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10497-05-9 Usage

Chemical Properties

Colorless liquid

Uses

Tris(trimethylsilyl) phosphite (TMSPi) is a film-forming additive for high voltage cathode material in lithium-ion batteries. Tris (trimethylsilyl) phosphate is cleaved by alkali-metal fluorides, nitrates, and acetates at give the trimethylsilyl esters of the corresponding acids.

Definition

ChEBI: Tris(trimethylsilyl) phosphate is an organosilicon compound that is phosphoric acid in which the three hydroxy groups are substituted by (trimethylsilyl)oxy groups. It is a phosphoric acid derivative and an organosilicon compound.

Preparation

Tris(trimethylsilyl)phosphine is prepared by treating trimethylsilyl chloride, white phosphorus, and sodium-potassium alloy: 1/4 P4 + 3 Me3SiCl + 3 K → P(SiMe3)3 + 3 KCl

General Description

Tris(trimethylsilyl) phosphate has been investigated as a novel film-forming additive for LiNi0.5Co0.2Mn0.3O2 cycling at high cut-off potential in LiPF6-based electrolyte. Tris(trimethylsilyl) phosphate [Tris(trimethylsilyl) ester of phosphoric acid] undergoes dealkylsilylation reaction with alumazene to yield heteroadamantane molecule.

Flammability and Explosibility

Notclassified

Check Digit Verification of cas no

The CAS Registry Mumber 10497-05-9 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,0,4,9 and 7 respectively; the second part has 2 digits, 0 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 10497-05:
(7*1)+(6*0)+(5*4)+(4*9)+(3*7)+(2*0)+(1*5)=89
89 % 10 = 9
So 10497-05-9 is a valid CAS Registry Number.
InChI:InChI=1/C9H27O4PSi3/c1-15(2,3)11-14(10,12-16(4,5)6)13-17(7,8)9/h1-9H3

10497-05-9 Well-known Company Product Price

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  • (Code)Product description
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  • TCI America

  • (P1248)  Tris(trimethylsilyl) Phosphate  >98.0%(GC)

  • 10497-05-9

  • 5g

  • 450.00CNY

  • Detail
  • TCI America

  • (P1248)  Tris(trimethylsilyl) Phosphate  >98.0%(GC)

  • 10497-05-9

  • 25g

  • 1,430.00CNY

  • Detail
  • Aldrich

  • (275794)  Tris(trimethylsilyl)phosphate  ≥98%

  • 10497-05-9

  • 275794-5G

  • 484.38CNY

  • Detail

10497-05-9SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 10, 2017

Revision Date: Aug 10, 2017

1.Identification

1.1 GHS Product identifier

Product name Tris(trimethylsilyl) phosphate

1.2 Other means of identification

Product number -
Other names Phosphoric Acid Tris(trimethylsilyl) Ester

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:10497-05-9 SDS

10497-05-9Synthetic route

hexamethyldisilathiane
3385-94-2

hexamethyldisilathiane

A

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

B

O,O,O-tris(trimethylsilyl) phosphorothioate
20152-28-7

O,O,O-tris(trimethylsilyl) phosphorothioate

Conditions
ConditionsYield
With phosphorus pentoxide at 170 - 180℃; for 10h;A 85%
B 98%
potassium dihydrogenphosphate

potassium dihydrogenphosphate

chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
In formamide for 1h; Inert atmosphere; Schlenk technique;98%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

N-trimethylsilyldihydropyrrole

N-trimethylsilyldihydropyrrole

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
Stage #1: Hexamethyldisiloxane With phosphoric acid at 160 - 170℃; under 4500.45 - 6000.6 Torr; for 5h; Autoclave; Reflux;
Stage #2: N-trimethylsilyldihydropyrrole at 100℃; under 760.051 Torr;
96.52%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With potassium dihydrogenphosphate In hexane Reflux;96%
With ammonium dihydrogen phosphate at 78℃; for 3h; Temperature; Reagent/catalyst; Time;89.6%
With phosphoric acid
With phosphoric acid Schlenk technique; Inert atmosphere;
With phosphoric acid Inert atmosphere;
1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

H3PO4

H3PO4

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With saccharin In acetonitrile for 1h; Heating;93%
N-trimethylsilyl-pyrrolidin-2-one
14468-90-7

