1284221-92-6

Basic information

• Product Name: C₇H₁₂N₂*C₁₆H₁₄O₃
• Synonyms: C₇H₁₂N₂*C₁₆H₁₄O₃
• CAS NO: 1284221-92-6
• Molecular Weight: 378.471
• Mol File: 1284221-92-6.mol
• Article Data: 2

Chemical Properties

• CAS DataBase Reference: C₇H₁₂N₂*C₁₆H₁₄O₃(CAS DataBase Reference)
• NIST Chemistry Reference: C₇H₁₂N₂*C₁₆H₁₄O₃(1284221-92-6)
• EPA Substance Registry System: C₇H₁₂N₂*C₁₆H₁₄O₃(1284221-92-6)

Safety Data

• Hazardous Substances Data: 1284221-92-6(Hazardous Substances Data)

Upstream product

• 22071-15-4 ketoprofen 
• 3001-72-7 DBN 

Downstream Products

• 66067-43-4 3-ethylbenzophenone 
• 3001-72-7 DBN 

Relevant articles and documents

Application to photoreactive materials of photochemical generation of superbases with high efficiency based on photodecarboxylation reactions

A thin film of polystyrene containing 4c was spin-coated on a CaF2 plate and irradiated with 365 nm light. The absorption band arising from the carboxylate of 4c at 1372 cm-1 in the FTIR spectrum decreased after UV irradiation. Radical UV curing materials that are well established in the marketplace have drawbacks because of high volume shrinkage and oxygen inhibition. The anionically cured film showed high transparency and no volume shrinkage, in contrast to a conventional radical UV curing system, which showed large volume shrinkage. This is probably due to relatively low quantum yields for photobase generation and weaker basicity of photo-generated bases, leading to low photosensitivity of photoreactive materials sensitized with photobase generators. Furthermore, many of the photobase generators reported are generally prepared via several synthetic steps.