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1066-40-6

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1066-40-6 Usage

Chemical Properties

Colorless clear liquid

Uses

Trimethylsilanol used as a hydrophobic coat on silicate surfaces. Used as an as an antimicrobial agent.

Check Digit Verification of cas no

The CAS Registry Mumber 1066-40-6 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,0,6 and 6 respectively; the second part has 2 digits, 4 and 0 respectively.
Calculate Digit Verification of CAS Registry Number 1066-40:
(6*1)+(5*0)+(4*6)+(3*6)+(2*4)+(1*0)=56
56 % 10 = 6
So 1066-40-6 is a valid CAS Registry Number.
InChI:InChI=1/C3H9OSi.Na/c1-5(2,3)4;/h1-3H3;/q-1;+1

1066-40-6 Well-known Company Product Price

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  • Alfa Aesar

  • (H61276)  Trimethylsilanol, 95%   

  • 1066-40-6

  • 5g

  • 596.0CNY

  • Detail
  • Alfa Aesar

  • (H61276)  Trimethylsilanol, 95%   

  • 1066-40-6

  • 25g

  • 1730.0CNY

  • Detail
  • Alfa Aesar

  • (H61276)  Trimethylsilanol, 95%   

  • 1066-40-6

  • 100g

  • 4938.0CNY

  • Detail
  • Aldrich

  • (725986)  Trimethylsilanol  ≥97.5% (GC)

  • 1066-40-6

  • 725986-10ML

  • 1,170.00CNY

  • Detail
  • Aldrich

  • (725986)  Trimethylsilanol  ≥97.5% (GC)

  • 1066-40-6

  • 725986-50ML

  • 2,949.57CNY

  • Detail
  • Aldrich

  • (725986)  Trimethylsilanol  ≥97.5% (GC)

  • 1066-40-6

  • 725986-250ML

  • 6,721.65CNY

  • Detail

1066-40-6SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name Trimethylsilanol

1.2 Other means of identification

Product number -
Other names hydroxy(trimethyl)silane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1066-40-6 SDS

1066-40-6Synthetic route

4-n-butyl-1-trimethylsilylbenzene
81631-74-5

4-n-butyl-1-trimethylsilylbenzene

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

1-butylbenzene
104-51-8

1-butylbenzene

Conditions
ConditionsYield
With Montmorillonite KSF In water at 20℃;A n/a
B 99%
trimethylsilyl-2-hydroxypropane
121386-65-0, 145428-84-8, 145428-85-9

trimethylsilyl-2-hydroxypropane

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

propene
187737-37-7

propene

C

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With hydrogenchloride In methanol at 40℃; Rate constant; var. +>;A n/a
B 98%
C n/a
N-trimethylsilylaniline
3768-55-6

N-trimethylsilylaniline

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

benzenediazonium tetrafluoroborate
369-57-3

benzenediazonium tetrafluoroborate

Conditions
ConditionsYield
With nitrosonium tetrafluoroborate In dichloromethane Ambient temperature;A n/a
B 98%
benzyloxy-trimethylsilane
14642-79-6

benzyloxy-trimethylsilane

Trimethylsilanol
1066-40-6

Trimethylsilanol

Conditions
ConditionsYield
With palladium-platinum; hydrogen; aniline In N,N-dimethyl acetamide at 20℃; for 2h;97%
N-trimethylsilylaniline
3768-55-6

N-trimethylsilylaniline

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

benzene diazonium chloride
100-34-5

benzene diazonium chloride

Conditions
ConditionsYield
With nitrosylchloride In dichloromethane for 0.166667h; Ambient temperature;A n/a
B 96%
N-trimethylsilylaniline
3768-55-6

N-trimethylsilylaniline

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

benzenediazonium bromide
71290-63-6

benzenediazonium bromide

Conditions
ConditionsYield
With nitrosyl bromide In dichloromethane for 0.166667h; Ambient temperature;A n/a
B 94%
N-trimethylsilylaniline
3768-55-6

N-trimethylsilylaniline

nitrosonium trifluoromethanesulfonate
14848-27-2

nitrosonium trifluoromethanesulfonate

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

benzenediazonium trifluoromethanesulfonate
90756-34-6

benzenediazonium trifluoromethanesulfonate

Conditions
ConditionsYield
In dichloromethane Ambient temperature;A n/a
B 93%
0.5C4H10O2*C6H18NSi2(1-)*2Cl(1-)*Pr(3+)

0.5C4H10O2*C6H18NSi2(1-)*2Cl(1-)*Pr(3+)

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

praseodymium(III) hydroxide

praseodymium(III) hydroxide

C

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With water In hexane deaerated water addn. to Pr-compd. soln., soln. decanting from ppt.; GLC, IR spectroscopy;A <1
B 92.3%
C 73.8%
1,1,1,2,2,2-hexamethyldisilane
1450-14-2

