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1211417-77-4

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  • 1,3-DiMethyliMidazol-2-ylidene borane, Min. 97%

    Cas No: 1211417-77-4

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1211417-77-4 Usage

Chemical compound

A chemical compound with a minimum purity of 97%.

Common use

Used as a catalyst in organic synthesis reactions.

Reactivity

Known for its high reactivity.

Stability

Known for its stability.

Applications

Used in the synthesis of pharmaceuticals, agrochemicals, and fine chemicals.

Reducing agent

Found to be an effective reducing agent in some chemical reactions.

Performance

High purity ensures consistent and reliable performance in various chemical applications.

Check Digit Verification of cas no

The CAS Registry Mumber 1211417-77-4 includes 10 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 7 digits, 1,2,1,1,4,1 and 7 respectively; the second part has 2 digits, 7 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 1211417-77:
(9*1)+(8*2)+(7*1)+(6*1)+(5*4)+(4*1)+(3*7)+(2*7)+(1*7)=104
104 % 10 = 4
So 1211417-77-4 is a valid CAS Registry Number.

1211417-77-4SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 19, 2017

Revision Date: Aug 19, 2017

1.Identification

1.1 GHS Product identifier

Product name diMe-Imd-BH3

1.2 Other means of identification

Product number -
Other names 1,3-DIMETHYLIMIDAZOL-2-YLIDENE BORANE

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1211417-77-4 SDS

1211417-77-4Relevant articles and documents

Monoborane NHC adducts in the coordination sphere of transition metals

Bissinger, Philipp,Braunschweig, Holger,Kupfer, Thomas,Radacki, Krzysztof

, p. 3987 - 3990 (2010)

Irradiation of various carbonyl complexes in the presence of 1,3-dimethylimidazol-2-ylideneborane (IMe·BH3) afforded the new borane complexes [CpMn(CO)2(η1-H 3B-IMe)] and [M(CO)5(η1-H3B-IMe] (M = Cr, Mo, W). With the exception of [Mo(CO)5(η1- H3B-IMe], which was detected only in solution, the solid-state structures of all species were validated by single-crystal X-ray diffraction. The NHC-BH3 moiety was found to be coordinated to the metal center through a B-H-M three-center two-electron bond presumably without any B-M interaction. μ-Back-donation from the metal center to the boron-containing ligand is most likely negligible.

Visible-Light-Induced Radical Defluoroborylation of Trifluoromethyl Alkenes: An Access to gem-Difluoroallylboranes

Chen, Guojun,Wang, Liling,Liu, Xiaozu,Liu, Peijun

, p. 2990 - 2996 (2020)

A photoredox-catalyzed defluoroborylation of trifluoromethyl alkenes with N-heterocyclic carbene boranes is described for the synthesis of gem-difluoroallylboranes. This protocol exhibits a broad substrate scope and good functional group compatibility, which enables the late-stage functionalization of structurally complex compounds. Further transformations of the defluoroborylation products to valuable CF2-containing molecules are also demonstrated. (Figure presented.).

Insight into the Decomposition Mechanism of Donor-Acceptor Complexes of EH2(E = Ge and Sn) and Access to Germanium Thin Films from Solution

Brown, Alex,Dai, Guoliang,Ferguson, Michael J.,Mcdonald, Robert,Rivard, Eric,Sinclair, Jocelyn

, (2020)

Electron-donating N-heterocyclic carbenes (Lewis bases, LB) and electron-accepting Lewis acids (LA) have been used in tandem to yield donor-acceptor complexes of inorganic tetrelenes LB·EH2·LA (E = Si, Ge, and Sn). Herein, we introduce the new germanium (II) dihydride adducts ImMe2·GeH2·BH3 (ImMe2 = (HCNMe)2C:) and ImiPr2Me2·GeH2·BH3 (ImiPr2Me2 = (MeCNiPr)2C:), with the former complex containing nearly 40 wt % germanium. The thermal release of bulk germanium from ImMe2·GeH2·BH3 (and its deuterated isotopologue ImMe2·GeD2·BD3) was examined in solution, and a combined kinetic and computational investigation was undertaken to probe the mechanism by which Ge is liberated. Moreover, the thermolysis of ImMe2·GeH2·BH3 in solution cleanly affords conformal nanodimensional layers of germanium as thin films of variable thicknesses (20-70 nm) on silicon wafers. We also conducted a computational investigation into potential decomposition pathways for the germanium(II)- and tin(II)-dihydride complexes NHC·EH2·BH3 (NHC = [(HCNR)2C:]; R = 2,6-iPr2C6H3 (Dipp), Me, and H; and E = Ge and Sn). Overall, this study introduces a mild and convenient solution-only protocol for the deposition of thin films of Ge, a widely used semiconductor in materials research and industry.

Photoinduced Single-Electron Transfer as an Enabling Principle in the Radical Borylation of Alkenes with NHC–Borane

Chen, Xiao-Qing,Hu, Yuan-Zhuo,Song, Dan,Xia, Peng-Ju,Xiang, Hao-Yue,Xiao, Jun-An,Yang, Hua,Ye, Zhi-Peng

, p. 6706 - 6710 (2020)

A photoinduced SET process enables the direct B?H bond activation of NHC–boranes. In contrast to common hydrogen atom transfer (HAT) strategies, this photoinduced reaction simply takes advantage of the beneficial redox potentials of NHC–boranes, thus obviating the need for extra radical initiators. The resulting NHC–boryl radical was used for the borylation of a wide range of α-trifluoromethylalkenes and alkenes with diverse electronic and structural features, providing facile access to highly functionalized borylated molecules. Labeling and photoquenching experiments provide insight into the mechanism of this photoinduced SET pathway.

Photocatalytic C-F Bond Borylation of Polyfluoroarenes with NHC-boranes

Chen, Kai,Chen, Xiao-Qing,Hu, Yuan-Zhuo,Xia, Peng-Ju,Xiang, Hao-Yue,Xiao, Jun-An,Yang, Hua,Ye, Zhi-Peng

supporting information, p. 1742 - 1747 (2020/03/24)

The first photoredox-catalyzed defluoroborylation of polyfluoroarenes with NHC-BH3 has been facilely achieved at room temperature via a single-electron-transfer (SET)/radical addition pathway. This new strategy makes full use of the advantage of photoredox catalysis to generate the key boryl radical via direct activation of a B-H bond. Good functional group tolerance and high regioselectivity offer this protocol incomparable advantages in preparing a wide array of valuable polyfluoroarylboron compounds. Moreover, both computational and experimental studies were performed to illustrate the reaction mechanism.

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