N-trimethylsilyl-pyrrolidin-2-one

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With lithium dihydrogenphosphate at 20℃; for 1h;86%
tetrakis(trimethylsiloxy)phosphonium iodide
53380-41-9

tetrakis(trimethylsiloxy)phosphonium iodide

A

trimethylsilyl iodide
16029-98-4

trimethylsilyl iodide

B

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
In benzene Heating; during 5 h the solvent was distilled off, the temp. rose to 110 deg C;A n/a
B 85%
C22H50O10P2SSi5
1416767-26-4

C22H50O10P2SSi5

A

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

B

bis(trimethylsilyl) (1,1-dioxido-3Н-2,1-benzoxathiol-3-yl)phosphonate
1416767-27-5

bis(trimethylsilyl) (1,1-dioxido-3Н-2,1-benzoxathiol-3-yl)phosphonate

Conditions
ConditionsYield
at 90 - 110℃; under 1 Torr;A n/a
B 52%
N,O-bis-(trimethylsilyl)-acetamide
10416-59-8

N,O-bis-(trimethylsilyl)-acetamide

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With trichlorophosphate at 120℃; for 1h;26%
tris(trimethylsilyl) phosphite
1795-31-9

tris(trimethylsilyl) phosphite

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With trityl-glycidol at 130 - 150℃;24%
With styrene oxide at 130 - 150℃;
1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

A

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

B

Tetrakis(trimethylsilyl) pyrophosphate
18395-45-4

Tetrakis(trimethylsilyl) pyrophosphate

C

1,1,3,5,7,7-hexakis(trimethylsilyl) pyrophosphate
32284-31-4

1,1,3,5,7,7-hexakis(trimethylsilyl) pyrophosphate

D

1,1,3,5,5-pentakis(trimethylsilyl) pyrophosphate

1,1,3,5,5-pentakis(trimethylsilyl) pyrophosphate

Conditions
ConditionsYield
With phosphorus pentoxide at 100 - 140℃; for 2h; Further byproducts given;A 21%
B 6%
C 3%
D 3%
Methoxytrimethylsilane
1825-61-2

Methoxytrimethylsilane

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With phosphonic Acid; air
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With phosphorus pentoxide
With phosphorus pentoxide durch langsame Destillation;
With phosphorus pentoxide In neat (no solvent) very slow distn. of (CH3)3SiOSi(CH3)3 over P2O5;;
With P4O10 In neat (no solvent) very slow distn. of (CH3)3SiOSi(CH3)3 over P2O5;;
phosphoric acid, bis(trimethylsilyl)monomethyl ester
18291-81-1

phosphoric acid, bis(trimethylsilyl)monomethyl ester

phenylthiotrimethylsilane
4551-15-9

phenylthiotrimethylsilane

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With perhydrodibenzo-18-crown-6; potassium thiophenolate In benzene
phosphoric acid ethyl ester-bis-trimethylsilanyl ester
17882-98-3

phosphoric acid ethyl ester-bis-trimethylsilanyl ester

phenylthiotrimethylsilane
4551-15-9

phenylthiotrimethylsilane

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With perhydrodibenzo-18-crown-6; potassium thiophenolate In benzene
phenylthiotrimethylsilane
4551-15-9

phenylthiotrimethylsilane

Bis-(trimethylsilyl)-n-propyl-phosphat

Bis-(trimethylsilyl)-n-propyl-phosphat

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With perhydrodibenzo-18-crown-6; potassium thiophenolate In benzene
trimethylsilyl acetate
2754-27-0

trimethylsilyl acetate

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With phosphorus(V) oxybromide at 90℃; for 3h;
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

P2O5

P2O5

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
durch langsame Destillation;
1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With ammonium hypophosphite
bis(trimethylsilyl)phosphonite
30148-50-6

bis(trimethylsilyl)phosphonite

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

A

bis(trimethylsilyl) phosphonate
3663-52-3

bis(trimethylsilyl) phosphonate

B

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

C

trimethylsilyl [3-(trimethylsilyl)propyl]phosphinate
1219077-76-5

trimethylsilyl [3-(trimethylsilyl)propyl]phosphinate

D

bis(trimethylsilyl) [3-(trimethylsilyl)propyl]phosphonate
1219077-75-4

bis(trimethylsilyl) [3-(trimethylsilyl)propyl]phosphonate

E

trimethylsilylhypophosphite
38049-93-3

trimethylsilylhypophosphite

Conditions
ConditionsYield
With 2,2'-azobis(isobutyronitrile); water for 7h; Reflux;A n/a
B 0.1 g
C 0.45 g
D 0.12 g
E n/a
tris(trimethylsilyl) phosphite
1795-31-9