1,1,1,2,2,2-hexamethyldisilane

10-methylacridinium perchlorate
26456-05-3

10-methylacridinium perchlorate

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

9,10-dihydro-10-methylacridine
4217-54-3

9,10-dihydro-10-methylacridine

Conditions
ConditionsYield
With water In [D3]acetonitrile; acetonitrile for 4h; Irradiation;A n/a
B 88%
carbon monoxide
201230-82-2

carbon monoxide

1-Phenyl-2-(trimethylsilyl)acetylene
2170-06-1

1-Phenyl-2-(trimethylsilyl)acetylene

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

inden-1-one
83-33-0

inden-1-one

Conditions
ConditionsYield
With water; triethylamine; triphenylphosphine; chloro(1,5-cyclooctadiene)rhodium(I) dimer In tetrahydrofuran at 160℃; under 51485.6 Torr; for 4h; Product distribution; other phosphine ligand, other rhodium complex, other temp., other additives, other solv.;A n/a
B 86%
bis-1,3-trimethylsilyl-2-hydroxypropane
17887-33-1

bis-1,3-trimethylsilyl-2-hydroxypropane

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

propene
187737-37-7

propene

C

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

D

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

Conditions
ConditionsYield
With hydrogenchloride In methanol at 40℃; Rate constant; var. +>;A n/a
B 85%
C n/a
D n/a
4-Nitro-N-(trimethylsilyl)anilin
63911-89-7

4-Nitro-N-(trimethylsilyl)anilin

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

trimethyl(isopentyloxy)silane
18246-56-5

trimethyl(isopentyloxy)silane

C

4-nitrobenzenediazonium chloride
100-05-0

4-nitrobenzenediazonium chloride

Conditions
ConditionsYield
With chloro-trimethyl-silane; isopentyl nitrite In dichloromethane for 10h; Ambient temperature;A n/a
B n/a
C 82%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Trimethylsilanol
1066-40-6

Trimethylsilanol

Conditions
ConditionsYield
With water; ammonium carbonate; sodium chloride In diethyl ether78%
With NaOH In diethyl ether; water fast addn. of (CH3)3SiCl to a 0.25N aq. NaOH-soln. in presence of a large amt. of ether at 0°C;;35%
With 1,4-dioxane; acridine at 25℃; Rate constant;
With ammonia In water; acetone Product distribution; various chloroorganosilanes under different reaction conditions;
With water In diethyl ether
trimethylsilyl fluoride
420-56-4

trimethylsilyl fluoride

Trimethylsilanol
1066-40-6

Trimethylsilanol

Conditions
ConditionsYield
With NaOH In diethyl ether; water addn. of aq. NaOH to a cooled soln. of (CH3)3SiF in ether under vigorous stirring (neutral soln.);; drying of the ether phase; evapn. of ether; distn. of the residue;;70%
With NaOH In diethyl ether; water addn. of aq. NaOH to a cooled soln. of (CH3)3SiF in ether under vigorous stirring (neutral soln.);; drying of the ether phase; evapn. of ether; distn. of the residue;;70%
With sodium hydroxide; diethyl ether
With sodium hydroxide In diethyl ether Yield given;
methyltrimethicone
17928-28-8

methyltrimethicone

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

trimethylsilyl fluoride
420-56-4

trimethylsilyl fluoride

C

methyltrifluorosilane
373-74-0

methyltrifluorosilane

D

1,1-difluorotetramethyldisiloxane
56998-71-1

1,1-difluorotetramethyldisiloxane

E

3-fluoroheptamethyltrisiloxane
24291-15-4

3-fluoroheptamethyltrisiloxane

Conditions
ConditionsYield
With NaHF2 at 190℃; for 0.0333333h; Product distribution;A 0.3%
B 62.9%
C 18.1%
D 1.5%
E 2.5%
diphenyl hydrogen phosphate
838-85-7

diphenyl hydrogen phosphate

1-(Trimethylsilyl)imidazole
18156-74-6

1-(Trimethylsilyl)imidazole

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

diphenyl (1H-imidazol-1-yl)phosphonate
66778-06-1

diphenyl (1H-imidazol-1-yl)phosphonate

Conditions
ConditionsYield
In tetrahydrofuran for 8h; Reflux;A n/a
B 50%
(N-phenyliminovinylidene)triphenylphosphorane
64448-06-2, 21385-80-8

(N-phenyliminovinylidene)triphenylphosphorane

1-(Trimethylsilyl)imidazole
18156-74-6

1-(Trimethylsilyl)imidazole

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

N-[1-(1H-imidazol-1-yl)-2-(triphenylphosphoranylidene)ethylidene]aniline

N-[1-(1H-imidazol-1-yl)-2-(triphenylphosphoranylidene)ethylidene]aniline

Conditions
ConditionsYield
In tetrahydrofuran for 5h; Reflux;A n/a
B 35%
Bestmann ylide
73818-55-0, 15596-07-3

Bestmann ylide

1-(Trimethylsilyl)imidazole
18156-74-6

1-(Trimethylsilyl)imidazole

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

2-triphenyl(α-carboxymethylene)phosphorane imidazolide
73818-41-4

2-triphenyl(α-carboxymethylene)phosphorane imidazolide

Conditions
ConditionsYield
In tetrahydrofuran for 6h; Reflux;A n/a
B 30%
diethyl ether
60-29-7

diethyl ether

bis(trimethylsilyl)sulphate
18306-29-1

bis(trimethylsilyl)sulphate

1-methyl-4-nitrosobenzene
623-11-0

1-methyl-4-nitrosobenzene

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

Trimethylsilanol
1066-40-6

Trimethylsilanol

Conditions
ConditionsYield
With hydrogenchloride
With hydrogenchloride; dibutyl ether
With hydrogenchloride
tetrakis-O-trimethylsilanyl-ξ-D-glucopyranuronic acid

tetrakis-O-trimethylsilanyl-ξ-D-glucopyranuronic acid

Trimethylsilanol
1066-40-6

Trimethylsilanol

Conditions
ConditionsYield
Zersetzung;
(2-picolyl)trimethylsilane
17881-80-0

(2-picolyl)trimethylsilane

N-(4-chlorobenzylidene)aniline
780-21-2

N-(4-chlorobenzylidene)aniline

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

4-chloro-aniline
106-47-8

4-chloro-aniline

C

2-[(E)-2-phenylethenyl]pyridine
538-49-8

2-[(E)-2-phenylethenyl]pyridine

Conditions
ConditionsYield
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction;
(2-picolyl)trimethylsilane
17881-80-0

