101139-75-7Relevant academic research and scientific papers
Synthesis and absorption properties of some new 4-thio-1,8-naphthylimides and 4-(thio)-7H-benzimidazo [2,1-A] benz [D,E] isoquinolin-7-one derivatives
Beheshtiha,Hekmatshoar,Soltani
, p. 1723 - 1729 (2004)
A series of new 1,8-naphthylimide and 4-(thio)-7H-benzimidazo[2,1-a]benz[d, e]isoquinolin-7-one derivatives has been synthesized, and the UV/Vis absorptioin characteristics discussed. Substituents' effect on the UV/Vis absorption characteristics have been investigated.
SULFONIC DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS
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Paragraph 00190, (2016/04/20)
Novel photoacid generator compounds are provided. Photoresist compositions that include the novel photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
NOVEL SULFONIC ACID DERIVATIVE COMPOUND AND NOVEL NAPHTHALIC ACID DERIVATIVE COMPOUND
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Page/Page column 21, (2012/12/13)
Disclosed are a novel sulfonic acid derivative compound and a novel naphthalic acid derivative compound with high solubility in organic solvents, good photosensitivity, and suitability as a photoacid generator and a polymerization initiator. The sulfonic acid derivative compound is represented by the formula (I) (wherein R01, R04, R05, and R06 represent a hydrogen atom; any one of R02 and R03 represents an alkoxy group having a carbon number of 4 to 18 which may be substituted with an alicyclic hydrocarbon group, a heterocyclic group, or a halogen atom and which may have a branch, or the like; and R07 represents an aliphatic hydrocarbon group having a carbon number of 1 to 18 which may be substituted with a halogen atom and/or an alkylthio group, or the like).