tris(trimethylsilyl) phosphite

A

bis(trimethylsilyl) phosphonate
3663-52-3

bis(trimethylsilyl) phosphonate

B

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

C

Tetrakis(trimethylsilyl) pyrophosphate
18395-45-4

Tetrakis(trimethylsilyl) pyrophosphate

D

Trimethylsilyldifluorophosphat
4414-25-9

Trimethylsilyldifluorophosphat

E

bis(trimethylsilyl) phosphorofluoridate
5668-94-0

bis(trimethylsilyl) phosphorofluoridate

Conditions
ConditionsYield
With [1,3]-dioxolan-2-one; lithium hexafluorophosphate; water; Diethyl carbonate In [D3]acetonitrile at 20℃; Glovebox; Inert atmosphere;
tris(trimethylsilyl) phosphite
1795-31-9

tris(trimethylsilyl) phosphite

A

bis(trimethylsilyl) phosphonate
3663-52-3

bis(trimethylsilyl) phosphonate

B

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Conditions
ConditionsYield
With nickel(II) chloride hexahydrate at 160℃; for 42h; Schlenk technique; Inert atmosphere;
trimethylgallium

trimethylgallium

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Me3Ga*OP(OSiMe3)3

Me3Ga*OP(OSiMe3)3

Conditions
ConditionsYield
In hexane N2-atmosphere; addn. of soln. of GaMe3 (10% excess) to phosphate ester soln.; concn., crystd. on cooling (-24°C), collection (filtration), drying (vac.); elem. anal.;95%
Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

trimethylsilyl fluoride
420-56-4

trimethylsilyl fluoride

Conditions
ConditionsYield
With sodium fluoride 150 to 200 deg C;91.5%
Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

(fluoro)bis(cyclopentadienyl)vanadium
942422-03-9

(fluoro)bis(cyclopentadienyl)vanadium

tris(pentafluorophenyl)borate
1109-15-5

tris(pentafluorophenyl)borate

C41H29BF15O4PSiV2

C41H29BF15O4PSiV2

Conditions
ConditionsYield
Stage #1: Tris(trimethylsilyl) phosphate; tris(pentafluorophenyl)borate In dichloromethane at 20℃; for 1h; Inert atmosphere; Glovebox;
Stage #2: (fluoro)bis(cyclopentadienyl)vanadium In dichloromethane at 20℃; for 24h; Inert atmosphere; Glovebox;
90%
Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

trimethylsilylazide
4648-54-8

trimethylsilylazide

Conditions
ConditionsYield
With sodium azide at 150℃; for 0.166667h;87%
Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

A

trimethylsilylazide
4648-54-8

trimethylsilylazide

B

Na3PO4

Na3PO4

Conditions
ConditionsYield
With sodium azide at 150℃; for 0.166667h; other substrates, other reagents;A 87%
B n/a
hexaethyldialuminum

hexaethyldialuminum

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Et3Al*OP(OSiMe3)3

Et3Al*OP(OSiMe3)3

Conditions
ConditionsYield
In hexane N2-atmosphere; addn. of soln. of AlMe3 (10% excess) to phosphate ester soln. at cooling, warming to room temp.; evapn. (vac.); elem. anal.;87%
bis(trimethylsilyl) phosphonate
3663-52-3

bis(trimethylsilyl) phosphonate

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

ethyl N-phenylformimidate
6780-49-0

ethyl N-phenylformimidate

O,O',O'',O'''-tetra(trimethylsilyl) N-anilinomethylenebisphosphonate
1227665-11-3

O,O',O'',O'''-tetra(trimethylsilyl) N-anilinomethylenebisphosphonate

Conditions
ConditionsYield
With zinc(II) chloride at 150 - 160℃; for 1h; Reflux;86%
18-crown-6 ether
17455-13-9

18-crown-6 ether

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

potassium tert-butylate
865-47-4

potassium tert-butylate

C12H24KO6(1+)*C6H18O4PSi2(1-)

C12H24KO6(1+)*C6H18O4PSi2(1-)