(2-picolyl)trimethylsilane

(E)-N-(2-pyridylmethylene)aniline
7032-25-9, 40468-86-8, 88785-71-1

(E)-N-(2-pyridylmethylene)aniline

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

aniline
62-53-3

aniline

C

(E)-1,2-bis(2-pyridyl)ethene
13341-40-7

(E)-1,2-bis(2-pyridyl)ethene

Conditions
ConditionsYield
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction;
(2-picolyl)trimethylsilane
17881-80-0

(2-picolyl)trimethylsilane

N-(1-phenylethylidene)aniline
1749-19-5

N-(1-phenylethylidene)aniline

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

(E)-2-(2-phenylprop-1-en-1-yl)pyridine
70525-38-1

(E)-2-(2-phenylprop-1-en-1-yl)pyridine

C

2-(2-phenylprop-1-en-1-yl)pyridine
70525-39-2

2-(2-phenylprop-1-en-1-yl)pyridine

D

aniline
62-53-3

aniline

Conditions
ConditionsYield
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction. Yields of byproduct given;
(2-picolyl)trimethylsilane
17881-80-0

(2-picolyl)trimethylsilane

(E)-N-cinnamylideneaniline
64859-04-7

(E)-N-cinnamylideneaniline

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

1-phenyl-4-(2-pyridyl)-1,3-butadiene
1466-20-2, 4625-23-4, 5519-95-9, 17105-02-1

1-phenyl-4-(2-pyridyl)-1,3-butadiene

C

aniline
62-53-3

aniline

Conditions
ConditionsYield
With ammonium chloride; lithium diisopropyl amide 1.) THJF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction;
(2-picolyl)trimethylsilane
17881-80-0

(2-picolyl)trimethylsilane

N-Benzylidenemethylamine
622-29-7

N-Benzylidenemethylamine

A

(Z)-2-(2-phenylethenyl)pyridine
538-49-8, 714-08-9, 1519-59-1

(Z)-2-(2-phenylethenyl)pyridine

B

Trimethylsilanol
1066-40-6

Trimethylsilanol

C

methylamine
74-89-5

methylamine

D

2-[(E)-2-phenylethenyl]pyridine
538-49-8

2-[(E)-2-phenylethenyl]pyridine

Conditions
ConditionsYield
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction. Yields of byproduct given;
(2-picolyl)trimethylsilane
17881-80-0

(2-picolyl)trimethylsilane

A

(Z)-2-(2-phenylethenyl)pyridine
538-49-8, 714-08-9, 1519-59-1

(Z)-2-(2-phenylethenyl)pyridine

B

Trimethylsilanol
1066-40-6

Trimethylsilanol

C

aniline
62-53-3

aniline

D

2-[(E)-2-phenylethenyl]pyridine
538-49-8

2-[(E)-2-phenylethenyl]pyridine

Conditions
ConditionsYield
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction. Yields of byproduct given;
(2-picolyl)trimethylsilane
17881-80-0

(2-picolyl)trimethylsilane

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

aniline
62-53-3

aniline

C

2-[(E)-2-phenylethenyl]pyridine
538-49-8

2-[(E)-2-phenylethenyl]pyridine

Conditions
ConditionsYield
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction;
(2-picolyl)trimethylsilane
17881-80-0

(2-picolyl)trimethylsilane

(E)-N-benzylidene-2-methylpropan-2-amine
6852-58-0

(E)-N-benzylidene-2-methylpropan-2-amine

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

tert-butylamine
75-64-9

tert-butylamine

C

2-[(E)-2-phenylethenyl]pyridine
538-49-8

2-[(E)-2-phenylethenyl]pyridine

Conditions
ConditionsYield
With ammonium chloride; lithium diisopropyl amide 1.) THF, -75 deg C 2.) -75 deg C, 1 h and room temp. 2 h; Yield given. Multistep reaction;
1-styrenyloxytrimethylsilane
13735-81-4

1-styrenyloxytrimethylsilane

A

Trimethylsilanol
1066-40-6

Trimethylsilanol

B

acetophenone
98-86-2

acetophenone

Conditions
ConditionsYield
With sodium hydroxide; formic acid; water; sodium chloride In acetonitrile at 25℃; Rate constant; Mechanism;
Trimethylsilanol
1066-40-6

Trimethylsilanol

trimethylsilylazide
4648-54-8

trimethylsilylazide

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

Conditions
ConditionsYield
With C31H26F6N4O2 In Hexafluorobenzene for 3h;100%
Trimethylsilanol
1066-40-6

Trimethylsilanol

phenylsilane
694-53-1

phenylsilane

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane
27991-58-8

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane

Conditions
ConditionsYield
With C40H36FeN2P2 In tetrahydrofuran at 20℃; for 12h; Reagent/catalyst; Solvent;99%
With [FeCl2(2,9-bis((diphenylphosphino)methyl)-1,10-phenanthroline)]; sodium triethylborohydride In tetrahydrofuran at 20℃; for 12h; Catalytic behavior; Inert atmosphere; Schlenk technique; Glovebox;> 99 %Spectr.
Trimethylsilanol
1066-40-6

