°C);

bis(ethylene)(tricyclohexylphosphine)platinum (57158-83-5) + trichlorosilane (10025-78-2) → [(Pt(μ-H)(SiCl3)[P(C6H11)3])2] * toluene

Conditions	Yield
In toluene N2-atmosphere; condensing of excess silane into soln. of Pt-complex (-196°C), warming to room temp. (pptn.); filtration, washing (hexane), drying (vac.); elem. anal.;	95%

4-Ethylpyridine (536-75-4) + trichlorosilane (10025-78-2) → trichlorobis(4-ethylpyridine)(hydrido)silicon (1154061-80-9)

Conditions	Yield
In toluene at -78 - 20℃;	95%

octadec-1-ene (112-88-9) + trichlorosilane (10025-78-2) → octadecyltrichlorosilane (112-04-9)

Conditions	Yield
In neat (no solvent) HSiCl3 and 1-octadecene at about 300°C under pressure;;	94%
In neat (no solvent) HSiCl3 and octadecene at 300°C under pressure;;	94%
In neat (no solvent) HSiCl3 and 1-octadecene at about 300°C under pressure;;	94%
In neat (no solvent) HSiCl3 and octadecene at 300°C under pressure;;	94%
With SiliaCat Pt(0) - mesoporous organosilica microspheres doped with Pt nanoparticles In neat (no solvent) at 65℃; for 1h;	87 %Spectr.

chloro-carbonyl-hydrido-bis(triphenylphosphine)osmium (129134-01-6) + trichlorosilane (10025-78-2) → OsCl(triphenylphosphine)2(CO)(trichlorosilyl) (129133-98-8)

Conditions	Yield
In toluene N2-atmosphere; addn. of excess HSiCl3 to soln. of Os-complex, stirring for 20 min at 60°C; concn., crystn. on addn. of hexane;	94%

[Os(κ2-dimethyldithiocarbamate)H(CO)(PPh3)2] (56800-92-1) + trichlorosilane (10025-78-2) → [Os(κ2-dimethyldithiocarbamate)(SiCl3)(CO)(PPh3)2] (895138-95-1)

Conditions	Yield
In toluene toluene and HSiCl3 were added to Os complex in Schlenk tube; sealed; cooled in liq. N2; evacuated; warmed to ambient temp.; heated at 100°C for 12 h; cooled; concd. (vac.); hexane added; filtered; recrystd. (CH2Cl2/hexane); elem. anal.;	94%

(η5-cyclopentadienyl)methylbis(methyldiphenylphosphine)ruthenium (114674-46-3) + trichlorosilane (10025-78-2) → Cp(PMePh2)2RuSiCl3 (475635-32-6)

Conditions	Yield
In further solvent(s) byproducts: CH4; (Ar); mixing ruthenium complex with HSiCl3, freezing with liq. N2, swarming to room temp., sealing, heating at 100°C for 16 h, cooling toroom temp.; evapn., dissolving in CH2Cl2, filtration through glass wool, addn. of hexanes, concn., filtration, drying; elem. anal.;	92%

styrene (292638-84-7) + trichlorosilane (10025-78-2) → 1-phenyl-2-(trichlorosilyl)ethane (940-41-0)

Conditions	Yield
Stage #1: trichlorosilane; C17H36N2OPtSi2 for 0.0833333h; Inert atmosphere; Cooling with water bath; Stage #2: styrene at 16℃; for 7h; Product distribution / selectivity; Inert atmosphere;	92%
C17H36N2OPtSi2 In dodecane for 7h; Product distribution / selectivity; Inert atmosphere;

trichlorosilane (10025-78-2) + sodium dioctylphosphinate (67206-59-1) → dioctylphosphinyl chloride (7539-86-8)

Conditions	Yield
In chloroform at 80℃; for 16h;	91.5%

Upstream product

• 10026-04-7 Tetrachlorosilane 
• 7440-21-3 Silicon 

Downstream Products

• 528521-89-3 (S)-(-)-7,7'-BIS[DI(3,5-DIMETHYLPHENYL)PHOSPHINO]-2,2',3,3'-TETRAHYDRO-1,1'-SPIROBIINDANE 
• 528521-86-0 (R)-(+)-7,7'-BIS(DIPHENYLPHOSPHINO)-2,2',3,3'-TETRAHYDRO-1,1'-SPIROBIINDANE 
• 4109-96-0 Dichlorosilane 
• 55739-58-7 (R,R)-DIPAMP 
• 528521-87-1 (R)-(+)-7,7'-BIS[DI(4-METHYLPHENYL)PHOSPHINO]-2,2',3,3'-TETRAHYDRO-1,1'-SPIROBIINDANE 
• 100165-88-6 (S)-(-)-2,2'-BIS(DI-P-TOLYLPHOSPHINO)-1,1'-BINAPHTHYL 
• 99646-28-3 (S)-(-)-2,2'-BIS(DI-P-TOLYLPHOSPHINO)-1,1'-BINAPHTHYL 
• 817176-80-0 (S)-7,7'-Bis[di(p-methylphenyl)phosphino]-1,1'-spirobiindane ,97% 
• 7440-21-3 Silicon 
• 919-30-2 3-Aminopropyltriethoxysilane 
• 2530-85-0 3-Methacryloxypropyltrimethoxysilane 

Recommend Products

• 130710-20-2  2-(Dichlorosilanyl-diphenyl-methyl)-pyridine 
• 3678-70-4  Diphenyl-2-pyridylmethan 
• 100304-95-8  N-<(3-Methoxy-2-thienyl)methylene>-2,6-dimethylaniline 
• 17082-69-8  2-trichlorosilylethylpyridine 
• 100-69-6  2-vinylpyridine 
• 141-57-1  n-propyltrichlorosilane 
• 2550-06-3  3-chloropropyltrichlorosilane 
• 107-05-1  3-chloroprop-1-ene 
• 2621-01-4  NCCHMeSiCl₃ 
• 107-13-1  acrylonitrile 
• 18147-81-4  methyl 3-(trichlorosilyl)propanoate 
• 292638-85-8  acrylic acid methyl ester 
• 67-63-0  isopropyl alcohol 
• 2504-64-5  1,2-bis(trichlorosilyl)ethane