Conditions
ConditionsYield
In 1,2-dimethoxyethane for 0.166667h;85%
Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

trimethylsilane adduct of trimethylsilylium tetrakis(pentafluorophenyl)borate
1331770-02-5

trimethylsilane adduct of trimethylsilylium tetrakis(pentafluorophenyl)borate

tetrakis(trimethylsiloxy)phosphonium tetrakis(pentafluorophenyl)borate

tetrakis(trimethylsiloxy)phosphonium tetrakis(pentafluorophenyl)borate

Conditions
ConditionsYield
In toluene for 1h; Sonication;83%
2,2,4,4-tetraethyl-1,3-dichlora(II)-2,4-dialumina(IV)cyclobutane

2,2,4,4-tetraethyl-1,3-dichlora(II)-2,4-dialumina(IV)cyclobutane

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

[Et2Al(μ-O)2P(OSiMe3)2]2

[Et2Al(μ-O)2P(OSiMe3)2]2

Conditions
ConditionsYield
In tetrahydrofuran N2-atmosphere; refluxing for 5 h; elem. anal.;82%
dimethylaluminum chloride dimer

dimethylaluminum chloride dimer

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

[Me2Al(μ-O)2P(OSiMe3)2]2

[Me2Al(μ-O)2P(OSiMe3)2]2

Conditions
ConditionsYield
In tetrahydrofuran N2-atmosphere; refluxing for 5 h; evapn., recrystn. (hexane); elem. anal.;81%
trimethylaluminium dimer

trimethylaluminium dimer

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

Me3Al*OP(OSiMe3)3

Me3Al*OP(OSiMe3)3

Conditions
ConditionsYield
In hexane N2-atmosphere; addn. of soln. of AlMe3 (10% excess) to phosphate ester soln. at cooling, warming to room temp.; concn., crystd. on cooling (-24°C), collection (filtration), drying (vac.); elem. anal.;74%
bis(bis(trimethylsilyl)amido)zinc(II)

bis(bis(trimethylsilyl)amido)zinc(II)

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

[Zn{N(SiMe3)2}2OP(OSiMe3)3]

[Zn{N(SiMe3)2}2OP(OSiMe3)3]

Conditions
ConditionsYield
In toluene at 20℃; Schlenk technique; Inert atmosphere;69%
Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

titanium tetrachloride
7550-45-0

titanium tetrachloride

Ti2Cl7(O2P(OSi(CH3)3)2)(OP(OSi(CH3)3)3)

Ti2Cl7(O2P(OSi(CH3)3)2)(OP(OSi(CH3)3)3)

Conditions
ConditionsYield
In further solvent(s) boiling gently soln. of OP(OSi(CH3)3)3 (0.51 mmol) and TiCl4 (0.50 mmol) in ClSi(CH3)3; allowing to cool;; pptn.;;66%
In benzene-d6 byproducts: ClSi(CH3)3; briefly heating to boiling in benzene-d6;; not isolated, detected by 1H- and 31P-NMR;;
VOCl3*CH3CN

VOCl3*CH3CN

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

(VO)6(O3POSi(CH3)3)8(1+)*Cl(1-)=(VO)6(O3POSi(CH3)3)8Cl

(VO)6(O3POSi(CH3)3)8(1+)*Cl(1-)=(VO)6(O3POSi(CH3)3)8Cl

Conditions
ConditionsYield
In acetonitrile inert atmosphere; crystn. (40-50°C, 4 h, room temp., 2 d); elem. anal.;59%
Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

tert-butylaluminium dichloride
50307-34-1

tert-butylaluminium dichloride

[((t)Bu)Al(μ2-O)3P(OSiMe3)]4

[((t)Bu)Al(μ2-O)3P(OSiMe3)]4

Conditions
ConditionsYield
In tetrahydrofuran dropwise addn. of 1 equiv. P-compd. to Al-compd. (stirring), refluxing for 2 h; vol. reduction (vac.), crystn. (-20°C, overnight); elem. anal.;56%
Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

bis(tert-butyl)aluminium chloride
22086-73-3

bis(tert-butyl)aluminium chloride

[((t)Bu)2Al(μ2-O)2P(OSiMe3)2]2

[((t)Bu)2Al(μ2-O)2P(OSiMe3)2]2

Conditions
ConditionsYield
In tetrahydrofuran dropwise addn. of 1 equiv. P-compd. to Al-compd. (stirring), refluxing for 2 h; vol. reduction (vac.), crystn. (-20°C, overnight); elem. anal.;56%
Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

sodium acetate
127-09-3

sodium acetate

trimethylsilyl acetate
2754-27-0

trimethylsilyl acetate

Conditions
ConditionsYield
150 to 200 deg C;45.5%
Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