Trimethylsilanol

iron(II) bis(trimethylsilyl)amide
14760-22-6

iron(II) bis(trimethylsilyl)amide

iron(II) trimethylsiloxide

iron(II) trimethylsiloxide

Conditions
ConditionsYield
In hexane byproducts: (Me3Si)2NH; (Ar); addn. of soln. of Me3SiOH (2 equiv.) in hexane to soln. of ((Me3Si)2N)2Fe (1 equiv.) in hexane; pptn., filtration, washing with hexane, removal of solvent in vac. at 50°C, elem. anal.;98%
Trimethylsilanol
1066-40-6

Trimethylsilanol

2-phenylheptamethyltrisilane
780-55-2

2-phenylheptamethyltrisilane

A

1,1,1,3-tetramethyl-3-phenyldisiloxane
69552-69-8

1,1,1,3-tetramethyl-3-phenyldisiloxane

B

3-phenyl-1,1,1,3,5,5,5-heptamethyltrisiloxane
546-44-1

3-phenyl-1,1,1,3,5,5,5-heptamethyltrisiloxane

Conditions
ConditionsYield
Mechanism; Irradiation; other silanes;A 96%
B 4%
Trimethylsilanol
1066-40-6

Trimethylsilanol

[1-(2-aminoethyl)-3-aminopropyl]trimethoxysilane
1760-24-3

[1-(2-aminoethyl)-3-aminopropyl]trimethoxysilane

1-[3-N-(2-aminoethyl)aminopropyl]-1,1-dimethoxy-3,3,3-trimethyldisiloxane
199327-09-8

1-[3-N-(2-aminoethyl)aminopropyl]-1,1-dimethoxy-3,3,3-trimethyldisiloxane

Conditions
ConditionsYield
at 20℃;95.5%
Trimethylsilanol
1066-40-6

Trimethylsilanol

di[methyl(methoxo)(trimethylphosphine)nickel]

di[methyl(methoxo)(trimethylphosphine)nickel]

(CH3Ni(P(CH3)3)OSi(CH3)3)2

(CH3Ni(P(CH3)3)OSi(CH3)3)2

Conditions
ConditionsYield
In pentane95%
Trimethylsilanol
1066-40-6

Trimethylsilanol

1,5-diacetoxy-3,3,7,7,10,10-hexaphenylbicyclo[3.3.3]-1,3,5,7,9-pentasiloxane

1,5-diacetoxy-3,3,7,7,10,10-hexaphenylbicyclo[3.3.3]-1,3,5,7,9-pentasiloxane

C42H48O8Si7

C42H48O8Si7

Conditions
ConditionsYield
With pyridine In toluene at 25℃; for 24h;95%
Trimethylsilanol
1066-40-6

Trimethylsilanol

diphenylsilane
775-12-2

diphenylsilane

1,1,1-trimethyl-3,3-diphenyldisiloxane

1,1,1-trimethyl-3,3-diphenyldisiloxane

Conditions
ConditionsYield
With chlorobis(cyclooctene)-iridium(I) dimer In toluene at 20℃; for 3h; Inert atmosphere;94%
With [FeCl2(2,9-bis((diphenylphosphino)methyl)-1,10-phenanthroline)]; sodium triethylborohydride In tetrahydrofuran at 20℃; for 12h; Catalytic behavior; Inert atmosphere; Schlenk technique; Glovebox;77 %Spectr.
Trimethylsilanol
1066-40-6

Trimethylsilanol

tris{η3-(3-tert-butylpyrazolyl)hydroborato}ZnH

tris{η3-(3-tert-butylpyrazolyl)hydroborato}ZnH

tris{η3-(3-tert-butylpyrazolyl)hydroborato}Zn(OSiMe3)

tris{η3-(3-tert-butylpyrazolyl)hydroborato}Zn(OSiMe3)

Conditions
ConditionsYield
In benzene 70°C (3 d); evapn. (reduced pressure); elem. anal.;93%
Trimethylsilanol
1066-40-6

Trimethylsilanol

dimethoxymethylstibane
54553-25-2

dimethoxymethylstibane

methyl-bis(trimethylsiloxy)stibane
169828-78-8

methyl-bis(trimethylsiloxy)stibane

Conditions
ConditionsYield
In dichloromethane byproducts: MeOH; Ar; org. compd. soln. addn. dropwise to Sb-compd. soln. at room temp., stirring for 30 min, solvent vac. removal; elem. anal.;93%
Trimethylsilanol
1066-40-6

Trimethylsilanol

(HB(C3H(CH3)(C(CH3)3)N2)3)ZnH
220342-04-1

(HB(C3H(CH3)(C(CH3)3)N2)3)ZnH

C27H49BN6OSiZn

C27H49BN6OSiZn

Conditions
ConditionsYield
In benzene at 60℃; for 72h; Inert atmosphere; Schlenk technique; Glovebox;93%
Trimethylsilanol
1066-40-6

Trimethylsilanol

2-methyl a l l y l t r i s-(trimethylsiloxy)silane
37611-52-2

2-methyl a l l y l t r i s-(trimethylsiloxy)silane

1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane
3555-47-3

1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)trisiloxane

Conditions
ConditionsYield
With Amberlyst-15 In acetonitrile at 20℃; for 1h; Solvent; chemoselective reaction;93%
Trimethylsilanol
1066-40-6

