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1092693-68-9

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1092693-68-9 Usage

General Description

Ethyl 2,2-difluoro-3-hydroxypentanoate is a specific organic compound that falls within the category of organofluorines, as it contains fluorine atoms. The presence of two fluorine atoms indicates that this compound is difluorinated. Moreover, with components such as ethyl, which is a two-carbon unit, and pentanoate, a five carbon unit, this chemical belongs to the ester family, where an organic or inorganic substance has replaced the hydrogen of an acid. The additional attributes of this compound are the 'hydroxy' aspect, implying it has a hydroxyl (OH) group, which consists of one oxygen atom and one hydrogen atom. ethyl 2,2-difluoro-3-hydroxypentanoate could potentially be utilized in various chemical reactions and syntheses in the field of chemistry.

Check Digit Verification of cas no

The CAS Registry Mumber 1092693-68-9 includes 10 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 7 digits, 1,0,9,2,6,9 and 3 respectively; the second part has 2 digits, 6 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 1092693-68:
(9*1)+(8*0)+(7*9)+(6*2)+(5*6)+(4*9)+(3*3)+(2*6)+(1*8)=179
179 % 10 = 9
So 1092693-68-9 is a valid CAS Registry Number.

1092693-68-9SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 13, 2017

Revision Date: Aug 13, 2017

1.Identification

1.1 GHS Product identifier

Product name Ethyl 2,2-Difluoro-3-Hydroxypentanoate

1.2 Other means of identification

Product number -
Other names Ethyl 2,2-difluoro-3-hydroxypentanoate

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1092693-68-9 SDS

1092693-68-9Downstream Products

1092693-68-9Relevant articles and documents

RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND

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Page/Page column 33, (2012/11/08)

A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represen

Polymerizable Fluorine-Containing Compound

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Page/Page column 19, (2011/05/05)

A polymerizable fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same

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, (2009/01/24)

Disclosed is a fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

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