(fluoro)bis(cyclopentadienyl)vanadium
942422-03-9

(fluoro)bis(cyclopentadienyl)vanadium

tris(pentafluorophenyl)borate
1109-15-5

tris(pentafluorophenyl)borate

C48H30BF15O4PV3

C48H30BF15O4PV3

Conditions
ConditionsYield
Stage #1: Tris(trimethylsilyl) phosphate; tris(pentafluorophenyl)borate In tetrahydrofuran at 20℃; for 1h; Inert atmosphere; Glovebox;
Stage #2: (fluoro)bis(cyclopentadienyl)vanadium In tetrahydrofuran at 20℃; for 48h; Inert atmosphere; Glovebox;
43.2%
tris[μ-[2,6-bis(1-methylethyl)benzenaminato]]trimethyltricycloaluminum
117960-70-0

tris[μ-[2,6-bis(1-methylethyl)benzenaminato]]trimethyltricycloaluminum

Tris(trimethylsilyl) phosphate
10497-05-9

Tris(trimethylsilyl) phosphate

(MeAl)[2,6-(i-Pr)2C6H3N]3(Al[OP(OSiMe3)3])2(O3POSiMe3)
482315-48-0

(MeAl)[2,6-(i-Pr)2C6H3N]3(Al[OP(OSiMe3)3])2(O3POSiMe3)

Conditions
ConditionsYield
In toluene under N2 atm. OP(OSiMe3)3 was added dropwise to alumazene in toluene andrefluxed for 24 h; react. mixt. was cooled to room temp.; elem. anal.;36%

10497-05-9Relevant articles and documents

-

Sauer, R. O.

, p. 1707 - 1710 (1944)

-

-

Varnavskaya-Samarina,O.A. et al.

, (1978)

-

Synthesis and Characterization of Silylated Phosphonium [P(OSiMe3)4]+ and Phosphate [O2P(OSiMe3)2]- Salts

Felgenhauer, Paul,Labbow, René,Schulz, Axel,Villinger, Alexander

, p. 9348 - 9353 (2018)

Starting from an optimized synthesis of silylated phosphoric acid, OP(OSiMe3)3, a borate salt bearing the [P(OSiMe3)4]+ cation was generated in the reaction of OP(OSiMe3)3 with [Me3Si-H-SiMe3][B(C6F5)4], isolated, and fully characterized. Analogously to the protonated species, phosphoric acid (H3PO4) reaction of OP(OSiMe3)3 with a base led to the formation of the unknown [O2P(OSiMe3)2]- anion, which could be crystallized as potassium salt and structurally characterized, too. Both [P(OSiMe3)4]+ and [O2P(OSiMe3)2]- can be regarded as the formal autoprotolysis products of OP(OSiMe3)3.

Leffler,Teach

, p. 2710 (1960)

Mass spectrometry of tris(trimethylsilyl)phosphate.

Zinbo,Sherman

, p. 2811 - 2813 (1969)

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Method for synthesizing tri(trihydrocarbyl silicon) phosphate

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Paragraph 0043; 0044, (2019/04/04)

The invention discloses a method for synthesizing tri(trihydrocarbyl silicon) phosphate. The method comprises the following steps: putting hexahydrocarbyl disiloxane and phosphoric acid into a reaction kettle, and carrying out a dehydration reaction under conditions of heating, stirring and backflow condensation; further carrying out a distillation reaction on trihydrocarbyl silicon amino, and carrying out vacuum distillation on a reaction liquid after amino is completely evaporated off, thereby obtaining the tri(trihydrocarbyl silicon) phosphate. The method for synthesizing the tri(trihydrocarbyl silicon) phosphate is easy in raw material obtaining and in addition has the characteristics of being high in conversion rate and yield; the method disclosed by the invention is simple in processroute, safe and environemtally friendly, low in consumption and small in waste emission, a tri(trihydrocarbyl silicon) phosphate product obtained from reactions is high in purity, and requirements ofa lithium ion electrolyate additive can be met.

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