Trimethylsilanol

[1-(2-aminoethyl)-3-aminopropyl]trimethoxysilane
1760-24-3

[1-(2-aminoethyl)-3-aminopropyl]trimethoxysilane

3-[3-N-(2-aminoethyl)aminopropyl]-3-methoxy-1,1,1,5,5,5-hexamethyltrisiloxane

3-[3-N-(2-aminoethyl)aminopropyl]-3-methoxy-1,1,1,5,5,5-hexamethyltrisiloxane

Conditions
ConditionsYield
Heating;92.5%
Trimethylsilanol
1066-40-6

Trimethylsilanol

tris(bis(trimethylsilyl)amido)praseodymium(III)

tris(bis(trimethylsilyl)amido)praseodymium(III)

A

tris(trimethylsiloxy)praseodymium

tris(trimethylsiloxy)praseodymium

B

1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

Conditions
ConditionsYield
In toluene Addn. of trimethylsilanol soln. to soln. of Pr-complex, heating at 90°c for 1.5-2 h.; Evapn. in vac., addn. of hexane, crystn. at -30 to -50°C, elem. anal.;A 84.6%
B 90.3%
Trimethylsilanol
1066-40-6

Trimethylsilanol

[(CH3COCHCOCH3)2Al(μ-OCH(CH3)2)2Al(OCH(CH3)2)2]

[(CH3COCHCOCH3)2Al(μ-OCH(CH3)2)2Al(OCH(CH3)2)2]

(Al(OSi(CH3)3)2(CH3COCHCOCH3))2

(Al(OSi(CH3)3)2(CH3COCHCOCH3))2

Conditions
ConditionsYield
In pentane Me3SiOH was added rapidly under an inert atmosphere to a pentane soln. of (Al(O-i-Pr)2(acac))2; volatiles were removed, residue was recrystd. from pentane; elem. anal.;90%
Trimethylsilanol
1066-40-6

Trimethylsilanol

(Al(OCH(CH3)2)2(CH3COCHCOOCH2CH3))2

(Al(OCH(CH3)2)2(CH3COCHCOOCH2CH3))2

(Al(OSi(CH3)3)2(CH3COCHCOOCH2CH3))2

(Al(OSi(CH3)3)2(CH3COCHCOOCH2CH3))2

Conditions
ConditionsYield
In pentane Me3SiOH was added rapidly under an inert atmosphere to a pentane soln. of (Al(O-i-Pr)2(etac))2; volatiles were removed, residue was vac. distilled (130°C, >0.1 mm Hg); several isomers are observed in the NMR spectra; elem. anal.;90%
Trimethylsilanol
1066-40-6

Trimethylsilanol

bis(cyclopentadienyl)tin(II)
26078-96-6

bis(cyclopentadienyl)tin(II)

bis[bis(trimethylsilanolato)tin]

bis[bis(trimethylsilanolato)tin]

Conditions
ConditionsYield
In toluene byproducts: cyclopentadiene; (under exclusion of air and moisture) to a soln. of (C5H5)2Sn in toluene is added Me3SiOH, soln. is warmed (2 h); soln. is evapd. under vac., elem. anal.;90%
In not given
Trimethylsilanol
1066-40-6

Trimethylsilanol

[tris(6-tert-butyl-3-thiopyridazinyl)methanide]Zn(N{SiMe3}2)

[tris(6-tert-butyl-3-thiopyridazinyl)methanide]Zn(N{SiMe3}2)

[tris(6-tert-butyl-3-thiopyridazinyl)methanide]Zn(OSiMe3)

[tris(6-tert-butyl-3-thiopyridazinyl)methanide]Zn(OSiMe3)

Conditions
ConditionsYield
In toluene at -40 - 25℃; for 16h; Schlenk technique;90%
Trimethylsilanol
1066-40-6

Trimethylsilanol

trifluoromethylsulfonic anhydride
358-23-6

trifluoromethylsulfonic anhydride

trimethylsilyl trifluoromethanesulfonate
27607-77-8

trimethylsilyl trifluoromethanesulfonate

Conditions
ConditionsYield
Stage #1: Trimethylsilanol; trifluoromethylsulfonic anhydride at 45℃; for 3.5h;
Stage #2: With chloro-trimethyl-silane at 15℃; for 2.5h; Temperature;
89%
Trimethylsilanol
1066-40-6

Trimethylsilanol

phenylsilane
694-53-1

phenylsilane

A

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane
27991-58-8

1,1,1,5,5,5-hexamethyl-3-phenyl-trisiloxane

B

C9H16OSi2

C9H16OSi2

Conditions
ConditionsYield
With [FeCl2(2,9-bis((diphenylphosphino)methyl)-1,10-phenanthroline)]; sodium triethylborohydride In tetrahydrofuran at 20℃; for 12h; Reagent/catalyst; Solvent;A 88.9%
B 8.1%
With nickel(II) bis(2,2,6,6-tetramethylheptane-3,5-dionate) In dichloromethane at 20℃; for 6.5h; Schlenk technique; Inert atmosphere;A 25%
B 50%
With [FeBr2(2,9-bis((dicyclohexylphosphino)methyl)-1,10-phenanthroline)]; sodium triethylborohydride In tetrahydrofuran at 20℃; for 12h; Catalytic behavior; Reagent/catalyst; Inert atmosphere; Schlenk technique; Glovebox;A 20 %Spectr.
B 28 %Spectr.
Trimethylsilanol
1066-40-6

Trimethylsilanol

3-(trimethoxysilyl)propan-1-amine
13822-56-5

3-(trimethoxysilyl)propan-1-amine

1,1,1-trimethyl-3,3-dimethoxy-3-(3-aminopropyl)disiloxane
393510-67-3

1,1,1-trimethyl-3,3-dimethoxy-3-(3-aminopropyl)disiloxane

Conditions
ConditionsYield
at 20℃; for 3h;88.8%
Trimethylsilanol
1066-40-6

Trimethylsilanol

3-aminopropyltriethoxysilane
919-30-2

3-aminopropyltriethoxysilane

(3-aminopropyl)tris(trimethylsiloxy)silane
25357-81-7

(3-aminopropyl)tris(trimethylsiloxy)silane

Conditions
ConditionsYield
Heating;88%

1066-40-6Relevant articles and documents

High-speed living polymerization of polar vinyl monomers by self-healing silylium catalysts

Zhang, Yuetao,Lay, Frank,Garcia-Garcia, Pilar,List, Benjamin,Chen, Eugene Y.-X.

