1092693-73-6 Usage
General Description
2,2-Difluoro-3-[(2-Methyl-1-oxo-2-propen-1-yl)oxy]pentanoic acid 1,1-diMethylethyl ester is a chemical compound with the formula C12H17F2O4. 2,2-Difluoro-3-[(2-Methyl-1-oxo-2-propen-1-yl)oxy]pentanoic acid 1,1-diMethylethyl ester is a derivative of pentanoic acid and has two fluorine atoms attached to the carbon backbone. It also contains a methyl group and a propen-1-yl group, as well as an ester functional group. This chemical is commonly used as a building block in organic synthesis and may have applications in pharmaceuticals, agrochemicals, and materials science. Its precise properties and potential uses would need to be further determined through research and testing.
Check Digit Verification of cas no
The CAS Registry Mumber 1092693-73-6 includes 10 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 7 digits, 1,0,9,2,6,9 and 3 respectively; the second part has 2 digits, 7 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 1092693-73:
(9*1)+(8*0)+(7*9)+(6*2)+(5*6)+(4*9)+(3*3)+(2*7)+(1*3)=176
176 % 10 = 6
So 1092693-73-6 is a valid CAS Registry Number.
1092693-73-6Relevant articles and documents
Polymerizable Fluorine-Containing Compound
-
Page/Page column 12, (2011/05/05)
A polymerizable fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.