, p. 10462 - 10473 (2010)

This contribution describes the development and demonstration of the ambient-temperature, high-speed living polymerization of polar vinyl monomers (M) with a low silylium catalyst loading (≤ 0.05 mol % relative to M). The catalyst is generated in situ by protonation of a trialkylsilyl ketene acetal (RSKA) initiator (I) with a strong Bryonsted acid. The living character of the polymerization system has been demonstrated by several key lines of evidence, including the observed linear growth of the chain length as a function of monomer conversion at a given [M]/[I] ratio, near-precise polymer number-average molecular weight (Mn, controlled by the [M]/[I] ratio) with narrow molecular weight distributions (MWD), absence of an induction period and chain-termination reactions (as revealed by kinetics), readily achievable chain extension, and the successful synthesis of well-defined block copolymers. Fundamental steps of activation, initiation, propagation, and catalyst self-repair involved in this living polymerization system have been elucidated, chiefly featuring a propagation catalysis cycle consisting of a rate-limiting C-C bond formation step and fast release of the silylium catalyst to the incoming monomer. Effects of acid activator, catalyst and monomer structure, and reaction temperature on polymerization characteristics have also been examined. Among the three strong acids incorporating a weakly coordinating borate or a chiral disulfonimide anion, the oxonium acid [H(Et2O)2] + [B(C 6F5)4]- is the most effective activator, which spontaneously delivers the most active R3Si +, reaching a high catalyst turn-over frequency (TOF) of 6.0 x 103 h-1 for methyl methacrylate polymerization by Me 3Si+ or an exceptionally high TOF of 2.4 x 105 h-1 for n-butyl acrylate polymerization by iBu3Si +, in addition to its high (>90%) to quantitative efficiencies and a high degree of control over Mn, and MWD (1.07-1.12). An intriguing catalyst self-repair feature has also been demonstrated for the current living polymerization system.

-

Sommer,Pietrusza,Whitmore

, p. 2282 Anm.10 (1946)

-

CONDENSATION REACTIONS OF α-AMINO-ZINCENAMINES WITH ALDEHYDES; APPLICATION TO INDOLIZINES

Wissing, Elmo,Havenith, Remco W. A.,Boersma, Jaap,Koten, Gerard van

, p. 7933 - 7936 (1992)

The zinc-enamine 1 is easy accessible via the reaction of Et2Zn with t-BuN=CHCH=Nt-Bu and is reactive towards aldehydes.The condensation reaction of 1 with 2-pyridine-carboxaldehyde results in the thermally instable zinc-aldolate 2b that subsequently rearranges to the indolizine 4.

Reaction of O(3P) with Trimethylsilane

Hoffmeyer, H.,Horie, O.,Potzinger, P.,Reimann, B.

, p. 2901 - 2905 (1985)

The title reaction has been investigated at room temperature in a discharge flow system as well as by stationary Hg(3P1) sensitized N2O photolysis experiments.O(3P) atoms abstract hydrogen from the silicon center with a rate constant of k(1) = (2.6 +/= 0.3)E-12 cm3s-1.Hydroxyl radicals formed in the primary step react in a second abstraction reaction to yield H2O with a rate constant larger than k(1) by a factor of about 20.The fate of trimethylsilyl radical, the other primary product, depends on the experimental conditions.In the flow system they combine with O and OH; the combination products decompose unimolecularly, yielding CH3 and CH4, respectively, and the common product (CH3)2SiO.In stationary photolyses they mainly abstract O from N2O to ultimately form (CH3)3SiOSi(CH3)3.In a separate static experiment a ratio of k(14)/k1/2(7) = 2.5E-12 cm3/2s-1/2 has been determined for oxygen abstraction of trimethylsilyl radicals from N2O vs. combination of two trimethylsilyl radicals.The rate constant of N(4S) with trimethylsilane has been measured in the flow system to be k(2) = (2.6 +/= 0.8)E-14 cm3s-1.

Enzyme mediated silicon-oxygen bond formation; The use of Rhizopus oryzae lipase, lysozyme and phytase under mild conditions

Abbate, Vincenzo,Bassindale, Alan R.,Brandstadt, Kurt F.,Lawson, Rachel,Taylor, Peter G.

, p. 9361 - 9368 (2010)

The potential for expanding the variety of enzymic methods for siloxane bond formation is explored. Three enzymes, Rhizopus oryzae lipase (ROL), lysozyme and phytase are reported to catalyse the condensation of the model compound, trimethylsilanol, formed in situ from trimethylethoxysilane, to produce hexamethyldisiloxane in aqueous media at 25 °C and pH 7. Thermal denaturation and reactant inhibition experiments were conducted to better understand the catalytic role of these enzyme candidates. It was found that enzyme activities were significantly reduced following thermal treatment, suggesting a potential key-role of the enzyme active sites in the catalysis. Similarly, residue-specific modification of the key-amino acids believed to participate in the ROL catalysis also had a significant effect on the silicon bio-catalysis, indicating that the catalytic triad of the lipase may be involved during the enzyme-mediated formation of the silicon-oxygen bond. E. coli phytase was found to be particularly effective at catalysing the condensation of trimethylsilanol in a predominantly organic medium consisting of 95% acetonitrile and 5% water. Whereas the use of enzymes in silicon chemistry is still very much a developing and frontier activity, the results presented herein give some grounds for optimism that the variety of enzyme mediated reactions will continue to increase and may one day become a routine element in the portfolio of the synthetic silicon chemist. The Royal Society of Chemistry.

A Quantitative Scale for the Structural Effect on Reactivity toward Nucleophilic Displacement at Silicon

Shimizu, Nobujiro,Takesue, Naohide,Yamamoto, Akiko,Tsutsumi, Toru,Yasuhara, Sigefumi,Tsuno, Yuho

, p. 1263 - 1266 (1992)

The rates of solvolysis for forty different triorganochlorosilanes have been measured in 89 molpercent aqueous dioxane at 25 deg C; the logarithmic rates relative to that for trimethylchlorosilane, log krel = log 1R2R3SiCl)/k(Me3SiCl)>, provide a quantitative scale for the structural effect of various silyl groups on the reactivity toward nucleophilic displacement at silicon, ranging from 1.99 for HSiMe2 to -6.89 for t-BuSiPh2 groups.

Synthesis of methyl(1-aminophosphonate)siloxane oligomers

Khairova,Milenin,Cherkaev,Stoikov,Muzafarov

, p. 1285 - 1288 (2016)

A synthesis of 1-aminophosphonate derivative of methylsiloxane oligomer was developed. A methodology of the introduction of 1-aminophosphonate fragment not only into the stable siloxane structures, but also into hydrolytically unstable alkoxyfunctional organosilicon compounds was suggested.

Eisch,Husk

, p. 254 (1964)

Spontaneous reduction and dispersion of graphene nano-platelets with in situ synthesized hydrazine assisted by hexamethyldisilazane

Han, Joong Tark,Jang, Jeong In,Jeong, Bo Hwa,Kim, Beom Joon,Jeong, Seung Yol,Jeong, Hee Jin,Cho, Jeong Ho,Lee, Geon-Woong

, p. 20477 - 20481 (2012)

The environmentally friendly reduction and a solution processability of chemically modified graphene nanosheets are most important for their applications. Here we report for the first time that in situ synthesis of hydrazine and spontaneous reduction of g

The low temperature crystal structure of trimethylsilanol

Minkwitz, Rolf,Schneider, Stefan

, p. 426 - 429 (1998)

A preparation of trimethylsilanol by hydrolysis of bis(trimethylsilyl)carbonate in diethylether at -20 °C is reported. At -80 °C, the crystals are monoclinic, space group P21/c, Z = 12 with cell dimensions a = 996.0(2) pm, b = 1730.2(3) pm, c = 1122.9(2) pm, β = 96,61(3)°. There are three independent Me3SiOH units with a slightly distorted tetrahedral C3SiO core structure.

Dihydrotrimethylsiloxyaluminum

Roberts, Charles B.,Toner, Darell D.

, p. 2361 - 2362 (1970)

-

Disproportionation of oligodimethylsiloxanols in the presence of a protic acid in dioxane

Cypryk, M.,Rubinsztajn, S.,Chojnowski, J.

, p. 91 - 97 (1993)

The kinetics of the acid-catalyzed disproportionation of α,ω-dihydroxyoligodimethylsiloxanes HOnH, n = 2, 5, and their analogues having one hydroxyl function replaced by methyl MenH, n = 2, 5, were studied in dioxane in the presence of water.The formation of the primary disproportionation products was monitored by gas-liquid chromatography.The reaction in dioxane solution can compete with the condensation process only in the presence of water.It is of first order with respect to the substrate, catalyst, and water.The results are interpreted in terms of a stepwise mechanism involving rate determining cleavage of the terminal siloxane unit by water, followed by condensation of transiently-formed dimethylsilanediol with the substrate.The unzipping mechansim involving the dimethylsilanediol intermediate is suggested to operate in hydrolytic cleavage of polydimethylsiloxane exposed to water or water vapour.

Atmospheric degradation of volatile methyl-silicon compounds

Tuazon, Ernesto C.,Aschmann, Sara M.,Atkinson, Roger

, p. 1970 - 1976 (2000)

The current widespread use of poly(dimethylsiloxane)s (PDMS) in a broad range of applications leads to their release into soil environments where they degrade to monomeric products, primarily dimethylsilanediol, most of which enter the atmosphere by volatilization. The major degradation pathway of volatile organosilicon compounds in the atmosphere is expected to be a reaction with hydroxyl (OH) radicals. In this work, the kinetics of the gas- phase reactions of dimethylsilanediol, trimethylsilanol, and tetramethylsilane with the OH radical were measured using a relative rate method which employed the N2H4 + O3 reaction as a nonphotolytic source of OH radicals, with analysis by Fourier transform infrared (FT-IR) spectroscopy in a 5870 L chamber. The measured values of the OH radical reaction rate constants (cm3 molecule-1 s-1) at 298 ± 2 K are as follows: dimethylsilanediol, (8.1 ± 1.0) x 10-13; trimethylsilanol, (7.2 ± 0.8) x 10-13; and tetramethylsilane, (8.5 ± 0.9) x 10-13. These values lead to an estimate of tropospheric lifetimes with respect to reaction with the OH radical of ca. 15 days for these organosilicon compounds. FT-IR spectroscopy and atmospheric pressure ionization mass spectrometry (API-MS) were employed to analyze the products of OH radical- and Cl atom-initiated photooxidations of dimethylsilanediol and trimethylsilanol. Infrared signatures of the probable formate ester intermediate products from both silanols were detected. API-MS analyses indicated the formation of methylsilanetriol from dimethylsilanediol, of both dimethylsilanediol and methylsilanetriol from trimethylsilanol, and of the corresponding intermediate formate esters. Possible reaction mechanisms are discussed. The current widespread use of poly(dimethylsiloxane)s (PDMS) in a broad range of applications leads to their release into soil environments where they degrade to monomeric products, primarily dimethylsilanediol, most of which enter the atmosphere by volatilization. The major degradation pathway of volatile organosilicon compounds in the atmosphere is expected to be a reaction with hydroxyl (OH) radicals. In this work, the kinetics of the gas-phase reactions of dimethylsilanediol, trimethylsilanol, and tetramethylsilane with the OH radical were measured using a relative rate method which employed the N2H4 + O3 reaction as a nonphotolytic source of OH radicals, with analysis by Fourier transform infrared (FT-IR) spectroscopy in a 5870 L chamber. The measured values of the OH radical reaction rate constants (cm3 molecule-1 s-1) at 298 ± 2 K are as follows: dimethylsilanediol, (8.1 ± 1.0) × 10-13; trimethylsilanol, (7.2 ± 0.8) × 1013; and tetramethylsilane, (8.5 ± 0.9) × 10-13. These values lead to an estimate of tropospheric lifetimes with respect to reaction with the OH radical of ca. 15 days for these organosilicon compounds. FT-IR spectroscopy and atmospheric pressure ionization mass spectrometry (API-MS) were employed to analyze the products of OH radical- and Cl atom-initiated photooxidations of dimethylsilanediol and trimethylsilanol. Infrared signatures of the probable formate ester intermediate products from both silanols were detected. API-MS analyses indicated the formation of methylsilanetriol from dimethylsilanediol, of both dimethylsilanediol and methylsilanetriol from trimethylsilanol, and of the corresponding intermediate formate esters. Possible reaction mechanisms are discussed.

Proton-Coupled Electron Transfer Enables Tandem Radical Relay for Asymmetric Copper-Catalyzed Phosphinoylcyanation of Styrenes

Zhang, Guoyu,Fu, Liang,Chen, Pinhong,Zou, Jianping,Liu, Guosheng

, p. 5015 - 5020 (2019)

A tandem radical relay strategy was realized for the first Cu(I)-catalyzed enantioselective phosphinocyanation of styrenes. In this reaction, tBuOOSiMe3 generated in situ from tBuOOH serves as a radical initiator to trigger t-butoxy radical production upon oxidization of L?Cu(I) species via proton-coupled-electron transfer (PCET) pathway, which leads to sequential phosphinoyl radical and benzyl radical formations. The resultant β-cyanodiarylphosphine oxides could be easily converted to a series of chiral ?-amino phosphine ligands.

Influence of macroscopic factors on the composition of the products of cohydrolysis of triorganochlorosilanes

Ivanov,Mlakhovskaya,Chernyshev,Kostikova,Mozzhukhin,Buzyreva

, p. 719 - 725 (1997)

The composition of the products of heterogeneous cohydrolysis of trimethyl- and dimethylphenylchlorosilanes by excess aqueous ammonia (4-5% solution) is determined by the regime of heterofunctional condensation of the initial chlorosilanes with the products of their hydrolysis, triorganosilanols. In a diffusion regime, hexaorganodisiloxanes are formed because of the limited possibility of removing silanols from the reaction zone, while silanols are predominantly formed in a kinetic regime. The influence of the nature of the solvent and surfactant and the intensity of stirring of the reaction mixture on the composition of the final products of hydrolytic cocondensation of triorganochlorosilanes is considered.

Direct growth of crystalline triazine-based graphdiyne using surface-assisted deprotection-polymerisation

Amsalem, Patrick,Bojdys, Michael J.,Burmeister, David,Huang, Jieyang,Kass, Dustin,Koch, Norbert,Kulkarni, Ranjit,Müller, Johannes,Martin, Andréa,Trunk, Matthias

, p. 12661 - 12666 (2021/10/19)

Graphdiyne polymers have interesting electronic properties due to their π-conjugated structure and modular composition. Most of the known synthetic pathways for graphdiyne polymers yield amorphous solids because the irreversible formation of carbon-carbon bonds proceeds under kinetic control and because of defects introduced by the inherent chemical lability of terminal alkyne bonds in the monomers. Here, we present a one-pot surface-assisted deprotection/polymerisation protocol for the synthesis of crystalline graphdiynes over a copper surface starting with stable trimethylsilylated alkyne monomers. In comparison to conventional polymerisation protocols, our method yields large-area crystalline thin graphdiyne films and, at the same time, minimises detrimental effects on the monomers like oxidation or cyclotrimerisation side reactions typically associated with terminal alkynes. A detailed study of the reaction mechanism reveals that the deprotection and polymerisation of the monomer is promoted by Cu(ii) oxide/hydroxide species on the as-received copper surface. These findings pave the way for the scalable synthesis of crystalline graphdiyne-based materials as cohesive thin films.

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